Semiconductor device and method of manufacture
View Patent ↗A semiconductor device has a conductive via laterally separated from the semiconductor, an encapsulant between the semiconductor device and the conductive via, and a mark. The mark is formed from characters that are either cross-free characters or else have a overlap count of less than two. In another embodiment the mark is formed using a wobble scan methodology. By forming marks as described, defects from the marking process may be reduced or eliminated.
1. A method of manufacturing a semiconductor device, the method comprising:
impacting a protective layer with a first laser beam pulse to remove a first portion of the protective layer, the protective layer being located over an encapsulant, wherein a semiconductor device and a via are embedded within the encapsulant; and
impacting the protective layer with a second laser beam pulse to remove a second portion of the protective layer, wherein the impacting the protective layer with the first laser beam pulse and the impacting the protective layer with the second laser beam pulse form part of a cross-free character.
2. The method of claim 1 , wherein the impacting the protective layer with the first laser beam pulse and the impacting the protective layer with the second laser beam pulse form a marking path, the marking path having an angle of between about 20° and about 30°.
3. The method of claim 1 , wherein the impacting the protective layer with the first laser beam pulse and the impacting the protective layer with the second laser beam pulse generates the cross-free character with an overlap count of less than one.
4. The method of claim 1 , wherein the protective layer has a thickness that is between about 0.5 μm and about 10 μm.
5. The method of claim 4 , wherein the protective layer has a thickness that is less than 5 μm.
6. The method of claim 1 , wherein a pitch between the first laser beam pulse and the second laser beam pulse is between about 2 μm and about 70 μm.
7. The method of claim 6 , wherein the pitch is less than 5.7 μm.
8. A method of manufacturing a semiconductor device, the method comprising:
receiving a first semiconductor device separated from a through via by an encapsulant, wherein a protective layer is located over the first semiconductor device; and
tracing a circular path across the protective layer with a plurality of laser beam pulses, wherein each of the plurality of laser beam pulses removes a portion of the protective layer, each portion of the protective layer having a diameter of less than about 100 μm.
9. The method of claim 8 , wherein the circular path has a crossing distance of between about 50 μm and about 200 μm.
10. The method of claim 9 , wherein the crossing distance is less than about 100 μm.
11. The method of claim 10 , wherein the circular path has a dot width between about 200 μm and about 80 μm.
12. The method of claim it wherein the dot width is less than about 150 μm.
13. The method of claim 8 , wherein at least one of the plurality of laser beam pulses has a time period of between about 1.0×10 −5 seconds and about 8.0×10 −5 seconds.
14. The method of claim 13 , wherein at least one of the plurality of laser beam pulses has an energy density of between about 1.0×10 −3 J/mm 2 and about 5.0×10 −2 J/mm 2 .
15. A method of manufacturing a semiconductor device, the method comprising:
receiving protective material over an encapsulant; and
forming a character partially through the protective material and over a first semiconductor device embedded within the encapsulant, the character having an overlap count of less than two, the forming the character comprising exposing the protective material to a plurality of laser beam pulses, each one of the plurality of laser beam pulses removing a separate portion of the protective material.
16. The method of claim 15 , wherein a line within the character has a width equal to a width of at least one of the plurality of laser beam pulses.
17. The method of claim 16 , wherein the width is between about 20 μm and about 120 μm.
18. The method of claim 15 , wherein at least one of the plurality of laser beam pulses has an energy density of between about 1.0×10 −3 J/mm 2 and about 5.0×10 −2 J/mm 2 .
19. The method of claim 15 , wherein at least one of the plurality of laser beam pulses has a time of between about 1.0×10 −5 seconds about 8.0×10 −5 seconds.
20. The method of claim 15 , wherein a pitch between a first one of the plurality of laser beam pulses and a second one of the plurality of laser beam pulses is between about 2 μm and about 70 μm.