Nonvolatile memory device and operating method of the same
A nonvolatile memory device includes a resistance switching layer, a gate on the resistance switching layer, a gate oxide layer between the resistance switching layer and the gate, and a source and a drain, spaced apart from each other, on the resistance switching layer. A resistance value of the resistance switching layer is changed based on an illumination of light irradiated onto the resistance switching layer and is maintained as a changed resistance value.
1. A nonvolatile memory device comprising:
a resistance switching layer having a resistance value, the resistance switching layer configured to change the resistance value based on an illumination of light irradiated thereto, and the resistance switching layer configured to maintain the changed resistance value;
a gate on the resistance switching layer;
a gate oxide layer between the resistance switching layer and the gate; and
a source and a drain, spaced part from each other, on the resistance switching layer,
wherein the resistance switching layer includes defects such that charges, generated by the illumination of the light, are trapped in the resistance switching layer to maintain the change in the resistance value of the resistance switching layer.
2. The nonvolatile memory device of claim 1 , wherein the gate includes a transparent conducting electrode (TCE) gate above the resistance switching layer and configured to transmit the irradiated light.
3. The nonvolatile memory device of claim 1 , wherein the resistance switching layer includes a 2-dimensional (2D) material, the 2D material including at least one of a transition metal dichalcogenide (TMD), silicene, phosphorene (black phosphorus), or graphene.
4. The nonvolatile memory device of claim 3 , wherein the resistance switching layer is a single-layer.
5. The nonvolatile memory device of claim 3 , wherein the resistance switching layer is a multi-layer.
6. The nonvolatile memory device of claim 1 , wherein the resistance switching layer includes a 3-dimensional (3D) material, the 3D material including at least one of germanane, silicon, a group III-V semiconductor, or IGZO.
7. The nonvolatile memory device of claim 1 , wherein the gate oxide layer is a multi-layer including a charge trapping layer.
8. The nonvolatile memory device of claim 1 , wherein the change of the resistance value of the resistance switching layer includes, in a state in which an off-voltage is applied to the gate, decreasing the resistance value of the resistance switching layer as the illumination of the light irradiated to the resistance switching layer increases.
9. The nonvolatile memory device of claim 1 , wherein the resistance switching layer is configured to reset the resistance value when an on-voltage is applied to the gate.
10. A memory system comprising:
a crossbar array including
a plurality of presynaptic neurons,
a plurality of postsynaptic neurons, and
a plurality of synapses connecting the plurality of presynaptic neurons and the plurality of postsynaptic neurons, each of the plurality of synapses including the nonvolatile memory device of claim 1 ; and
a processor configured to obtain a source current from each column of the crossbar array.
11. The memory system of claim 10 , wherein the processor is configured to perform a vector-matrix operation of a neural network by applying a gate off-voltage to at least one row of the crossbar array and obtaining the source current from each of the columns of the crossbar array.