IP Library Granted Patent US 11,946,871
Granted Patent B2
US 11,946,871 · App. 17/085,856 · Granted Apr 2, 2024

Systems and methods for measuring a temperature of a gas

Inventors: Alexey Shashurin (West Lafayette, IN); Xingxing Wang (West Lafayette, IN)
Assignee: Purdue Research Foundation
G01N21/67G01N21/1702G01N2021/1704
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Quick Facts
Patent No.
US 11,946,871
App. No.
17/085,856
Granted
Apr 2, 2024
Kind
B2
Abstract

Methods and systems capable of measuring gas temperatures utilizing plasma discharges. Such a method performs a measurement of a temperature of a gas by generating a probing nanosecond plasma pulse in the gas, and then using an optical emission spectroscopy technique to measure the temperature of the gas by processing a light emission signal excited by the probing nanosecond plasma pulse.

Claims (24)

1. A method of performing a measurement of a temperature of a gas, the method comprising:

generating a main nanosecond discharge pulse within a location in a totally gaseous sample of the gas that causes primary breakdown of the gas to form a plasma discharge and excite a first instance of a light emission signal;

generating a probing nanosecond plasma pulse within the location in the totally gaseous sample of the gas at the plasma discharge to initiate additional breakdown of the gas during decay of the plasma discharge after the first instance of the light emission signal disappears, wherein the probing nanosecond plasma pulse creates a lower maximum voltage in the plasma discharge than the main nanosecond discharge pulse, and wherein heating of the plasma discharge by the probing nanosecond plasma pulse is negligible; and

using an optical emission spectroscopy technique to measure the temperature of the totally gaseous sample of the gas by processing a second instance of the light emission signal that is excited by the probing nanosecond plasma pulse.

2. The method of claim 1 , wherein the probing nanosecond plasma pulse is one of a plurality of plasma discharges of a nanosecond repetitively pulsed discharge.

3. The method of claim 1 , wherein the second instance of the light emission signal occurs 5 to 5000 microseconds after the probing nanosecond plasma pulse.

4. The method of claim 1 , wherein the measuring of the temperature of the totally gaseous sample of the gas is conducted in the wake of the probing nanosecond plasma pulse from initiation of the probing nanosecond plasma pulse to a time period after the additional breakdown of the gas.

5. The method of claim 1 , wherein the probing nanosecond plasma pulse is generated between two electrodes.

6. The method of claim 5 , wherein the two electrodes are pin electrodes.

7. The method of claim 1 , wherein the probing nanosecond plasma pulse has a pulse length of 10 ns or less.

8. The method of claim 1 , wherein the measuring of the temperature of the totally gaseous sample of the gas is spatially and temporally resolved to 5 nanoseconds.

9. The method of claim 1 , wherein the measuring of the temperature of the totally gaseous sample of the gas comprises rotational and vibrational temperature measurements.

10. The method of claim 1 , wherein the optical emission spectroscopy technique is conducted on the second positive system of nitrogen and the first and second instances of the light emission signal are emissions of the second positive system of nitrogen excited by the main nanosecond discharge pulse and the probing nanosecond plasma pulse, respectively.

11. The method of claim 10 , wherein the optical emission spectroscopy technique acquires a spectrum of the second instance of the light emission signal during a first 5 ns after initiation of the probing nanosecond plasma pulse to eliminate an effect of heating of the totally gaseous sample of the gas by the probing nanosecond plasma pulse.

12. The method of claim 1 , wherein the measuring of the temperature of the totally gaseous sample of the gas is performed in a combustion application.

13. A system for performing a measurement of a temperature of a gas, the system comprising:

means for generating a main nanosecond discharge pulse within a location in a totally gaseous sample of the gas that causes primary breakdown of the gas to form a plasma discharge and excite a first instance of a light emission signal;

means for generating a probing nanosecond plasma pulse within the location in the plasma discharge in the totally gaseous sample of the gas to initiate additional breakdown of the gas during decay of the plasma discharge after the first instance of the light emission signal disappears, wherein the probing nanosecond plasma pulse creates a lower maximum voltage in the plasma discharge than the main nanosecond discharge pulse, and wherein parameters of the probing nanosecond plasma pulse are such that heating of the plasma discharge by the probing nanosecond plasma pulse is negligible;

an optical emission spectrometer that receives a second instance of the light emission signal excited by the probing nanosecond plasma pulse within 5 ns of initiating the probing nanosecond plasma pulse; and

means for determining the temperature of the gas from the second instance of the light emission signal.

14. The system of claim 13 , wherein the generating means is a high-voltage pulse generator.

15. The system of claim 13 , wherein the pulse generator generates the probing nanosecond plasma pulse between two electrodes have a gap distance therebetween.

16. The system of claim 13 , wherein the pulse generator generates the probing nanosecond plasma pulse to have a pulse length of 10 ns or less.

17. The system of claim 13 , wherein the means for determining comprises software that determines the temperature of the totally gaseous sample of the gas from spectra acquired by the spectrometer.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 8, 2021
From: SHASHURIN, ALEXEY; WANG, XINGXING
To: PURDUE RESEARCH FOUNDATION
Reel/Frame 055862/0882 →
CONFIRMATORY LICENSE Recorded Apr 6, 2021
From: PURDUE UNIVERSITY
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 055844/0537 →
Continuity (2)
Provisional Application 62955269 · Dec 30, 2019
Related Publication 20210199590A1 · Jul 1, 2021