Methods for the treatment of workpieces
Systems and methods for thermal treatment of a workpiece are provided. In one example, a method for conducting a treatment process on a workpiece, such as a thermal treatment process, an annealing treatment process, an oxidizing treatment process, or a reducing treatment process in a processing apparatus is provided. The processing apparatus includes a plasma chamber and a processing chamber. The plasma chamber and the processing chamber are separated by a plurality of separation grids or grid plates. The separation grids or grid plates operable to filter ions generated in the plasma chamber. The processing chamber has a workpiece support operable to support a workpiece.
1. A method for conducting a thermal treatment process on a workpiece in a processing apparatus, the processing apparatus comprising a plasma chamber and a processing chamber, wherein the plasma chamber and the processing chamber are separated by a plurality of separation grids, the separation grids operable to filter ions generated in the plasma chamber, and the processing chamber having a workpiece support operable to support a workpiece, the method comprising:
placing the workpiece on the workpiece support in the processing chamber;
heating a metal layer on the workpiece at a temperature of about 500° C. or less;
flowing a process gas mixture into the plasma chamber, wherein a hydrogen containing gas is flowed at a flow rate of at least 100 sccm and an oxygen containing gas is flowed at a rate of 0.5 slm to 15 slm;
inducing a plasma in the process gas mixture, the plasma containing hydrogen radicals; and
exposing the workpiece to hydrogen radicals in the processing chamber, wherein the thermal treatment process reduces a resistance capacity of the metal layer such that the metal layer has a Rs reduction of at least 5% after exposure to the hydrogen radicals.
2. The method of claim 1 , wherein the process gas mixture comprises from about 10% to about 100% by volume of the hydrogen containing gas.
3. The method of claim 1 , wherein the process gas mixture comprises helium, nitrogen, or argon.
4. The method of claim 1 , wherein the workpiece comprises silicon or silicon germanium, and hydrogen diffuses through the layer on the workpiece to the silicon and silicon germanium in the workpiece.
5. The method of claim 1 , wherein the thermal treatment process cleans surface of the layer on the workpiece.
6. The method of claim 1 , wherein the metal layer comprises cobalt, copper, tungsten, tantalum, or ruthenium.
7. The method of claim 6 , wherein the thermal treatment process removes one or more impurities from the metal layer.
8. The method of claim 6 , wherein the thermal treatment process modifies grain of the metal layer.
9. The method of claim 6 , wherein the metal layer is deposited on a patterned structure on the workpiece, and the thermal treatment process modifies morphology of the metal layer.
10. The method of claim 6 , wherein the thermal treatment process reduces at least a portion of oxygen concentration on surface of the metal layer.
11. The method of claim 6 , wherein the thermal treatment process reduces at least a portion of nitrogen concentration on surface of the metal layer.
12. The method of claim 6 , wherein the thermal treatment process reduces at least a portion of fluorine concentration on surface of the metal layer.
13. The method of claim 1 , wherein the process gas mixture comprises about 95 vol % hydrogen and about 5% oxygen.
14. The method of claim 1 , wherein exposing the workpiece to hydrogen radicals in the processing chamber comprising exposing the workpiece to the hydrogen radicals for a process time of at least 85 second.
15. The method of claim 1 , wherein the plurality of separation grids comprise a first grid plated spaced apart from a second grid plate, wherein the method comprises flowing the hydrogen radicals through the first grid plate and the second grid plate.
16. A method for conducting a thermal treatment process on a workpiece in a processing apparatus, the processing apparatus comprising a plasma chamber and a processing chamber, wherein the plasma chamber and the processing chamber are separated by a plurality of separation grids, the separation grids operable to filter ions generated in the plasma chamber, and the processing chamber having a workpiece support operable to support a workpiece, the method comprising:
placing the workpiece on the workpiece support in the processing chamber;
heating a metal layer on the workpiece at a temperature of about 500° C. or less, wherein the metal layer comprises cobalt, copper, tungsten, tantalum, or ruthenium;
flowing a process gas mixture into the plasma chamber, wherein a hydrogen containing gas is flowed at a flow rate of at least 100 sccm and an oxygen containing gas is flowed at a rate of 0.5 slm to 15 slm;
inducing a plasma in the process gas mixture, the plasma containing hydrogen radicals;
exposing the workpiece to hydrogen radicals in the processing chamber, wherein the process gas mixture comprising from about 10% to about 100% by volume of the hydrogen containing gas, wherein the thermal treatment or process reduces a resistance capacity of the metal layer such that the metal layer has a Rs reduction of at least 5% after exposure to the hydrogen radicals.