IP Library Granted Patent US 11,462,680
Granted Patent B2
US 11,462,680 · App. 17/181,087 · Granted Oct 4, 2022

Magnetic storage device

Inventors: Daisuke Watanabe (Yokkaichi Mie, JP); Toshihiko Nagase (Kuwana Mie, JP)
Assignee: KIOXIA CORPORATION
H01L43/02G11C11/161H01L27/224H01L43/10G11C11/1655G11C11/1657G11C11/1659G11C11/1673G11C11/1675H01L27/228
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Quick Facts
Patent No.
US 11,462,680
App. No.
17/181,087
Granted
Oct 4, 2022
Kind
B2
Abstract

A magnetic storage device includes a magnetoresistive effect element. The magnetoresistive effect element includes a first ferromagnetic layer; a second ferromagnetic layer; a non-magnetic layer between the first ferromagnetic layer and the second ferromagnetic layer; and a first layer provided at a side of the first ferromagnetic layer opposite to a side of the first ferromagnetic layer at which the non-magnetic layer is provided. The first layer includes a rare-earth element and the first layer has a region including boron (B) at a proportion higher than a proportion of boron (B) in the first ferromagnetic layer.

Claims (58)

1. A magnetic storage device comprising:

a magnetoresistive effect element;

the magnetoresistive effect element including:

a first ferromagnetic layer;

a second ferromagnetic layer;

a non-magnetic layer between the first ferromagnetic layer and the second ferromagnetic layer; and

a first layer provided at a side of the first ferromagnetic layer opposite to a side of the first ferromagnetic layer at which the non-magnetic layer is provided,

wherein:

the first layer includes a rare-earth element; and

the first layer has a region including boron (B) at a proportion higher than a proportion of boron (B) in the first ferromagnetic layer.

2. The device of claim 1 , further comprising:

a second layer provided at a side of the first layer opposite to a side of the first layer at which the first ferromagnetic layer is provided.

3. The device of claim 2 , wherein:

the second layer includes one of ruthenium (Ru) and molybdenum (Mo).

4. The device of claim 1 , wherein:

the first layer includes oxygen (O).

5. The device of claim 1 , wherein:

the non-magnetic layer has a region including oxygen (O) at a proportion higher than a proportion of oxygen (O) in the first layer.

6. The device of claim 2 , wherein:

the second layer includes one of iridium (Ir) and platinum (Pt).

7. The device of claim 2 , wherein:

the second layer includes at least one element selected from boron (B), silicon (Si), and carbon (C).

8. The device of claim 2 , wherein:

the second layer has an amorphous structure.

9. The device of claim 2 , wherein:

the second layer is in contact with the first layer.

10. The device of claim 1 , wherein:

the first layer further includes iron (Fe).

11. A magnetic storage device comprising:

a magnetoresistive effect element;

the magnetoresistive effect element including:

a first ferromagnetic layer;

a second ferromagnetic layer;

a non-magnetic layer between the first ferromagnetic layer and the second ferromagnetic layer; and

a first layer provided at a side of the first ferromagnetic layer opposite to a side of the first ferromagnetic layer at which the non-magnetic layer is provided,

wherein:

the first layer includes a rare-earth element;

the first layer has a region in which a first strength corresponding to boron (B) is higher than a second strength corresponding to boron (B) in the first ferromagnetic layer; and

the first strength and the second strength are determined based on electron energy loss spectroscopy (EELS).

12. The device of claim 11 , further comprising:

a second layer provided at a side of the first layer opposite to a side of the first layer at which the first ferromagnetic layer is provided.

13. The device of claim 12 , wherein:

the second layer includes one of ruthenium (Ru) and molybdenum (Mo).

14. The device of claim 11 , wherein:

the first layer includes oxygen (O).

15. The device of claim 11 , wherein:

the non-magnetic layer has a region in which a third strength corresponding to oxygen (O) is higher than a fourth strength corresponding to oxygen (O) in the first layer; and

the third strength and the fourth strength are determined based on the EELS.

16. The device of claim 12 , wherein:

the second layer includes one of iridium (Ir) and platinum (Pt).

17. The device of claim 12 , wherein:

the second layer includes at least one element selected from boron (B), silicon (Si), and carbon (C).

18. The device of claim 12 , wherein:

the second layer has an amorphous structure.

19. The device of claim 12 , wherein:

the second layer is in contact with the first layer.

20. The device of claim 11 , wherein:

the first layer further includes iron (Fe).

Assignments (2)
CHANGE OF NAME Recorded Feb 15, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 059111/0120 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2021
From: WATANABE, DAISUKE; NAGASE, TOSHIHIKO
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055350/0471 →
Priority Claims (1)
JP JP2018-163553 · Aug 31, 2018 · national
Continuity (2)
Continuation 16298849 · Mar 11, 2019
Related Publication 20210175413A1 · Jun 10, 2021