Ferroelectric memory device and method of forming the same
A device includes a multi-layer stack, a channel layer, a ferroelectric layer and buffer layers. The multi-layer stack is disposed on a substrate and includes a plurality of conductive layers and a plurality of dielectric layers stacked alternately. The channel layer penetrates through the plurality of conductive layers and the plurality of dielectric layers. The ferroelectric layer is disposed between the channel layer and each of the plurality of conductive layers and the plurality of dielectric layers. The buffer layers include a metal oxide, and one of the buffer layers is disposed between the ferroelectric layer and each of the plurality of dielectric layers.
1. A device, comprising:
a multi-layer stack, disposed on a substrate and comprising a plurality of conductive layers and a plurality of dielectric layers stacked alternately;
a channel layer, penetrating through the plurality of conductive layers and the plurality of dielectric layers;
a ferroelectric layer, disposed between the channel layer and each of the plurality of conductive layers and the plurality of dielectric layers; and
a plurality of buffer layers, comprising a metal oxide, one of the plurality of buffer layers disposed between the ferroelectric layer and each of the plurality of dielectric layers,
wherein a sidewall of each buffer layer is recessed from a sidewall of the adjacent conductive layer by a non-zero distance.
2. The device of claim 1 , wherein the non-zero distance ranges from about 1-5 nm.
3. The device of claim 1 , wherein the buffer layers are in a mixed crystalline-amorphous state.
4. The device of claim 1 , wherein the plurality of buffer layers comprise La 2 O 3 , Al 2 O 3 , MgO or a combination thereof.
5. The device of claim 1 , wherein the ferroelectric layer comprises HfZrO, HfAlO, HfLaO, HfCeO, HfO, HfGdO, HfSiO or a combination thereof.
6. The device of claim 1 , wherein the plurality of buffer layers comprise a material the same as that of the ferroelectric layer.
7. The device of claim 1 , wherein the plurality of buffer layers comprise a material different from that of the ferroelectric layer.
8. The device of claim 1 , wherein the plurality of buffer layers have a thickness of about 1-5 nm.
9. The device of claim 1 , wherein the plurality of ferroelectric layers have a thickness of about 1-20 nm.
10. A device, comprising:
a multi-layer stack, disposed on a substrate and comprising a plurality of gate electrode layers and a plurality of dielectric layers stacked alternately;
a plurality of isolation structures, disposed on the substrate and penetrating through the multi-layer stack;
a channel layer, disposed between the multi-layer stack and each of the isolation structures;
a ferroelectric layer, disposed between the channel layer and the multi-layer stack, wherein the ferroelectric layer is in contact with each of the gate electrode layers but separated from each of the dielectric layers of the multi-layer stack, and
a plurality of buffer layers, wherein a bottom surface of the lowermost buffer layer is flushed with a bottom surface of the ferroelectric layer.
11. The device of claim 10 , wherein each of the plurality of buffer layers is disposed between the ferroelectric layer and each of the plurality of dielectric layers.
12. The device of claim 11 , wherein the plurality of buffer layers comprise a metal oxide.
13. The device of claim 10 , wherein the ferroelectric layer comprises a metal oxide.
14. The device of claim 10 , further comprising a plurality of conductive pillars disposed on the substrate and penetrating through the multi-layer stack, wherein each of the plurality of isolation structures has two conductive pillars disposed at two ends thereof.
15. The device of claim 10 , wherein the channel layer comprises an oxide semiconductor material.
16. The device of claim 10 , wherein each of the plurality of isolation structures is disposed between two memory devices.
17. A device, comprising:
a multi-layer stack disposed on a substrate and comprising:
a plurality of metal lines and a plurality of insulating lines stacked alternately, wherein sidewalls of the metal lines are protruded from sidewalls of the insulating lines; and
a plurality of first metal oxide layers, disposed on the sidewalls of the insulating lines, respectively; and
a second metal oxide layer, disposed on the sidewalls of the metal lines and on sidewalls of the first metal oxide layers,
wherein the sidewalls of the first metal oxide layers are not flushed with the sidewalls of the metal lines.
18. The device of claim 17 , wherein the first metal oxide layers and the second oxide layer are made by the same material.
19. The device of claim 17 , wherein the first metal oxide layers and the second oxide layer are made by different materials.
20. The device of claim 17 , wherein ends of the conductive lines and ends of the insulating lines are arranged in a staircase configuration.