Apparatus, method, and system for selectively effecting and/or killing bacteria
Certain exemplary embodiments can provide an apparatus and method for generating at least one radiation. The exemplary apparatus and/or method can selectively kill and/or affect at least one bacteria. For example, a radiation source first arrangement can be provided which is configured to generate at least one radiation having one or more wavelengths provided in a range of about 190 nanometers (nm) to about 230 nm, and at least one second arrangement can be provided which is configured to prevent the at least one radiation from having any wavelength that is outside of the range.
1. An apparatus for generating at least one radiation that kills a pathogen, comprising:
an upper air illumination system, comprising:
a hardware radiation generation source configured to generate the at least one radiation that kills or destroys the pathogen, wherein the at least one radiation has a peak wavelength provided in a range of 190 nanometers (nm) to 230 nm; and
at least one filter arrangement which includes at least one of:
(i) a bandpass filter, or
(ii) a combination of a low pass filter and a high pass filter,
wherein the at least one filter arrangement is configured to (i) prevent all UVC wavelengths of the at least one generated radiation that are outside of the range of 190 nm to 230 nm from passing through the at least one filter arrangement, and (ii) allow all wavelengths in the range of 190 nm to 230 nm to pass through the at least one filter arrangement.
2. The apparatus of claim 1 , wherein the at least one radiation is configured by the apparatus to avoid harm to cells of the body.
3. The apparatus of claim 1 , wherein the hardware radiation generation source includes an ultraviolet lamp.
4. The apparatus of claim 3 , wherein the UV lamp includes an excilamp.
5. The apparatus of claim 4 , wherein the excilamp includes at least one of a krypton-bromine lamp or a krypton-chlorine lamp.
6. The apparatus of claim 1 , wherein the peak wavelength is approximately at 207 nm.
7. The apparatus of claim 1 , wherein the peak wavelength is approximately at 222 nm.
8. The apparatus of claim 1 , wherein the at least one filter arrangement includes at least one of a chemical filter or a dielectric filter.
9. The apparatus of claim 1 , further comprising a radiation converting arrangement configured to convert the at least one radiation into a further radiation to be in a visible spectrum.
10. The apparatus of claim 9 , wherein the radiation converting arrangement comprises a fluorescent material.
11. An apparatus for generating at least one radiation configured to expose a room air or a room surface in a hospital environment to the at least one radiation, comprising:
a hardware radiation generation source configured to generate the at least one radiation in the hospital environment, wherein the at least one radiation has a peak wavelength provided in a range of 190 nanometers (nm) to 230 nm, wherein the peak wavelength is approximately at 207 nm or approximately at 222 nm; and
at least one filter arrangement which includes at least one of:
(i) a bandpass filter, or
(ii) a combination of a low pass filter and a high pass filter,
wherein the at least one filter arrangement is configured to (i) prevent all UVC wavelengths of the at least one generated radiation that are outside of the range of 190 nm to 230 nm from passing through the at least one filter arrangement, and (ii) allow all wavelengths in the range of 190 nm to 230 nm to pass through the at least one filter arrangement.
12. The apparatus of claim 11 , wherein the hardware radiation generation source includes an ultraviolet lamp.
13. The apparatus of claim 12 , wherein the UV lamp includes an excilamp.
14. An apparatus for generating at least one bactericidal radiation in a hospital environment, comprising:
an overhead surgical illumination system or a surgeon's surgical headlight system comprising:
a hardware radiation generation source configured to generate the at least one radiation in the hospital environment, wherein the at least one radiation has a peak wavelength provided in a range of 190 nanometers (nm) to 230 nm, wherein the peak wavelength is approximately at 207 nm or approximately at 222 nm; and
at least one filter arrangement which includes a band pass filter, or a combination of a low pass filter and a high pass filter, wherein the at least one filter arrangement is configured to:
(i) prevent all UVC wavelengths of the at least one generated radiation that are outside of the range of 190 nm to 230 nm from passing through the at least one filter arrangement,
(ii) allow all wavelengths in the range of 190 nm to 230 nm to pass through the at least one filter arrangement, and
(iii) fluoresce a visible light in response to the at least one radiation impinging on the at least one filter arrangement to indicate that the radiation generation source is operating.
15. The apparatus of claim 14 , wherein the hardware radiation generation source includes an ultraviolet lamp.
16. The apparatus of claim 15 , wherein the UV lamp includes an excilamp.