Configuring optical layers in imprint lithography processes
An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.
1. An optical layer, comprising:
a first substrate;
a first nanolayer imprinted on the first substrate;
a second substrate;
a second nanolayer imprinted on the second substrate and atop the first substrate,
wherein the second substrate comprises a functional pattern disposed along the second substrate, and
wherein the first nanolayer determines an effective refractive index of the first substrate such that the first nanolayer effects a relative amount of light transmittable through the first substrate.
2. The optical layer of claim 1 , wherein the first nanolayer is flat.
3. The optical layer of claim 1 , wherein the first nanolayer comprises features.
4. The optical layer of claim 1 , wherein the first substrate comprises one or more anti-reflective features.
5. The optical layer of claim 4 , wherein each of the one or more anti-reflective features has a height in a range of about 10 nm to about 300 nm.
6. The optical layer of claim 5 , wherein each of the one or more anti-reflective features has a width in a range of about 10 nm to about 150 nm.
7. The optical layer of claim 4 , wherein the one or more anti-reflective features have a pitch in a range of about 20 nm to about 200 nm.
8. The optical layer of claim 1 , wherein the first substrate comprises pillars.
9. The optical layer of claim 1 , wherein the first substrate comprises openings.
10. The optical layer of claim 1 , wherein the first substrate comprises one or both of continuous gratings and discontinuous gratings.
11. The optical layer of claim 1 , wherein a first side of the first substrate comprises a second functional pattern, and the first nanolayer is formed along one or both of the first side of the first substrate and a second side of the first substrate, wherein the second side of the first substrate is opposite the first side of the first substrate.
12. The optical layer of claim 11 , wherein the first nanolayer comprises an array of anti-reflective features along a specific direction with respect to the second functional pattern.
13. The optical layer of claim 12 , wherein the anti-reflective features of the first nanolayer on the first substrate are configured to change the effective refractive index of the first substrate based on a direction of light propagation such that light transmitted through the first substrate is changed by a selected amount.
14. The optical layer of claim 1 , further comprising a film between the first substrate and the first nanolayer.
15. The optical layer of claim 1 , where the optical layer is configured to change the relative amount of light transmittable through the first substrate by about 0.5% to about 15%.
16. The optical layer of claim 1 , wherein the optical layer is configured to change the effective relative index to a first value based on the first nanolayer and to change the effective refractive index to a second value based on the second nanolayer.
17. The optical layer of claim 1 , wherein the functional pattern disposed along the second substrate is a first functional pattern, the optical device further comprising a third optical layer comprising a third substrate and a second functional pattern disposed along the third substrate.