IP Library › Granted Patent US 11,166,481
Granted Patent B2
US 11,166,481 · App. 17/081,837 · Granted Nov 9, 2021

Systems and methods for reactive gas-based product treatment

Inventors: Kevin M. Keener (Ames, IA); Daniel White (Chesterfield, MA); Daniel Cavanaugh (Alexandria, VA); Yaqoot Shaharyar (Northampton, MA)
Assignee: CLEAN CROP TECHNOLOGIES, INC.
A23L3/26A23B9/06A23L3/32A61L2/14B01J7/00A23V2002/00
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,166,481
App. No.
17/081,837
Granted
Nov 9, 2021
Kind
B2
Abstract

Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.

Claims (24)

1. A product treatment system, comprising:

a container defining a chamber and being configured to receive a feed gas and a product within the chamber and to discharge the product from the chamber;

a cold plasma reactor disposed and configured to generate, with the product and the feed gas within the chamber, a plasma within the chamber,

wherein:

the plasma diffuses through the chamber and the product and ionizes the feed gas to generate multiple reactive gas species (RGS) that decontaminate the product prior to the product being discharged from the chamber,

the cold plasma reactor is provided as first and second cold plasma reactors operably disposed on first and second sides of the container, respectively,

each of the first and second cold plasma reactors comprises first and second electrodes separated by an air gap, a dielectric layer interposed between the first and second electrodes and an exterior insulator interposed between the first and second electrodes and the chamber, and

wherein the dielectric layer and the exterior insulator are perforated to permit gas communication between the chamber and the air gap.

2. The product treatment system according to claim 1 , wherein the multiple RGS comprise ozone and at least one of an oxygen-containing reactive gas species and a nitrogen-containing reactive gas species.

3. The product treatment system according to claim 1 , wherein the multiple RGS comprise ozone and a reactive nitrogen-containing gas species, and wherein the system is configured to provide a concentration within the chamber of the reactive nitrogen-containing gas species, which temporarily exceeds a concentration of the ozone within the chamber.

4. The product treatment system according to claim 1 , wherein:

the container is provided as one or more containers and the cold plasma reactor is provided as one or more cold plasma reactors for each of the one or more containers, and

the one or more containers and the one or more cold plasma reactors for each of the one or more containers are operable in a continuous sequence.

5. The product treatment system according to claim 4 , further comprising at least one of:

a loading bin from which each of the one or more containers receives the product; and

a bin into which product is dischargeable from each of the one or more containers.

6. The product treatment system according to claim 1 , wherein the container defines one or more chambers and the cold plasma reactor is provided as one or more cold plasma reactors for each of the one or more chambers.

7. The product treatment system according to claim 1 , wherein:

the product is gravity-fed through the chamber, and

the product treatment system further comprises baffles disposed and configured to slow the gravity-feeding of the product through the chamber.

8. The product treatment system according to claim 1 , wherein:

the container defines one or more chambers and the cold plasma reactor is provided as one or more cold plasma reactors for each of the one or more chambers, and

the product treatment system further comprises a conveyor belt to convey the product through each of the one or more chambers.

9. The product treatment system according to claim 1 , wherein the feed gas is at least one of received from an external supply and generated by the cold plasma reactor.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 28, 2020
From: KEENER, KEVIN; WHITE, DANIEL; CAVANAUGH, DANIEL; SHAHARYAR, YAQOOT
To: CLEAN CROP TECHNOLOGIES, INC.
Reel/Frame 054192/0848 →
Continuity (2)
Provisional Application 62926933 · Oct 28, 2019
Related Publication 20210120848A1 · Apr 29, 2021
Cited By (2)
US 12,274,281 US 12,588,683