Liquid metal ion source and focused ion beam apparatus
A liquid metal ion source ( 50 ) includes: a reservoir ( 10 ) configured to hold an ion material (M) forming a liquid metal; a needle electrode ( 20 ); an extraction electrode ( 22 ) configured to cause an ion of the ion material to be emitted from a distal end of the needle electrode; a beam diaphragm ( 24 ), which is arranged on a downstream side of the extraction electrode, and is configured to limit a beam diameter of the ion; and a vacuum chamber ( 30 ) configured to accommodate and hold the reservoir, the needle electrode, the extraction electrode, and the beam diaphragm in vacuum, wherein the liquid metal ion source further includes an oxidizing gas introducing portion ( 40 ), and wherein the oxidizing gas introducing portion communicates to the vacuum chamber, and is configured to introduce an oxidizing gas into a periphery of the needle electrode.
1. A liquid metal ion source, comprising:
a reservoir configured to hold an ion material forming a liquid metal;
a needle electrode having a surface to be covered with the ion material supplied from the reservoir;
an extraction electrode configured to cause an ion of the ion material to be emitted from a distal end of the needle electrode;
a beam diaphragm, which is arranged on a downstream side of the extraction electrode, and is configured to limit a beam diameter of the ion; and
a vacuum chamber configured to accommodate and hold the reservoir, the needle electrode, the extraction electrode, and the beam diaphragm in vacuum,
wherein the liquid metal ion source further comprises an oxidizing gas introducing portion, and
wherein the oxidizing gas introducing portion communicates to the vacuum chamber, and is configured to introduce an oxidizing gas into a periphery of the needle electrode.
2. The liquid metal ion source according to claim 1 , wherein the oxidizing gas is water vapor.
3. The liquid metal ion source according to claim 1 , further comprising a final exhaust system configured to evacuate the vacuum chamber to a target vacuum degree,
wherein the final exhaust system and the oxidizing gas introducing portion communicate to the vacuum chamber through separate flow passages.
4. The liquid metal ion source according to claim 3 , wherein the vacuum chamber has a vacuum degree of from 5.0×10−6 Pa to 1.5×10−5 Pa in a state of having the oxidizing gas introduced thereinto.
5. The liquid metal ion source according to claim 3 , wherein at least part of a flow passage of the final exhaust system and at least part of a flow passage of the oxidizing gas introducing portion are opposed to each other in a direction perpendicular to an irradiation direction of a beam of the ion.
6. The liquid metal ion source according to claim 3 , wherein at least part of a flow passage of the final exhaust system and at least part of a flow passage of the oxidizing gas introducing portion are each opposed to the needle electrode in a direction perpendicular to an irradiation direction of a beam of the ion.
7. The liquid metal ion source according to claim 1 , further comprising a final exhaust system configured to evacuate the vacuum chamber to a target vacuum degree,
wherein the final exhaust system and the oxidizing gas introducing portion communicate to the vacuum chamber through a same flow passage.
8. The liquid metal ion source according to claim 7 , wherein the vacuum chamber has a vacuum degree of from 1.0×10−5 Pa to 3.0×10−5 Pa in a state of having the oxidizing gas introduced thereinto.
9. The liquid metal ion source according to claim 1 , further comprising an oxidizing gas introduction control unit configured to introduce the oxidizing gas into the vacuum chamber only when a voltage is applied between the needle electrode and the extraction electrode.
10. A focused ion beam apparatus, comprising the liquid metal ion source of claim 1 .