Semiconductor device and fabrication method of semiconductor device

1. A semiconductor device comprising:

a first insulator in which an opening is formed;

a first conductor positioned in the opening;

a first oxide over the first insulator;

a second oxide over the first oxide;

a third oxide and a fourth oxide over the second oxide;

a second conductor over the third oxide and the first conductor;

a third conductor over the fourth oxide;

a fifth oxide over the second oxide;

a second insulator over the fifth oxide; and

a fourth conductor positioned over the second insulator and overlapping with the fifth oxide,

wherein the fifth oxide is in contact with each of a side surface of the third oxide and a side surface of the fourth oxide, and

wherein the second conductor is in contact with a top surface of the first conductor.

2. The semiconductor device according to claim 1 ,

further comprising a fifth conductor in contact with a top surface of the second conductor,

wherein the fifth conductor overlaps with at least part of the first conductor.

3. The semiconductor device according to claim 1 ,

wherein the third oxide and the fourth oxide each include zinc.

4. The semiconductor device according to claim 1 ,

wherein the thicknesses of the third oxide and the fourth oxide are each larger than or equal to 1 nm and smaller than or equal to 10 nm.

5. The semiconductor device according to claim 1 ,

wherein the third oxide and the fourth oxide each have crystallinity.

6. The semiconductor device according to claim 1 ,

wherein the second oxide includes In, an element M (M is Al, Ga, Y, or Sn), and Zn.

7. The semiconductor device according to claim 1 ,

wherein the third oxide comprises a first region that does not overlap with the second conductor,

wherein the fourth oxide comprises a second region that does not overlap with the third conductor, and

wherein the fifth oxide is in contact with each of a top surface of the first region and a top surface of the second region.

8. The semiconductor device according to claim 1 ,

wherein the conductivity of the third oxide is higher than the conductivity of the second oxide, and

wherein the conductivity of the fourth oxide is higher than the conductivity of the second oxide.

9. A semiconductor device comprising: a first to a third insulator; a first to a sixth conductor; a first to a fifth oxide; a capacitor; and a transistor,

wherein the capacitor comprises:

the fifth conductor;

the third insulator over the fifth conductor; and

the sixth conductor over the third insulator,

wherein the transistor comprises:

the first insulator in which an opening is formed;

the first conductor positioned in the opening;

the first oxide over the first insulator;

the second oxide over the first oxide;

the third oxide and the fourth oxide over the second oxide;

the second conductor over the third oxide and the first conductor;

the third conductor over the fourth oxide;

the fifth oxide over the second oxide;

the second insulator over the fifth oxide; and

the fourth conductor positioned over the second insulator and overlapping with the fifth oxide,

wherein the fifth oxide is in contact with each of a side surface of the third oxide and a side surface of the fourth oxide,

wherein the conductivity of the third oxide is higher than the conductivity of the second oxide,

wherein the conductivity of the fourth oxide is higher than the conductivity of the second oxide, and

wherein the second conductor is in contact with a top surface of the first conductor.

10. The semiconductor device according to claim 9 ,

wherein the capacitor is formed below the transistor, and

wherein the first conductor is electrically connected to the sixth conductor.

11. The semiconductor device according to claim 9 ,

further comprising, below the first insulator, a fourth insulator in which an opening is formed,

wherein at least part of the fifth conductor, the third insulator, and the sixth conductor are positioned in the opening of the fourth insulator.

12. The semiconductor device according to claim 9 ,

wherein the third oxide comprises a first region that does not overlap with the second conductor,

wherein the fourth oxide comprises a second region that does not overlap with the third conductor, and

wherein the fifth oxide is in contact with each of a top surface of the first region and a top surface of the second region.

13. A semiconductor device comprising: a first to a fourth insulator; a first to a seventh conductor; a first to a fifth oxide; a capacitor; a first transistor; and a second transistor,

wherein the capacitor comprises:

the fifth conductor;

the third insulator over the fifth conductor; and

the sixth conductor over the third insulator,

wherein the first transistor comprises:

the first insulator in which an opening is formed;

the first conductor positioned in the opening;

the first oxide over the first insulator;

the second oxide over the first oxide;

the third oxide and the fourth oxide over the second oxide;

the second conductor over the third oxide and the first conductor;

the third conductor over the fourth oxide;

the fifth oxide over the second oxide;

the second insulator over the fifth oxide; and

the fourth conductor positioned over the second insulator and overlapping with the fifth oxide,

wherein the fifth oxide is in contact with each of a side surface of the third oxide and a side surface of the fourth oxide,

wherein the conductivity of the third oxide is higher than the conductivity of the second oxide,

wherein the conductivity of the fourth oxide is higher than the conductivity of the second oxide,

wherein the second conductor is in contact with a top surface of the first conductor, and

wherein the second transistor comprises:

the fourth insulator over a silicon substrate; and

the seventh conductor over the fourth insulator.

14. The semiconductor device according to claim 13 ,

wherein the third oxide comprises a first region that does not overlap with the second conductor,

wherein the fourth oxide comprises a second region that does not overlap with the third conductor, and

wherein the fifth oxide is in contact with each of a top surface of the first region and a top surface of the second region.

15. The semiconductor device according to claim 13 ,

wherein the first transistor further comprises an eighth conductor in contact with a top surface of the second conductor,

wherein the capacitor is formed over the first transistor,

wherein the eighth conductor is electrically connected to the fifth conductor,

wherein the second transistor is formed below the first transistor, and

wherein the first conductor is electrically connected to the seventh conductor.

16. The semiconductor device according to claim 15 ,

further comprising, over the eighth conductor, a fifth insulator in which an opening is formed,

wherein at least part of the fifth conductor, the third insulator, and the sixth conductor are positioned in the opening of the fifth insulator.