Apparatus and tuning method for mitigating RF load impedance variations due to periodic disturbances
A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted in accordance with a cost function, and the cost function is determined by intruding a perturbation into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal.
1. A radio frequency (RF) generator comprising:
a RF power source; and
a RF power controller coupled to the RF power source, the RF power controller configured to generate a control signal to vary an RF output signal from the RF power source, the RF power controller configured to adjust a parameter associated with the RF output signal in accordance with a synchronization signal,
wherein the parameter is adjusted in accordance with one of minimizing or maximizing a cost function responsive to introduction of a perturbation of the parameter.
2. The RF generator of claim 1 , wherein the cost function is determined in accordance with one of reflected power, delivered power, or magnitude of a reflection coefficient.
3. The RF generator of claim 1 , wherein a gradient is determined in accordance with the cost function, and the parameter is adjusted in accordance with the gradient.
4. The RF generator of claim 1 , wherein the parameter is adjusted in accordance with a plurality of adjustments arranged in a pattern.
5. The RF generator of claim 4 , wherein the pattern varies in accordance with a period of an external RF output signal.
6. The RF generator of claim 5 , wherein the external RF output signal comprises a plurality of bins, and wherein the parameter is perturbed in accordance with each bin of the plurality.
7. The RF generator of claim 5 , wherein each bin has a width and the width of a selected bin may be the same as or different than a width of another bin.
8. The RF generator of claim 1 , wherein the RF output signal is a source RF signal applied to a plasma chamber and the synchronization signal varies in accordance with an external RF output signal, and the external RF output signal is a bias RF signal applied to the plasma chamber.
9. The RF generator of claim 1 , wherein the RF power controller adjusts the parameter in accordance with the synchronization signal, wherein the synchronization signal indicates a relative position of an external RF output signal.
10. The RF generator of claim 1 , wherein the RF power controller is configured to adjust the parameter based on values stored in memory or determined dynamically.
11. The RF generator of claim 1 , wherein the parameter is one of a frequency or a frequency offset and includes a plurality of frequencies that the RF power controller introduces to the RF output signal in a predetermined order and timing in accordance with the synchronization signal.
12. The RF generator of claim 1 , wherein the parameter one of a reactance or a reactance offset and includes a plurality of reactances controlled by the RF power controller in a predetermined order and timing in accordance with the synchronization signal, wherein the reactance is at least one of a capacitance or an inductance.
13. The RF generator of claim 12 , wherein the at least one of a capacitance or an inductance is varied with a respective electronically variable capacitance or an electronically variable inductance.
14. The RF generator of claim 1 , wherein the cost function varies in accordance with an intermodulation distortion caused by an external RF output signal.
15. The RF generator of claim 1 , wherein the RF power controller further comprises a playback module, the playback module configured to detect the synchronization signal and to initiate adjustment of the parameter.
16. The RF generator of claim 15 , wherein the RF power controller further comprises a lookup table configured to store multiple adjustments of the parameter by the playback module following detection of the synchronization signal.
17. The RF generator of claim 1 wherein the synchronization signal is one of periodic or non-periodic.
18. The RF generator of claim 1 , wherein the parameter is perturbed in accordance with a correction pattern.
19. The RF generator of claim 18 wherein the correction pattern may be varied by at least one of applying an offset to the correction pattern or applying a scaling factor to the correction pattern.
20. The RF generator of claim 19 wherein the parameter is adjusted by at least one of applying the offset or applying the scaling factor to the correction pattern.
21. The RF generator of claim 20 , wherein the RF output signal comprises a plurality of bins, and wherein the correction pattern determines the perturbation of the parameter for each bin of the plurality.
22. The RF generator of claim 21 wherein varying the correction pattern correspondingly varies the perturbation for each bin of the plurality.
23. The RF generator of claim 18 wherein the parameter is perturbed in accordance with the correction pattern and a second pattern orthogonal to the correction pattern.
24. A radio frequency (RF) generator comprising:
a RF power source; and
a RF power controller coupled to the RF power source, the RF power controller configured to generate a control signal to vary an RF output signal from the RF power source, the RF power controller configured to adjust a parameter associated with the RF output signal in accordance with a synchronization signal,
wherein the parameter is perturbed in accordance with a correction pattern, and the parameter is adjusted in accordance with one of minimizing or maximizing a cost function responsive to perturbation of the parameter by the correction pattern, and
wherein the correction pattern may be varied by applying an offset to the correction pattern or applying a scaling factor to the correction pattern.
25. The RF generator of claim 24 , wherein the RF output signal comprises a plurality of bins, and wherein the correction pattern determines the perturbation of the parameter for each bin of the plurality.
26. The RF generator of claim 24 wherein varying the correction pattern correspondingly varies the perturbation for each bin of the plurality.
27. The RF generator of claim 26 , wherein each bin has a width and the width of a selected bin may be the same as or different than a width of another bin.
28. The RF generator of claim 24 wherein the parameter is perturbed in accordance with the correction pattern and a second pattern orthogonal to the correction pattern.
29. The RF generator of claim 24 , wherein the RF power controller adjusts the parameter in accordance with the synchronization signal, wherein the synchronization signal indicates a relative position of an external RF output signal.
30. The RF generator of claim 24 , wherein:
the parameter is one of a frequency or a frequency offset and includes a plurality of frequencies that the RF power controller introduces to the RF output signal in a predetermined order and timing in accordance with the synchronization signal, or
the parameter one of a reactance or a reactance offset and includes a plurality of reactances controlled by the RF power controller in a predetermined order and timing in accordance with the synchronization signal, wherein the reactance is at least one of a capacitance or an inductance.