Membrane for EUV lithography
Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
1. A membrane for EUV lithography, the membrane comprising:
a base layer; and
an emissivity layer, the emissivity layer having a higher emissivity in the infrared range than the base layer, and the emissivity layer has an irregular surface opposite to a surface of the emissivity layer facing the base layer,
wherein the membrane is configured to transmit radiation from a vacuum or gaseous environment at a first side of the membrane through the base and emissivity layers to an open environment at a second side of the membrane, the second side opposite to the first side.
2. The membrane according to claim 1 , wherein the emissivity layer is provided on an irregular surface of the base layer; and
the emissivity layer has a thickness such that irregularity of the irregular surface of the base layer produces a corresponding irregularity in the irregular surface of the emissivity layer.
3. The membrane according to claim 1 , wherein the irregular surface has peaks and troughs, and irregularity of the irregular surface is such that an average peak-to-trough height difference is at least 2 nm.
4. The membrane according to claim 1 , wherein the irregular surface has peaks and wherein average in-plane separation between the peaks is less than about 100 nm.
5. The membrane according to claim 1 , wherein the irregular surface is formed by (i) an irregular support surface of a planar support layer, or (ii) a surface of the base layer, or (iii) both (i) and (ii).
6. The membrane according to claim 1 , wherein the irregular surface is formed by an irregular support surface of a planar support layer and the planar support layer comprises a polycrystalline material.
7. The membrane according to claim 1 , wherein the irregular surface is a surface having facets with random directions and sizes, and wherein the facets redirect zero-order normal incidence reflections in random directions.
8. The membrane according to claim 1 , wherein the irregular surface is formed by an irregular support surface of a planar support layer and wherein the planar support layer and the emissivity layer have thicknesses in the range of 1 nm to 10 nm.
9. The membrane according to claim 1 , wherein the irregular surface has a plurality of faces and wherein the faces are arranged such that an average angle, relative to a normal to the membrane, is less than 85%.
10. The membrane according to claim 1 , wherein the base layer comprises silicon.
11. The membrane according to claim 1 , wherein the emissivity layer comprises one or more selected from: Ru, Mo, Zr and/or Nb.
12. The membrane according to claim 1 , further comprising a capping layer.
13. The membrane according to claim 1 , further comprising an additional layer, wherein a surface of a planar support layer is an irregular support surface due to the planar support layer having been formed on an irregular surface of the additional layer.
14. The membrane according to claim 1 , wherein the irregular surface is formed by an irregular support surface of a planar support layer and wherein the base layer is in contact with the planar support layer.
15. The membrane according to claim 1 , comprising a silicon wafer support.
16. The membrane according to claim 15 , wherein the irregular surface of the emissivity layer is located the furthest from the silicon wafer support.
17. A pellicle assembly comprising:
the membrane according to claim 1 ; and
a frame configured to attach the membrane to a patterning device.
18. A method of manufacturing a membrane for EUV lithography, the method comprising:
providing a base layer of the membrane; and
providing an emissivity layer of the membrane, the emissivity layer having a higher emissivity in the infrared range than the base layer, wherein the emissivity layer has an irregular surface opposite to a surface of the emissivity layer facing the base layer,
wherein the membrane is configured to transmit radiation from a vacuum or gaseous environment at a first side of the membrane through the base and emissivity layers to a vacuum or gaseous environment at a second side of the membrane, the second side opposite to the first side.
19. The method according to claim 18 , wherein the base layer and/or a planar support layer formed on the base layer is processed to produce the irregular support surface.
20. A membrane assembly for EUV lithography, the membrane assembly comprising:
a membrane comprising:
a base layer, and
an emissivity layer having a higher emissivity in the infrared range than the base layer, the emissivity layer having an irregular surface opposite to a surface of the emissivity layer facing the base layer; and
a border structure of the membrane,
wherein the membrane is free-standing with respect to the border.