Method of growing bulk single crystal diamond on a substrate in a prescribed gas environment at a prescribed temperature and pressure

1. A method of forming one or more diamonds, the method comprising:

providing a growth chamber having a gas environment;

positioning a single crystal diamond substrate within the growth chamber;

depositing diamond material on the single crystal diamond substrate for epitaxial growth, the single crystal diamond substrate having a given crystal orientation;

growing single crystal diamond outwardly on the single crystal diamond substrate at a prescribed temperature, prescribed pressure, and with a prescribed gas content for the gas environment to produce a bulk single crystal diamond,

the prescribed gas environment having a nitrogen concentration of 2 ppm to 5 ppm for a first growth period,

the prescribed temperature being greater than 650 degrees C. and less than 950 degrees C.,

the prescribed pressure being greater than 130 Torr and less than 175 Torr;

altering the prescribed gas environment to have the nitrogen concentration of 0.5 ppm to 1.5 ppm for a second growth period after the first growth period.

2. The method of claim 1 wherein depositing comprises using plasma assisted chemical vapor deposition techniques.

3. The method of claim 1 wherein the gas environment is free of oxygen.

4. The method of claim 1 wherein the gas environment includes one or more of oxygen, argon, methane, and hydrogen.

5. The method of claim 1 wherein a diamond formed from depositing the diamond material has a maximum dimension of greater than 15 millimeters.

6. The method of claim 1 further comprising producing a plurality of diamonds simultaneously.

7. The method of claim 1 wherein growth is performed on the diamond surface.

8. The method of claim 1 wherein the prescribed temperature varies when continuing growth.

9. The method of claim 1 wherein the prescribed pressure varies when continuing growth.

10. The method of claim 1 wherein a growth surface of the diamond has a (100) orientation with a miscut/misorientation in the range of ±5 degrees.

11. A method of growing one or more single-crystal diamond, the method comprising:

providing a substrate in a growth chamber, the substrate having a (100) crystal orientation with a miscut of + or −5 degrees;

setting a nitrogen gas concentration in the growth chamber to be between 2.0 ppm and 5.0 ppm for a first period of time;

setting a temperature in the growth chamber to be between 650 C and 1100 C;

setting a pressure in the growth chamber to be between 135 Torr and 175 Torr;

growing a first single-crystal diamond layer on the substrate;

changing the nitrogen gas concentration in the growth chamber to be between 0.5 ppm and 1.5 ppm for a second period of time after the first period of time;

growing a second single-crystal diamond layer directly or indirectly on the first single-crystal diamond layer, the second single-crystal diamond layer having a greater width and/or length than the first single-crystal diamond layer.

12. The method as defined by claim 11 , wherein the first period of time is between 1 hour and 48 hours.

13. The method as defined by claim 11 , wherein the second period of time is between 350 hours and 750 hours.

14. The method as defined by claim 11 , further comprising depositing layers to form a bulk diamond of between 3.5 carats and 9 carats.

15. The method as defined by claim 14 , wherein the bulk diamond is formed continuously.

16. The method as defined by claim 11 , further comprising depositing layers to form a bulk diamond of between 10 carats and 20 carats.

17. The method as defined by claim 11 , further comprising growing diamond layers outwardly.

18. The method as defined by claim 11 , wherein the seed is a diamond seed.