Multilevel semiconductor device and structure
A multi-level semiconductor device, the device including: a first level including integrated circuits; a second level including an optical waveguide, where the second level is disposed above the first level, where the first level includes crystalline silicon; and an oxide layer disposed between the first level and the second level, where the second level is bonded to the oxide layer, and where the bonded includes oxide to oxide bonds.
1. A multi-level semiconductor device, the device comprising:
a first level comprising integrated circuits;
a second level comprising an optical waveguide,
wherein said second level is disposed above said first level,
wherein said first level comprises crystalline silicon; and
an oxide layer disposed between said first level and said second level,
wherein said second level is bonded to said oxide layer, and
wherein said bonded comprises oxide to oxide bonds.
2. The device according to claim 1 , further comprising:
a plurality of optical modulators.
3. The device according to claim 1 , further comprising:
a plurality of photo detectors.
4. The device according to claim 1 , further comprising:
a third level comprising a crystalline silicon layer,
wherein said crystalline silicon layer has a thickness less than 60 microns.
5. The device according to claim 1 ,
wherein said optical waveguide comprises a hollow-metal waveguide.
6. The device according to claim 1 ,
wherein said optical waveguide comprises a first material comprising a high index of refraction surrounded by a second material comprising a lower index of refraction.
7. The device according to claim 1 , further comprising:
a third level,
wherein said third level comprises a layer comprising electronic circuits comprising crystalline silicon.
8. A multi-level semiconductor device, the device comprising:
a first level comprising integrated circuits;
a second level comprising a plurality of optical modulators,
wherein said second level is disposed above said first level,
wherein said first level comprises crystalline silicon;
an oxide layer disposed between said first level and said second level,
wherein said second level is bonded to said oxide layer, and
wherein said bonded comprises oxide to oxide bonds; and
a plurality of optical waveguides.
9. The device according to claim 8 , further comprising:
a crystalline substrate, said crystalline substrate comprising a portion of said plurality of optical waveguides,
wherein said crystalline substrate is disposed underneath said first level.
10. The device according to claim 8 , further comprising:
a plurality of photo detectors.
11. The device according to claim 8 , further comprising:
a third level comprising a crystalline silicon layer,
wherein said crystalline silicon layer has a thickness less than 60 microns.
12. The device according to claim 8 ,
wherein said plurality of optical waveguides comprise a hollow-metal waveguide.
13. The device according to claim 8 ,
wherein said plurality of optical waveguides each comprise a first material comprising a high index of refraction surrounded by a second material comprising a lower index of refraction.
14. The device according to claim 8 , further comprising:
a third level,
wherein said third level comprises a layer comprising electronic circuits comprising crystalline silicon.
15. A multi-level semiconductor device, the device comprising:
a first level comprising integrated circuits;
a second level comprising a plurality of optical modulators,
wherein said second level is disposed above said first level,
wherein said first level comprises crystalline silicon; and
an oxide layer disposed between said first level and said second level,
wherein said second level is bonded to said oxide layer, and
wherein said bonded comprises oxide to oxide bonds.
16. The device according to claim 15 , further comprising:
a third level,
wherein said third level comprises a layer comprising electronic circuits comprising crystalline silicon.
17. The device according to claim 15 , further comprising:
a plurality of photo detectors.
18. The device according to claim 15 , further comprising:
a third level comprising electronic circuits comprising a crystalline silicon layer,
wherein said crystalline silicon layer has a thickness less than 60 microns.
19. The device according to claim 15 , further comprising:
a plurality of optical waveguides,
wherein said plurality of optical waveguides each comprise a hollow-metal waveguide.
20. The device according to claim 15 , further comprising:
a plurality of optical waveguides,
wherein said plurality of optical waveguides each comprise a first material comprising a high index of refraction surrounded by a second material comprising a lower index of refraction.