IP Library Granted Patent US 11,688,596
Granted Patent B2
US 11,688,596 · App. 17/175,302 · Granted Jun 27, 2023

Systems and methods lattice spray substrates for mass spectrometry

Inventors: Maria C. Prieto Conaway (Pleasanton, CA); Joshua R. Deotte (Livermore, CA); Nikola Dudukovic (Hayward, CA); Eric B. Duoss (Danville, CA); Bryan D. Moran (Pleasanton, CA)
Assignee: Lawrence Livermore National Security, LLC
H01J49/0409B33Y80/00
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Quick Facts
Patent No.
US 11,688,596
App. No.
17/175,302
Granted
Jun 27, 2023
Kind
B2
Abstract

The present disclosure relates to a lattice substrate adapted for use in direct ionization mass spectrometry. The substrate may have a plurality of tessellated unit cells forming an integral structure. Each tessellated unit cell may have a dimension of no more than about 1.5 mm and may include a plurality of pores arranged in an ordered pattern. The substrate may further include a form factor suitable for use with a direct ionization mass spectrometry system.

Claims (39)

1. A lattice substrate adapted for use in direct ionization mass spectrometry, the substrate comprising:

a plurality of tessellated unit cells forming an integral structure, the tessellated unit cells each being formed by a plurality of intersecting filaments;

each said tessellated unit cell having a dimension of no more than about 1500 μm, and including a first plurality of voids formed by the intersecting filaments, the first plurality of voids being arranged in a first ordered pattern;

each said filament including a secondary lattice structure having a second plurality of voids formed by a plurality of struts that extend non-parallel to one another in three dimensions, the second plurality of voids also forming a second ordered three dimensional pattern; and

a form factor suitable for use with a direct ionization mass spectrometry system.

2. The substrate of claim 1 , wherein each said tessellated unit cell comprises an Octet-truss shape.

3. The substrate of claim 1 , wherein struts of the secondary lattice structure comprise a plurality of intersecting struts which form the second plurality of voids.

4. The substrate of claim 3 , wherein each one of said plurality of intersecting struts has a diameter in a range of between 100 microns and 300 nanometers.

5. The substrate of claim 1 , wherein each one of said intersecting filaments has a diameter in a range between 500 microns and 10 microns.

6. The substrate of claim 1 , wherein the tessellated unit cells differ in size along a dimension of the substrate, to provide an engineered porosity to the substrate over a dimension thereof.

7. The substrate of claim 6 , wherein at least some of the tessellated unit cells comprise an Octet-truss shape.

8. The substrate of claim 1 , wherein the tessellated unit cells differ in size along a length dimension of the substrate.

9. The substrate of claim 1 , wherein the substrate includes:

a length of no more than about 29.5 mm;

a width of no more than about 6 mm;

a thickness of no more than about 500 microns; and

a pointed end at one outermost end thereof.

10. The substrate of claim 9 , wherein the tessellated unit cells each comprise Octet-truss shaped unit cells having a dimension of about 500 microns in each of length, width and height, and each one of the first plurality of voids forming a pyramid shaped void.

11. A lattice substrate adapted for use in direct ionization mass spectrometry, the substrate comprising:

a plurality of tessellated unit cells forming an integral, elongated flat structure with first and second ends, and one of the first and second ends forming a pointed end;

each said tessellated unit cell having a dimension of no more than about 1.5 mm, and each said tessellated unit cell forming a plurality of internal voids acting as pores, with the pores arranged in an ordered pattern along a length of the substrate;

the substrate including a form factor with a length and width each being greater than a thickness thereof; and

the tessellated unit cells including Octet-truss shaped unit cells.

12. The lattice substrate of claim 11 , wherein the form factor includes:

a length of no more than about 25 mm; and

a thickness of no more than about 500 microns.

13. The lattice substrate of claim 12 , wherein the form factor includes a width of no more than about 20 mm.

14. The substrate of claim 11 , wherein the first plurality of voids within each said tessellated unit cell creates an engineered, varying porosity over a length of the substrate.

15. A method of constructing a lattice substrate adapted for use in direct ionization mass spectrometry, the method including:

forming a substrate having a plurality of tessellated unit cells, each one of the tessellated unit cells having a plurality of intersecting filaments and the plurality of tessellated unit cells forming an integral structure;

forming the tessellated unit cells such that each has a dimension of no more than about 1.5 mm, and such that each one of said tessellated unit cells includes a first plurality of voids arranged in an ordered pattern;

further forming each said intersecting filament with a secondary lattice structure, the secondary lattice structure having a plurality of struts that extend and intersect in three non-parallel dimensions to form a second plurality of voids therein; and

further forming the substrate with a form factor suitable for use with a direct ionization mass spectrometry system.

16. The method of claim 15 , wherein forming the substrate comprises creating the substrate with a three-dimensional printing process using a least one of a polymer, a ceramic or a metal.

17. A lattice substrate adapted for use in direct ionization mass spectrometry, the substrate comprising:

a plurality of tessellated unit cells having a plurality of intersecting filaments forming an integral structure;

each said tessellated unit cell including a first plurality of voids, formed by the intersecting filaments, where the first plurality of voids extend in three dimensions in a first ordered pattern;

each said filament comprises of a secondary lattice structure, with the secondary lattice structing including a plurality of intersecting struts extending non-parallel to one another in three dimensions, and forming a second plurality of voids extending in a three dimensional, second ordered pattern therewithin; and

a form factor suitable for use with a direct ionization mass spectrometry system.

Assignments (2)
CONFIRMATORY LICENSE (SEE DOCUMENT FOR DETAILS) Recorded May 13, 2021
From: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
To: U.S. DEPARTMENT OF ENERGY
Reel/Frame 056238/0625 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 16, 2021
From: PRIETO CONAWAY, MARIA C.; DEOTTE, JOSHUA R.; DUDUKOVIC, NIKOLA; DUOSS, ERIC B.; MORAN, BRYAN D.
To: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
Reel/Frame 055944/0013 →
Continuity (1)
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