COLORING COMPOSITION AND METHOD FOR PRODUCING COLOR FILTER FOR SOLID-STATE IMAGING ELEMENT

1 . A coloring composition used for forming a colored pattern of a color filter for a solid-state imaging element, the color composition comprising:

an organic pigment (A);

a dispersant (B);

an epoxy compound (C);

a solvent (D); and

a coloring matter derivative (E),

wherein a content of the organic pigment (A) is at least 50 mass % with respect to a non-volatile content in the coloring composition,

wherein the dispersant (B) contains a dispersant (b1) having an acidic functional group and/or a dispersant (b2) having a basic functional group, and

wherein the epoxy compound (C) is at least one compound selected from the group consisting of glycerol polyglycidyl ether, bisphenol-type polyglycidyl ether, and hydrogenated bisphenol-type polyglycidyl ether.

2 . The coloring composition according to claim 1 ,

wherein the organic pigment (A) contains a green pigment (a1).

3 . The coloring composition according to claim 2 ,

wherein the green pigment contains at least one selected from Pigment Green 7, Pigment Green 36, and Pigment Green 58.

4 . The coloring composition according to claim 1 ,

wherein the dispersant (b1) having the acidic functional group has a region (b1-A) formed by polymerizing an ethylenically unsaturated monomer containing a (meth)acrylate, and

wherein a theoretical value of a glass transition temperature of the region (b1-A) is at least 40° C.

5 . The coloring composition according to claim 4 ,

wherein the acidic functional group is an aromatic carboxyl group.

6 . A production method for a color filter for a solid-state imaging element, the method comprising:

a step (X) of forming a colored layer using the coloring composition according to claim 1 ; and

a step (Y) of patterning the colored layer through dry etching.

7 . The production method for a color filter for a solid-state imaging element according to claim 6 ,

wherein the step (X) includes

a step (X-1) of forming a coating film containing the coloring composition, and

a step (X-2) of obtaining the colored layer by thermosetting the coating film, and

wherein the step (Y) includes

a step (Y-1) of forming a photoresist layer on the colored layer,

a step (Y-2) of obtaining a resist pattern by patterning the photoresist layer through exposure and development,

a step (Y-3) of forming a colored pattern by patterning the colored layer through dry etching using the resist pattern as an etching mask, and

a step (Y-4) of bringing a stripping liquid into contact with the resist pattern to remove the resist pattern from the colored pattern.

8 . The production method for a color filter for a solid-state imaging element according to claim 7 ,

wherein the stripping liquid contains at least one selected from the group consisting of N-methylpyrrolidone, dimethyl sulfoxide, and monoethanolamine.