IP Library Granted Patent US 11,955,645
Granted Patent B2
US 11,955,645 · App. 17/047,029 · Granted Apr 9, 2024

Catalyst

Inventors: Andrew J. L. Steinbach (Shoreview, MN); Andrew T. Haug (Woodbury, MN); Krzysztof A. Lewinski (Mahtomedi, MN); Amy E. Hester (Hudson, WI); Grant M. Thoma (Inver Grove Heights, MN); Cedric Bedoya (Woodbury, MN); Zhenhua Zeng (West Lafayette, IN); Jeffrey P. Greeley (West Lafayette, IN)
Assignee: 3M Innovative Properties Company
H01M4/9041H01M4/8657H01M4/9058H01M4/92
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,955,645
App. No.
17/047,029
Granted
Apr 9, 2024
Kind
B2
Abstract

Catalysts comprising a Ta layer having an outer layer with a layer comprising Pt directly thereon, wherein the Ta layer has an average thickness in a range from 0.04 to 30 nanometers, wherein the layer comprising Pt has an average thickness in a range from 0.04 to 50 nanometers, and wherein the Pt and Ta are present in an atomic ratio in a range from 0.01:1 to 10:1. Catalyst described herein are useful, for example, in fuel cell membrane electrode assemblies.

Claims (21)

1. An article comprising:

nanostructured elements comprising microstructured whiskers having an outer surface; and

a catalyst on the outer surface, the catalyst comprising a Ta layer having an outer layer with a layer comprising Pt directly thereon, wherein the Ta layer has an average thickness in a range from 0.04 to 30 nanometers, wherein the layer comprising Pt has an average thickness in a range from 0.04 to 50 nanometers, and wherein the Pt and Ta are present in an atomic ratio in a range from 0.01:1 to 10:1.

2. The article of claim 1 , wherein the catalyst surface area is at least 20% greater than would be present without the presence of the Ta layer.

3. The article of claim 1 , wherein the catalyst further comprises at least one pair of alternating layers, wherein the first alternating layer comprises Ta, and wherein the second alternating layer comprises Pt.

4. A catalyst comprising:

a Ta layer having an outer layer with a layer comprising Pt thereon, wherein the Ta layer has an average thickness in a range from 0.04 to 30 nanometers, wherein the layer comprising Pt has an average thickness in a range from 0.04 to 50 nanometers, and wherein the Pt and Ta are present in an atomic ratio in a range from 0.01:1 to 10:1, and a layer comprising Ir is present between the Ta layer and the layer comprising Pt, and wherein the layer comprising Ir has an average thickness in a range from 0.04 to 50 nanometers.

5. The catalyst of claim 4 , wherein the Ta to Ir atomic ratio is in a range from 0.01:1 to 100:1.

6. The article of claim 1 , wherein the layer comprising Pt comprises Pt crystallites with an FCC lattice constant in a range from 0.395 to 0.392 nm.

7. The article of claim 1 , wherein the layer comprising Pt comprises Pt crystallites with a crystallite size in a range from 2 to 20 nanometers.

8. The article of claim 1 , wherein the layer comprising Pt further comprises Ni.

9. The article of claim 8 , wherein the Pt to Ni atomic ratio is in a range from 0.5:1 to 5:1.

10. A method of making the catalyst of claim 4 , the method comprising depositing the Ta layer, the layer of Ir, the layer comprising Pt, or combinations thereof via a deposition technique independently selected from the group consisting of sputtering, atomic layer deposition, metal organic chemical vapor deposition, molecular beam epitaxy, ion soft landing, thermal physical vapor deposition, vacuum deposition by electrospray ionization, and pulse laser deposition.

11. The article of claim 1 , wherein the Ta layer is directly on the microstructured whiskers.

12. The article of claim 1 , wherein the microstructured whiskers are attached to a backing.

13. A method of making the article of claim 1 , the method comprising depositing the Ta layer, the layer comprising Pt, or both via a deposition technique independently selected from the group consisting of sputtering, atomic layer deposition, metal organic chemical vapor deposition, molecular beam epitaxy, ion soft landing, thermal physical vapor deposition, vacuum deposition by electrospray ionization, and pulse laser deposition.

14. The method of claim 13 , further comprising annealing at least one of the Ta layer or the layer comprising Pt.

15. The catalyst of claim 4 , wherein the layer comprising Pt comprises Pt crystallites with an FCC lattice constant in a range from 0.395 to 0.392 nm.

16. The catalyst of claim 4 , wherein the layer comprising Pt comprises Pt crystallites with a crystallite size in a range from 2 to 20 nanometers.

17. The catalyst of claim 4 , wherein the layer comprising Pt further comprises Ni.

18. The catalyst of claim 17 , wherein the Pt to Ni atomic ratio is in a range from 0.5:1 to 5:1.

Assignments (2)
CONFIRMATORY LICENSE Recorded Sep 11, 2024
From: 3M COMPANY
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 068942/0271 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 17, 2020
From: STEINBACH, ANDREW J. L.; HAUG, ANDREW T.; LEWINSKI, KRZYSZTOF A.; HESTER, AMY E.; THOMA, GRANT M.; BEDOYA, CEDRIC
To: 3M INNOVATIVE PROPERTIES COMPANY
Reel/Frame 054686/0148 →
Continuity (2)
Provisional Application 62657189 · Apr 13, 2018
Related Publication 20210075026A1 · Mar 11, 2021