Atomic layer deposition of lithium boron comprising nanocomposite solid electrolytes
A lithium boron coating and a method of producing the same. Atomic layer deposition deposits lithium and boron to form a lithium borate layer. The lithium borate maybe deposited as a solid electrolyte.
1. A method of forming a lithium boron coating comprising:
providing a substrate within an atomic layer deposition reactor; and
depositing a coating of lithium boron composite by an atomic layer deposition process including:
pulsing a lithium precursor comprising a lithium tertiary butoxide into the reactor;
purging the reactor of the lithium precursor;
pulsing a solution of a first boron precursor and a first co-reactant comprising an organic solvent;
purging the reactor of the first boron precursor and the first co-reactant; and
pulsing a solution of a second boron precursor, different from the first boron precursor, and a second co-reactant different from the first co-reactant;
wherein the second boron precursor comprises boron fluoride and the second co-reactant comprises at least one of HF or HF-pyridine, or the second boron precursor comprises boron sulfide and the second co-reactant comprises at least one of S or H 2 S.
2. The method of claim 1 , wherein the first boron precursor is boric acid.
3. The method of claim 1 , wherein the first co-reactant is methanol.
4. The method of claim 1 , wherein the first boron precursor is boric acid and the first co-reactant is methanol.
5. The method of claim 1 , wherein the second boron precursor comprises the boron fluoride; the second co-reactant comprises at least one of HF or HF-pyridine; and the lithium boron coating comprises boron-doped lithium fluoride.
6. The method of claim 1 , wherein the second boron precursor comprises the boron sulfides; the second co-reactant comprises at least one of S or H 2 S; and the lithium boron coating comprises boron-doped lithium sulfide.
7. The method of claim 1 , further comprising depositing via ALD a stabilizing layer.
8. The method of claim 1 , wherein the first boron precursor is selected from the group consisting of boric acid, trimethyl borate, triethyl borate, B 2 H 6 , B 2 F 4 , BF 3 and Hf(BH 4 ) 4 .
9. The method of claim 8 , wherein the first co-reactant is selected from the group consisting of methanol, acetone, isopropyl alcohol (IPA), ethanol, and acetic acid.
10. A method of forming a boron lithium coating comprising:
providing a substrate within an atomic layer deposition reactor; and
depositing a coating of lithium boron composite by an atomic layer deposition process including:
pulsing a lithium precursor comprising a lithium tertiary butoxide into the reactor;
purging the reactor of the lithium precursor;
pulsing a first boron precursor and the first co-reactant; and
purging the reactor of the boron first precursor and the first co-reactant; and
pulsing a second boron precursor, different from the first boron precursor, and a second-co-reactant different from the first co-reactant;
wherein the second boron precursor comprises boron fluoride and the second co-reactant comprises at least one of HF or HF-pyridine, or the second boron precursor comprises boron sulfide and the second co-reactant comprises at least one of S or H 2 S.
11. The method of claim 10 , wherein the first boron precursor is trimethyl borate.
12. The method of claim 10 , wherein the first boron precursor is boric acid.
13. The method of claim 10 , wherein pulsing the second boron precursor and the second co-reactant comprises pulsing boron fluoride and at least one of HF or HF-pyridine, and the boron lithium coating comprises boron-doped lithium fluoride.
14. The method of claim 10 , wherein pulsing the second boron precursor and the second co-reactant comprises pulsing boron sulfide and at least one of S or H 2 S, and the boron lithium coating comprises boron-doped lithium sulfide.