Charged particle beam apparatus
Provided is a charged particle beam apparatus including a focused ion beam column, a sample holder, a stage supporting the sample holder, a securing member rotating unit, a stage driving unit, and a control device. The sample holder includes a securing member fixing a sample. The securing member rotating unit rotates the securing member around a first rotational axis and a second rotational axis. The stage driving unit translates the stage in three dimensions and rotates the stage around a third rotational axis. The control device acquires a correction value for correcting a change in a position of a center of rotation for rotation around at least one among a first rotational axis, a second rotational axis, and a third rotational axis. The control device translates the stage according to the correction value.
1. A charged particle beam apparatus comprising:
a charged particle beam column irradiating a sample with a charged particle beam;
a sample holder having a securing member for fixing the sample;
a stage supporting the sample holder; and
a processing device correcting an irradiation position of the charged particle beam on the sample, wherein
the securing member is configured to be rotatable around a first rotational axis and a second rotational axis parallel to a direction perpendicular to the first rotational axis, independently of the stage,
the stage is configured to be translatable three dimensionally together with the sample holder and rotatable together with the sample holder around a third rotational axis, and
the processing device corrects the irradiation position of the charged particle beam on the sample by acquiring a correction value for correcting a change in a position of a center of rotation for rotation around at least one among the first rotational axis, the second rotational axis, and the third rotational axis, and translating the stage according to the correction value.
2. The charged particle beam apparatus of claim 1 , wherein, with positions of the center of rotation before and after rotation as a pre-rotation position and a post-rotation position, respectively, around at least one among the first rotational axis, the second rotational axis, and the third rotational axis, the correction value is acquired by synthesizing, a vector of the pre-rotation position and a vector of the post-rotation position with respect to each reference position of rotation of the first rotational axis, the second rotational axis, and the third rotational axis.
3. The charged particle beam apparatus of claim 2 , wherein the center of rotation changes its position on a predetermined closed curve in three dimensions according to the rotation around at least one among the first rotational axis, the second rotational axis, and the third rotational axis.
4. The charged particle beam apparatus of claim 3 , wherein the closed curve is an ellipse.
5. The charged particle beam apparatus of claim 1 , further comprising:
a storage storing table data that shows a corresponding relationship between the correction value and an angle of rotation around each of the first rotational axis, the second rotational axis, and the third rotational axis,
wherein the processing device acquires the correction value from the table data.
6. The charged particle beam apparatus of claim 1 , wherein in addition to correction of the irradiation position for rotation around at least one among the first rotational axis, the second rotational axis, and the third rotational axis, the processing device corrects a geometric positional deviation of the sample with respect to an irradiation reference position set relative to the securing member.
7. The charged particle beam apparatus of claim 1 , wherein when the rotation around at least one among the first rotational axis, the second rotational axis, and the third rotational axis is performed during irradiation of the sample with the charged particle beam, the processing device corrects the irradiation position after the rotation is performed.
8. The charged particle beam apparatus of claim 1 , wherein in addition to the translation and the rotation around the third rotational axis, the stage is configured to be tiltable together with the sample holder, around a tilt axis in an eucentric manner so that a position of the center of rotation is not changed.