Field-effect transistor (FET) with self-aligned ferroelectric capacitor and methods of fabrication
A memory device structure includes a transistor structure including a gate electrode over a top surface of a fin and adjacent to a sidewall of the fin, a source structure coupled to a first region of the fin and a drain structure coupled to a second region of the fin, where the gate electrode is between the first and the second region. A gate dielectric layer is between the fin and the gate electrode. The memory device structure further includes a capacitor coupled with the transistor structure, the capacitor includes the gate electrode, a ferroelectric layer on a substantially planar uppermost surface of the gate electrode and a word line on the ferroelectric layer.
1. A memory device, comprising:
a plurality of transistor structures, wherein individual ones of the plurality of transistors are laterally separated by an intervening dielectric, and wherein individual ones of the plurality of transistors comprise:
a gate electrode over a top surface of a fin and adjacent to a sidewall of an upper portion of the fin, the upper portion of the fin having a vertical thickness over an underlying dielectric adjacent to a sidewall of a lower portion of the fin;
a source structure coupled to a first region of the fin and a drain structure coupled to a second region of the fin, wherein the gate electrode is between the first and the second region; and
a gate dielectric layer between the sidewall of the upper portion of the fin and the gate electrode, and between the gate electrode and a sidewall of the intervening dielectric; and
a plurality of capacitors, wherein individual ones of the plurality of capacitors are coupled with individual ones of the plurality of transistors, the individual ones of the plurality of capacitors, comprising:
the gate electrode;
a ferroelectric layer on a substantially planar uppermost surface of the gate electrodes of the individual ones of the plurality of transistors and wherein the ferroelectric layer extends continuously between the uppermost surface of the gate electrodes of the individual ones of the plurality of transistors and over the intervening dielectric; and
a word line on the ferroelectric layer, wherein the word line extends continuously between the uppermost surface of the gate electrodes of the individual ones of the plurality of transistors and over the intervening dielectric.
2. The memory device of claim 1 , wherein the sidewall of the upper portion of the fin is a first sidewall of the upper portion of the fin, and the gate electrode is adjacent to a second sidewall of the upper portion of the fin, wherein the second sidewall is opposite to the first sidewall of the upper portion of the fin.
3. The memory device of claim 2 , wherein the fin comprises a first lateral thickness defined by a distance between the first sidewall of the upper portion of the fin and the second sidewall of the upper portion of the fin, and wherein the vertical thickness is at least 5 times the first lateral thickness.
4. The memory device of claim 3 , wherein the planar uppermost surface of the gate electrode comprises a second lateral thickness measured along a direction from the first sidewall of the upper portion of the fin to the second sidewall of the upper portion of the fin, and wherein the second lateral thickness is less than a combined sum of the first lateral thickness and two times the vertical thickness.
5. The memory device of claim 4 , wherein the ferroelectric layer and the word line each comprise a third lateral thickness measured along the direction from the first sidewall of the upper portion of the fin to the second sidewall of the upper portion of the fin, and wherein the third lateral thickness is greater than two times the second lateral thickness.
6. The memory device of claim 4 , wherein the second lateral thickness is less than the vertical thickness.
7. The memory device of claim 2 , wherein the fin comprises a first lateral thickness defined by a distance between the first sidewall of the upper portion of the fin and the second sidewall of the upper portion of the fin, and wherein the vertical thickness is at least 3 times the first lateral thickness.
8. The memory device of claim 7 , wherein the planar uppermost surface of the gate electrode comprises a second lateral thickness measured along a direction from the first sidewall to the second sidewall, wherein the second lateral thickness is less than a combined sum of the first lateral thickness and two times the vertical thickness.
9. The memory device of claim 8 , wherein the second lateral thickness is less than the vertical thickness.
10. The memory device of claim 1 , wherein the ferroelectric layer comprises oxygen and one or more of lead, hafnium, zirconium, aluminum, titanium, yttrium, strontium, or titanium, or oxygen and two or more of lead, silicon, hafnium, zirconium, aluminum, titanium, yttrium, strontium, or titanium.
11. The memory device of claim 1 , wherein the ferroelectric layer comprises a thickness between 2 nm and 50 nm.
12. The memory device of claim 1 , wherein the gate dielectric layer comprises a thickness between 1 nm and 2 nm, and wherein the gate dielectric layer comprises a material that is different from a material of the ferroelectric layer.
13. The memory device of claim 1 , wherein the ferroelectric layer is in contact with a portion of the gate dielectric layer not adjacent to the fin.