IP Library Granted Patent US 11,538,655
Granted Patent B2
US 11,538,655 · App. 17/135,915 · Granted Dec 27, 2022

Multi-beam inspection apparatus

Inventors: Xuerang Hu (San Jose, CA); Xuedong Liu (San Jose, CA); Zhong-wei Chen (San Jose, CA); Weiming Ren (San Jose, CA)
Assignee: ASML Netherlands B.V.
H01J37/153H01J37/14H01J37/1472H01J2237/1532H01J2237/1534
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Quick Facts
Patent No.
US 11,538,655
App. No.
17/135,915
Granted
Dec 27, 2022
Kind
B2
Abstract

An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro-structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.

Claims (18)

1. A pole structure array including a plurality of pole structures arranged around an optical axis, the pole structure array comprising: a first group of pole structures of the plurality of pole structures, wherein the pole structures of the first group are configured to be driven by a first driver and are positioned approximate to a first radial shift from the optical axis; and a second group of pole structures of the plurality of pole structures, wherein the pole structures of the second group are configured to be driven by a second driver and are positioned approximate to a second radial shift from the optical axis.

2. The pole structure array of claim 1 , wherein the first driver is configured to enable the pole structures of the first group to function as micro-deflectors to deflect a first group of beamlets in a charged-particle multi-beam apparatus.

3. The pole structure array of claim 1 , wherein the second driver is configured to enable the pole structures of the second group to function as micro-deflectors to deflect a second group of beamlets in a charged-particle multi-beam apparatus.

4. The pole structure array of claim 1 , wherein the first driver is configured to enable the pole structures of the first group to function as micro-stigmators to compensate astigmatism aberrations of a first group of beam spots in a charged-particle multi-beam apparatus.

5. The pole structure array of claim 1 , wherein the second driver is configured to enable the pole structures of the second group to function as micro-stigmators to compensate astigmatism aberrations of a second group of beam spots in a charged-particle multi-beam apparatus.

6. The pole structure array of claim 1 , wherein the pole structures of the first group are single-pole structures.

7. The pole structure array of claim 6 , wherein the first driver is configured to enable the pole structures of the first group to function as micro-lenses to compensate field curvature aberrations of a first group of beam spots in a charged-particle multi-beam apparatus.

8. The pole structure array of claim 1 , wherein the plurality of pole structures have corresponding symmetry planes and the plurality of pole structures are rotated such that the corresponding symmetry planes are substantially parallel to corresponding radial directions from the optical axis.

9. The pole structure array of claim 8 , wherein each of the plurality of pole structures is bisected into symmetrical two parts by each of the corresponding symmetry planes.

10. A source conversion unit, comprising: a first pole structure array including a plurality of pole structures arranged around an optical axis, the first pole structure array comprising: a first group of pole structures of the plurality of pole structures, wherein the pole structures of the first group are configured to be driven by a first driver and are positioned approximate to a first radial shift from the optical axis; and a second group of pole structures of the plurality of pole structures, wherein the pole structures of the second group are configured to be driven by a second driver and are positioned approximate to a second radial shift from the optical axis.

11. The source conversion unit of claim 10 , wherein the first driver is configured to enable the pole structures of the first group to function as micro-deflectors to deflect a first group of beamlets in a charged-particle multi-beam apparatus.

12. The source conversion unit of claim 10 , wherein the second driver is configured to enable the pole structures of the second group to function as micro-deflectors to deflect a second group of beamlets in a charged-particle multi-beam apparatus.

13. The source conversion unit of claim 10 , wherein the first driver is configured to enable the pole structures of the first group to function as micro-stigmators to compensate astigmatism aberrations of a first group of beam spots in a charged-particle multi-beam apparatus.

14. The source conversion unit of claim 10 , wherein the second driver is configured to enable the pole structures of the second group to function as micro-stigmators to compensate astigmatism aberrations of a second group of beam spots in a charged-particle multi-beam apparatus.

15. The source conversion unit of claim 10 , wherein the pole structures of the first group are single-pole structures.

16. The source conversion unit of claim 15 , wherein the first driver is configured to enable the pole structures of the first group to function as micro-lenses to compensate field curvature aberrations of a first group of beam spots in a charged-particle multi-beam apparatus.

17. The source conversion unit of claim 10 , wherein the plurality of pole structures have corresponding symmetry planes and the plurality of pole structures are rotated such that the corresponding symmetry planes are substantially parallel to corresponding radial directions from the optical axis.

18. The source conversion unit of claim 17 , wherein each of the plurality of pole structures is bisected into symmetrical two parts by each of the corresponding symmetry planes.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2020
From: HU, XUERANG; LIU, XUEDONG; CHEN, ZHONGWEI; REN, WEIMING
To: HERMES MICROVISION, INC.
Reel/Frame 054759/0582 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2020
From: HERMES MICROVISION, INC.
To: HERMES MICROVISION INCORPORATED B.V.
Reel/Frame 054759/0603 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 28, 2020
From: HERMES MICROVISION INCORPORATED B.V.
To: ASML NETHERLANDS B.V.
Reel/Frame 054759/0617 →
Continuity (3)
Continuation 16401065 · May 1, 2019
Provisional Application 62665451 · May 1, 2018
Related Publication 20210151280A1 · May 20, 2021