IP Library › Granted Patent US 11,563,049
Granted Patent B2
US 11,563,049 · App. 17/040,520 · Granted Jan 24, 2023

Solid-state imaging apparatus, method for manufacturing solid-state imaging apparatus, and electronic equipment equipped with solid-state imaging apparatus

Inventor: Kenichi Nishizawa (Kanagawa, JP)
Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
H01L27/14634H01L25/162H01L25/167H01L27/1469H01L27/14609H01L27/14625H01L27/14636
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Quick Facts
Patent No.
US 11,563,049
App. No.
17/040,520
Granted
Jan 24, 2023
Kind
B2
Abstract

Provided are a solid-state imaging apparatus, a method for manufacturing a solid-state imaging apparatus, and an electronic apparatus equipped with a solid-state imaging apparatus that can reduce the size of a semiconductor chip in such a way that one semiconductor substrate having a logic circuit controls two sensors. Provided is a solid-state imaging apparatus including a first sensor, a first semiconductor substrate having a memory, a second semiconductor substrate having a logic circuit, and a second sensor, in which the first sensor, the first semiconductor substrate, the second semiconductor substrate, and the second sensor are arranged in this order.

Claims (34)

1. A solid-state imaging apparatus, comprising:

a first sensor; a first semiconductor substrate having a memory; a second semiconductor substrate having a logic circuit; and a second sensor, wherein

the first sensor, the first semiconductor substrate, the second semiconductor substrate, and the second sensor are arranged in this order.

2. The solid-state imaging apparatus according to claim 1 , wherein

an electrode of a first wiring layer formed on a front surface side of the first semiconductor substrate and an electrode of a second wiring layer formed on a front surface side of the second semiconductor substrate are bonded so as to face each other and are electrically connected.

3. The solid-state imaging apparatus according to claim 1 , wherein

the second semiconductor substrate is electrically connected to each of the first sensor and the second sensor.

4. The solid-state imaging apparatus according to claim 1 , wherein

the second semiconductor substrate is connected to each of the first semiconductor substrate and the second sensor by a copper wiring.

5. The solid-state imaging apparatus according to claim 1 , wherein

the second semiconductor substrate is connected to the first sensor by a through via penetrating the first semiconductor substrate.

6. The solid-state imaging apparatus according to claim 1 , wherein

the logic circuit controls data written onto the memory from the first sensor and the second sensor or data read from the memory.

7. The solid-state imaging apparatus according to claim 1 , wherein

the logic circuit controls a timing of writing data onto the memory from the first sensor and the second sensor or a timing of reading data from the memory.

8. The solid-state imaging apparatus according to claim 1 , wherein

the memory includes a dynamic random access memory (DRAM).

9. The solid-state imaging apparatus according to claim 1 , wherein

the memory includes static random access memory (SRAM).

10. The solid-state imaging apparatus according to claim 1 , wherein

the first sensor and the second sensor include a color filter, an on-semiconductor chip lens, and a photoelectric conversion unit.

11. The solid-state imaging apparatus according to claim 10 , wherein

the color filter and the on-semiconductor chip lens are provided on a back surface side of the photoelectric conversion unit.

12. The solid-state imaging apparatus according to claim 1 , further comprising:

a flexible printed substrate; and a cover glass.

13. An electronic equipment, comprising the solid-state imaging apparatus according to claim 1 .

14. A method for manufacturing a solid-state imaging apparatus, the method comprising:

bonding a first electrode formed on one surface of a first semiconductor substrate having a memory and a second electrode formed on one surface of a second semiconductor substrate having a logic circuit such that the first electrode and the second electrode face each other;

after the bonding, stacking a second sensor on another surface not bonded to the second semiconductor substrate; and

after stacking the second sensor, stacking a first sensor on another surface not bonded to the first semiconductor substrate.

15. A method for manufacturing a solid-state imaging apparatus, the method comprising:

stacking a first sensor on one surface of a first semiconductor substrate having a memory;

stacking a second sensor on one surface of a second semiconductor substrate having a logic circuit; and

after stacking the respective first sensor and the second sensor, bonding a first electrode formed on another surface not bonded to the first semiconductor substrate and a second electrode formed on another surface not bonded to the second semiconductor substrate such that the first electrode and the second electrode face each other.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 28, 2021
From: NISHIZAWA, KENICHI
To: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
Reel/Frame 056682/0200 →
Priority Claims (1)
JP JP2018-067796 · Mar 30, 2018 · national
Continuity (1)
Related Publication 20210005659A1 · Jan 7, 2021
Cited By (1)
US 12,266,674