Focused ion beam apparatus
The focused ion beam apparatus includes: an electron beam column; a focused ion beam column; a sample stage; a coordinate acquisition unit configured to acquire, when a plurality of irradiation positions to which the focused ion beam is to be applied are designated on a sample, plane coordinates of each of the irradiation positions; a movement amount calculation unit configured to calculate, based on the plane coordinates, a movement amount by which the sample stage is to be moved to a eucentric height so that the eucentric height matches an intersection position at which the electron beam and the focused ion beam match each other at each of the irradiation positions; and a sample stage movement control unit configured to move, based on the movement amount, the sample stage to the eucentric height at each of the irradiation positions.
1. A focused ion beam apparatus, comprising:
an electron beam column configured to irradiate a sample with an electron beam;
a focused ion beam column configured to irradiate the sample with a focused ion beam;
a sample stage, on which the sample is to be placed in one of a direct manner and an indirect manner, and which is tiltable about a tilt axis perpendicular to the electron beam and the focused ion beam and movable in a height direction;
a coordinate acquisition unit configured to acquire, when a plurality of irradiation positions to which the focused ion beam is to be applied are designated on the sample, plane coordinates of each of the plurality of irradiation positions;
a movement amount calculation unit configured to calculate, based on the plane coordinates, a movement amount by which the sample stage is to be moved to a first eucentric height (Zs) so that the first eucentric height (Zs) matches an intersection position at which the electron beam and the focused ion beam match each other at each of the plurality of irradiation positions;
a memory configured to store a second eucentric height (Zse) at predetermined plane coordinates on the surface of the sample placed on the sample stage; and
a sample stage movement control unit configured to move, based on the movement amount, the sample stage to the eucentric height (Zs) at each of the plurality of irradiation positions,
wherein the movement amount calculation unit is configured to estimate the first eucentric height (Zs) at each of the plurality of irradiation positions from the second eucentric height (Zse) stored in the memory based on a difference in coordinate between the predetermined plane coordinates and each of the plurality of irradiation positions.
2. The focused ion beam apparatus according to claim 1 , wherein the movement amount calculation unit is configured to estimate the first eucentric height (Zs) at each of the plurality of irradiation positions from the second eucentric height (Zse) stored in the memory, based on an arrangement order in coordinate among the predetermined plane coordinates and each of the plurality of irradiation positions.