Method for preparing the nail art
A method for preparing a nail art includes: applying a pressure to a laminate including a pre-substrate layer and a pre-coating layer by a mold to form a nail art including a substrate layer and a coating layer from the laminate, wherein when the pressure is applied, a temperature of the mold is 60° C. to 160° C., and the pressure is applied at 6 MPa to 12 MPa.
1. A method for preparing a nail art, the method comprising: applying a pressure to a laminate including a pre-substrate layer and a pre-coating layer by a mold to form a nail art including a substrate layer and a coating layer from the laminate, wherein when the pressure is applied, a temperature of the mold is 55° C. to 170° C., and the pressure is applied at 6 MPa to 12 MPa, wherein a pressing surface of the mold is in a form having an outer periphery and an inner periphery spaced apart from the outer periphery, the width of the pressing surface is 0.3 mm to 1.5 mm; and wherein the pressure is applied for between 1 to 20 seconds such that an outer periphery of the nail art achieves a gentle curve.
2. The method for preparing a nail art of claim 1 , further comprising: before applying the pressure, disposing at least one or more process films between the pre-coating layer and the mold.
3. The method for preparing a nail art of claim 2 , wherein a melting point of the process film is higher than the temperature of the mold.
4. The method for preparing a nail art of claim 2 , wherein one to three process films are disposed between the pre-coating layer and the mold.
5. The method for preparing a nail art of claim 2 , wherein the process film has a thickness of 9 μm to 188 μm.
6. The method for preparing a nail art of claim 5 , wherein the pre-coating layer includes a UV-curable raw material, a photoinitiator, and a resin.
7. The method for preparing a nail art of claim 6 , wherein the pre-coating layer includes:
30 wt % to 58 wt % of the UV-curable raw material,
0.1 wt % to 20 wt % of the photoinitiator, and
40 wt % to 55 wt % of the resin, in a solid content.
8. The method for preparing a nail art of claim 6 , wherein the UV-curable raw material includes at least any one selected from the group consisting of urethane acrylate-based oligomers, polyester acrylate-based oligomers, polyether acrylate-based oligomers, epoxy acrylate-based oligomers, polycarbonate acrylate-based oligomers, silicone acrylate-based oligomers, and acryl acrylate-based oligomers.
9. The method for preparing a nail art of claim 6 , wherein the UV-curable raw material includes the urethane acrylate-based oligomer.
10. The method for preparing a nail art of claim 6 , wherein the photoinitiator has an absorption wavelength band in a range of 200 nm to 600 nm.
11. The method for preparing a nail art of claim 6 , wherein the resin includes at least any one selected from the group consisting of acryl-based resins, nitrocellulose resins, urethane-based resins, acetic acid resins, ester-based resins, vinyl chloride resins, and styrene resins.
12. The method for preparing a nail art of claim 6 , wherein the resin is a thermoplastic resin having a glass transition temperature (T g ) of 30° C. to 200° C.
13. The method for preparing a nail art of claim 5 , wherein the substrate layer includes an adhesive layer.
14. The method for preparing a nail art of claim 13 , wherein the substrate layer further includes a design layer disposed between the adhesive layer and the coating layer.