Carbyne-based sensing device for high spatial resolution in DNA sequencing and biomolecule characterization and method of fabricating the same
View Patent ↗A method of fabricating a sensing device for DNA sequencing and biomolecule characterization including the steps of fabricating a microelectrode chip having a silicon substrate and a silicon nitride diaphragm, attaching a monolayer graphene sheet to the silicon nitride diaphragm, dicing a portion of the monolayer graphene sheet to form a graphene microribbon, converting the graphene microribbon to a graphene nanoribbon, and converting the graphene nanoribbon to a carbyne. A sensing device for DNA sequencing and biomolecule characterization is also disclosed. The sensing device includes a silicon substrate, a cavity in the silicon substrate covered by a silicon nitride layer, microelectrodes attached to the silicon nitride layer, graphene covering the microelectrodes, and carbyne attached to a portion of the silicon nitride layer covering said cavity.
1. A method of fabricating a sensing device for DNA sequencing and biomolecule characterization comprising the steps of:
fabricating a microelectrode chip comprising a silicon substrate and a silicon nitride diaphragm;
attaching a monolayer graphene sheet to said silicon nitride diaphragm;
dicing a portion of said monolayer graphene sheet to form a graphene microribbon;
converting said graphene microribbon to a graphene nanoribbon; and
converting said graphene nanoribbon to a carbyne.
2. The method of claim 1 , wherein said the step of fabricating a microelectrode chip comprises the steps of:
depositing a layer of silicon nitride on a first surface of said silicon substrate;
performing photolithography on a second surface of said silicon substrate;
performing potassium hydroxide etching to create a cavity in said second surface of said silicone substrate, wherein said silicon nitride diaphragm covers an end of said cavity;
depositing a layer of chromium and a layer of gold on said layer of silicon nitride;
performing photolithography on said second surface of said silicon substrate; and
immersing said silicon substrate in gold etchant and immersing said silicon substrate in a chromium etchant to form microelectrodes.
3. The method of claim 1 , wherein said step of converting said graphene microribbon to a graphene nanoribbon comprises the step of performing atomic force microscopy nanolithography.
4. The method of claim 1 , wherein said step of converting said graphene nanoribbon to a carbyne comprises the step of performing electron irradiation.
5. The method of claim 2 , wherein said step of depositing a layer of silicon nitride on a first surface of said silicon substrate comprises the step of using chemical vapor deposition.
6. The method of claim 2 , wherein said step of attaching a monolayer graphene sheet to said silicon nitride diaphragm comprises the step of attaching said monolayer graphene sheet at a position where said microelectrodes contact said silicon nitride diaphragm.
7. The method of claim 1 , wherein said step of dicing a portion of said monolayer graphene sheet to form said graphene microribbon comprises the step of using a dicing station.
8. The method of claim 1 , wherein said step of converting said graphene nanoribbon to said carbyne comprises the step of using transmission electron microscopy.
9. A sensing device for DNA sequencing and biomolecule characterization comprising:
a silicon substrate;
a cavity in said silicon substrate covered by a silicon nitride layer;
microelectrodes attached to said silicon nitride layer;
graphene covering said microelectrodes; and
carbyne attached to a portion of said silicon nitride layer covering said cavity.
10. The sensing device of claim 9 , wherein said graphene is a monolayer.