Process kit with adjustable tuning ring for edge uniformity control
Process kits, processing chambers, and methods for processing a substrate are provided. The process kit includes an edge ring, a sliding ring, an adjustable tuning ring, and an actuating mechanism. The edge ring has a first ring component interfaced with a second ring component that is movable relative to the first ring component forming a gap therebetween. The sliding ring is positioned beneath the second ring component of the edge ring. The adjustable tuning ring is positioned beneath the sliding ring. The actuating mechanism is interfaced with the lower surface of the adjustable tuning ring and configured to actuate the adjustable tuning ring such that the gap between the first and second ring components is varied. In one or more examples, the sliding ring includes a matrix and a coating, the matrix contains an electrically conductive material and the coating contains an electrically insulting material.
1. A process kit for a substrate processing chamber, comprising:
an edge ring having a first ring component and a second ring component, the first ring component interfaced with the second ring component such that the second ring component is movable relative to the first ring component forming a gap therebetween, and the second ring component having an upper surface and a lower surface;
a sliding ring positioned beneath the second ring component, the sliding ring having an upper surface and a lower surface, and the upper surface of the sliding ring contacting the lower surface of the second ring component;
an adjustable tuning ring positioned beneath the sliding ring, the adjustable tuning ring having an upper surface and a lower surface, and the upper surface of the adjustable tuning ring contacting the lower surface of the sliding ring;
a cover ring at least partially adjacent to the second ring component, and wherein the cover ring is completely positioned radially outward of the adjustable tuning ring;
a sleeve at least partially positioned beneath the cover ring and at least partially positioned radially outward of the sliding ring and the adjustable tuning ring; and
an actuating mechanism interfaced with the lower surface of the adjustable tuning ring, the actuating mechanism configured to actuate the adjustable tuning ring such that the gap between the first ring component and the second ring component is varied.
2. The process kit of claim 1 , wherein the sliding ring comprises silicon carbide.
3. The process kit of claim 1 , wherein each of the first ring component and the second ring component independently comprises quartz, silicon oxide, silicon carbide, or any combination thereof.
4. The process kit of claim 3 , wherein the first ring component and the second ring component comprise quartz.
5. The process kit of claim 1 , wherein the first ring component comprises a stepped surface formed therein, and wherein the stepped surface of the first ring component interfaces with a portion of the lower surface of the second ring component.
6. The process kit of claim 1 , wherein the cover ring is positioned at least partially underneath a portion of the second ring component.
7. The process kit of claim 1 , wherein the cover ring is completely positioned radially outward of the sliding ring.
8. The process kit of claim 1 , wherein the cover ring and the sleeve comprise quartz.
9. The process kit of claim 1 , wherein the sliding ring comprises a matrix and a coating.
10. The process kit of claim 9 , wherein the matrix comprises an electrically conductive material and the coating comprises an electrically insulating material.
11. The process kit of claim 9 , wherein the matrix comprises aluminum or an aluminum alloy and the coating comprises yttrium oxide, hafnium oxide, silicon carbide, or any combination thereof.
12. The process kit of claim 1 , wherein the sliding ring comprises an upper segment disposed on a lower segment, the upper segment comprises silicon carbide, and the lower segment comprises aluminum or an aluminum alloy.
13. The process kit of claim 1 , wherein the adjustable tuning ring comprises three or more slots extending from the lower surface of the adjustable tuning ring towards the upper surface of the adjustable tuning ring, and wherein each slot contains a lift pin disposed therein.
14. The process kit of claim 13 , wherein the adjustable tuning ring comprises three slots disposed around the adjustable tuning ring separated from each other by an angle of about 110 degrees to about 130 degrees, as measured from the center of the adjustable tuning ring.
15. The process kit of claim 1 , wherein the actuating mechanism comprises two or more lift pins, each of the lift pins having a first end and a second end, the first end of the lift pin contacting the lower surface of the adjustable tuning ring, and the second end of the lift pin in communication with a lift mechanism.
16. The process kit of claim 15 , wherein the actuating mechanism comprises three lift pins, each of the first ends of the lift pins contacting a point on the lower surface of the adjustable tuning ring, the points on the lower surface are separated from each other by an angle of about 110 degrees to about 130 degrees, as measured from the center of the adjustable tuning ring.
17. A processing chamber, comprising:
a substrate support member configured to support a substrate; and
a process kit supported by the substrate support member, the process kit comprising:
an edge ring having a first ring component and a second ring component, the first ring component interfaced with the second ring component such that the second ring component is movable relative to the first ring component forming a gap therebetween, and the second ring component having an upper surface and a lower surface;
a sliding ring positioned beneath the second ring component, the sliding ring having an upper surface and a lower surface, and the upper surface of the sliding ring contacting the lower surface of the second ring component;
an adjustable tuning ring positioned beneath the sliding ring, the adjustable tuning ring having an upper surface and a lower surface, and the upper surface of the adjustable tuning ring contacting the lower surface of the sliding ring;
a cover ring at least partially adjacent to the second ring component, and wherein the cover ring is completely positioned radially outward of the adjustable tuning ring; and
an actuating mechanism interfaced with the lower surface of the adjustable tuning ring, the actuating mechanism configured to actuate the adjustable tuning ring such that the gap between the first ring component and the second ring component is varied.
18. The processing chamber of claim 17 , wherein the sliding ring comprises silicon carbide.
19. The processing chamber of claim 17 , wherein the substrate support member comprises:
a base;
a cooling plate supported by the base; and
an electrostatic chuck positioned on an upper surface of the cooling plate.
20. The process kit of claim 1 , wherein the sleeve comprises a plasma resistant material.