IP Library Granted Patent US 12,124,035
Granted Patent B2
US 12,124,035 · App. 17/182,016 · Granted Oct 22, 2024

Stretchable film assembly with conductive traces

Inventors: Belgacem Haba (Saratoga, CA); Ilyas Mohammed (Santa Clara, CA); Gabriel Z. Guevara (Gilroy, CA); Min Tao (San Jose, CA)
Assignee: Adeia Semiconductor Technologies LLC
G02B27/0172G02B2027/0134G02B2027/015G09G2370/18
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Quick Facts
Patent No.
US 12,124,035
App. No.
17/182,016
Granted
Oct 22, 2024
Kind
B2
Abstract

Apparatus and method relating generally to electronics are disclosed. In one such an apparatus, a film assembly has an upper surface and a lower surface opposite the upper surface. A dielectric film of the film assembly has a structured profile along the upper surface or the lower surface for having alternating ridges and grooves in a corrugated section in an at rest state of the film assembly. Conductive traces of the film assembly conform to the upper surface or the lower surface in or on the dielectric film in the corrugated section.

Claims (45)

1. A method for forming a stretchable film assembly with conductive traces, the method comprising:

obtaining a base comprising a section with alternating ridges and grooves;

forming an etch stop layer over the base conformably with the alternating ridges and grooves;

forming conductive traces over the etch stop layer conformably with the alternating ridges and grooves;

forming a film assembly comprising a stretchable dielectric film disposed on the conductive traces conformably with the alternating ridges and grooves, the film assembly disposed on the base; and

removing the film assembly from the base by etching the base to the etch stop layer to form the stretchable film assembly.

2. The method according to claim 1 , wherein the forming of the film assembly comprising the stretchable dielectric film disposed on the conductive traces conformably with the alternating ridges and grooves comprises:

positioning a sheet of the stretchable dielectric film over the base; and

adhering the sheet to the conductive traces conformably with the alternating ridges and grooves.

3. The method according to claim 1 , wherein the forming of the film assembly comprising the stretchable dielectric film disposed on the conductive traces conformably with the alternating ridges and grooves comprises conformally depositing a dielectric material to provide the stretchable dielectric film.

4. The method according to claim 3 , wherein the base is electrically conductive; and wherein the dielectric material is conformally deposited using an electrophoretic deposition.

5. The method according to claim 1 , wherein the base is a lower platen, and wherein the forming of the film assembly comprising the stretchable dielectric film disposed on the conductive traces conformably with the alternating ridges and grooves comprises:

placing a sheet of the stretchable dielectric film between the lower platen and a corresponding upper platen;

the corresponding upper platen having a reverse contoured surface for spaced-apart or interlocked engagement with the lower platen; and

pressing the sheet of the stretchable dielectric film between the corresponding upper platen and the lower platen under heat and pressure for contouring of the sheet to the alternating ridges and grooves.

6. A method for forming a stretchable film assembly with conductive traces, the method comprising:

obtaining a sheet of a dielectric film having conductive traces;

obtaining a lower platen having a structured profile, for having the lower platen comprising a corrugated section with alternating ridges and grooves;

obtaining an upper platen having a reverse structured profile for space-apart or interlocked engagement with the lower platen;

pressing the sheet between the upper platen and the lower platen under heat and pressure, contouring the conductive traces and the dielectric film with the structured profile to form a film assembly; and

releasing the film assembly from between the lower platen and the upper platen.

7. The method of claim 6 , wherein the film assembly after the releasing has the structured profile.

8. The method of claim 6 , wherein the pressing the sheet between the upper platen and the lower platen comprises:

positioning the sheet of the dielectric film above the lower platen; and

adhering the sheet to the lower platen conformably with the alternating ridges and grooves.

9. The method of claim 6 , wherein the obtaining the sheet of the dielectric film having the conductive traces comprises:

depositing a dielectric material on the sheet.

10. The method of claim 9 , wherein the dielectric material is deposited using an electrophoretic deposition.

11. The method of claim 6 , further comprising:

forming an etch stop layer over the lower platen conformably with the alternating ridges and grooves;

wherein the conductive traces of the sheet are disposed on the etch stop layer; and

wherein the releasing of the film assembly from between the lower platen and the upper platen comprises etching the lower platen to the etch stop layer.

12. A method for forming a stretchable film assembly with conductive traces, the method comprising:

forming a first layer comprising a first section with alternating ridges and grooves;

forming a second layer comprising a second section for space-apart or interlocked engagement with the first section of the first layer;

forming conductive traces conformably with the alternating ridges and grooves between the first layer and the second layer;

forming a stretchable dielectric film disposed on the conductive traces and between the first layer and the second layer;

forming a film assembly comprising the conductive traces and the stretchable dielectric film, wherein the film assembly is disposed on the first layer conformably with the alternating ridges and grooves; and

removing the film assembly from the first layer to form the stretchable film assembly.

13. The method of claim 12 , further comprising:

prior to forming conductive traces between the first layer and the second layer, forming an etch stop layer over of the first layer conformably with the alternating ridges and grooves.

14. The method of claim 12 , wherein forming the film assembly comprises:

pressing the conductive traces and the stretchable dielectric film between the first layer and the second layer under heat and pressure for contouring of the film assembly with the alternating ridges and grooves.

15. The method of claim 1 , wherein the stretchable dielectric film is attached to the conductive traces.

16. The method of claim 12 , wherein the stretchable dielectric film is attached to the conductive traces.

Assignments (4)
CHANGE OF NAME Recorded Jun 24, 2024
From: INVENSAS LLC
To: ADEIA SEMICONDUCTOR TECHNOLOGIES LLC
Reel/Frame 067822/0279 →
SECURITY INTEREST Recorded May 19, 2023
From: ADEIA GUIDES INC.; ADEIA MEDIA HOLDINGS LLC; ADEIA MEDIA SOLUTIONS INC.; ADEIA SEMICONDUCTOR BONDING TECHNOLOGIES INC.; ADEIA SEMICONDUCTOR SOLUTIONS LLC; ADEIA SEMICONDUCTOR TECHNOLOGIES LLC
To: BANK OF AMERICA, N.A., AS COLLATERAL AGENT
Reel/Frame 063707/0884 →
CERTIFICATE OF CONVERSION & CHANGE OF NAME Recorded Apr 4, 2022
From: INVENSAS CORPORATION
To: INVENSAS LLC
Reel/Frame 059581/0435 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 22, 2021
From: HABA, BELGACEM; MOHAMMED, ILYAS; GUEVARA, GABRIEL Z.; TAO, MIN
To: INVENSAS CORPORATION
Reel/Frame 055358/0805 →