Organic light emitting display device and method of manufacturing the same
An organic light emitting display device includes: a thin film transistor disposed in a display area of a substrate; an insulating layer disposed on the thin film transistor; an organic light emitting element disposed on the insulating layer and connected to the thin film transistor; and an encapsulation layer covering the organic light emitting element. The encapsulation layer includes: a first inorganic layer extending from the organic light emitting element to a non-display area; an organic layer disposed on the first inorganic layer; a second inorganic layer extending from the organic layer to the non-display area; and an organic pattern layer disposed between the first inorganic layer and the second inorganic layer and spaced apart from the organic layer in the non-display area. At least a part of the first inorganic layer and at least a part of the second inorganic layer may contact each other in the non-display area.
1. A method of manufacturing an organic light emitting display device, the method comprising:
forming a thin film transistor in a display area of a substrate, the substrate comprising the display area and a non-display area;
forming an insulating layer on the thin film transistor, and in the display area and the non-display area;
forming an organic light emitting element on the insulating layer and connecting the organic light emitting element with the thin film transistor; and
forming an encapsulation layer covering the organic light emitting element,
wherein the forming of the encapsulation layer comprises:
forming a first inorganic layer to cover the organic light emitting element and to extend from the organic light emitting element to the non-display area;
forming an organic layer on the first inorganic layer;
removing a part of the organic layer and leaving a part of the organic layer in the non-display area to form an organic pattern layer spaced apart from the organic layer, with a thickness of the organic pattern layer being smaller than a thickness of the organic layer; and
forming a second inorganic layer to cover the organic layer and to extend from the organic layer to the non-display area.
2. The method of claim 1 , wherein the first inorganic layer and the second inorganic layer have an equal area in a plan view, and
an area of the organic layer is less than an area of the first inorganic layer and an area of the second inorganic layer.
3. The method of claim 1 , wherein the organic layer is formed by one of an inkjet method, a slit coating method, a screen printing method, an evaporation method, and a chemical vapor deposition method.
4. The method of claim 1 , wherein the forming of the organic pattern layer comprises forming the organic pattern layer by an ashing process using a cleaning mask.
5. The method of claim 1 , further comprising etching the insulating layer formed in the non-display area of the substrate to form a dam portion.
6. The method of claim 5 , wherein the organic pattern layer is disposed between the dam portion and one side portion of the insulating layer.