IP Library Granted Patent US 11,848,039
Granted Patent B2
US 11,848,039 · App. 17/227,294 · Granted Dec 19, 2023

Cross-point MRAM including self-compliance selector

Inventors: Zhiqiang Wei (Pleasanton, CA); Kimihiro Satoh (Wilsonville, OR); Woojin Kim (San Jose, CA); Zihui Wang (Mountain View, CA)
Assignee: Avalanche Technology, Inc.
G11C11/161H10B61/10H10N50/10H10N50/80H10N50/85
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Quick Facts
Patent No.
US 11,848,039
App. No.
17/227,294
Granted
Dec 19, 2023
Kind
B2
Abstract

The present invention is directed to a magnetic memory cell including a magnetic tunnel junction (MTJ) memory element and a two-terminal bidirectional selector coupled in series between two conductive lines. The MTJ memory element includes a magnetic free layer; a magnetic reference layer; and an insulating tunnel junction layer interposed therebetween. The two-terminal bidirectional selector includes a bottom electrode; a top electrode; a load-resistance layer interposed between the bottom and top electrodes and comprising a first tantalum oxide; a first volatile switching layer interposed between the bottom and top electrodes and comprising a metal dopant and a second tantalum oxide that has a higher oxygen content than the first tantalum oxide; and a second volatile switching layer in contact with the first volatile switching layer and comprising a third tantalum oxide that has a higher oxygen content than the first tantalum oxide.

Claims (51)

1. A magnetic memory cell comprising:

a magnetic tunnel junction (MTJ) including:

a magnetic free layer having a variable magnetization direction substantially perpendicular to a layer plane of the magnetic free layer;

a magnetic reference layer having an invariable magnetization direction substantially perpendicular to a layer plane of the magnetic reference layer; and

an insulating tunnel junction layer interposed between the magnetic free and reference layers; and

a two-terminal bidirectional selector electrically connected to the MTJ and including:

a bottom electrode;

a top electrode;

a load-resistance layer interposed between the bottom and top electrodes, the load-resistance layer comprising a first tantalum oxide;

a first volatile switching layer interposed between the bottom and top electrodes, the first volatile switching layer comprising a metal dopant and a second tantalum oxide that has a higher oxygen content than the first tantalum oxide; and

a second volatile switching layer in contact with the first volatile switching layer, the second volatile switching layer comprising a third tantalum oxide that has a higher oxygen content than the first tantalum oxide.

2. The magnetic memory cell of claim 1 , wherein a current-voltage response of the two-terminal bidirectional selector is characterized by a hysteresis loop.

3. The magnetic memory cell of claim 1 , wherein the two-terminal bidirectional selector has two distinct electrical resistances at an applied voltage.

4. The magnetic memory cell of claim 1 , wherein the metal dopant is silver or copper.

5. The magnetic memory cell of claim 1 , wherein the metal dopant is one of tellurium, nickel, or cobalt.

6. The magnetic memory cell of claim 1 , wherein the third tantalum oxide has a stoichiometric composition.

7. The magnetic memory cell of claim 1 , wherein the second tantalum oxide has a stoichiometric composition.

8. The magnetic memory cell of claim 1 , wherein the bottom and top electrodes each independently comprise one of titanium nitride or iridium.

9. The magnetic memory cell of claim 1 , the load-resistance layer further comprises the metal dopant.

10. The magnetic memory cell of claim 1 , wherein the two-terminal bidirectional selector further includes a third volatile switching layer in contact with the second volatile switching layer opposite the first volatile switching layer, the third volatile switching layer comprising the second tantalum oxide and the metal dopant.

11. The magnetic memory cell of claim 1 , wherein the two-terminal bidirectional selector further includes a third volatile switching layer in contact with the second volatile switching layer opposite the first volatile switching layer, the third volatile switching layer comprising the metal dopant and a fourth tantalum oxide that has a higher oxygen content than the first tantalum oxide.

12. A magnetic memory cell comprising:

a magnetic tunnel junction (MTJ) including:

a magnetic free layer having a variable magnetization direction substantially perpendicular to a layer plane of the magnetic free layer;

a magnetic reference layer having an invariable magnetization direction substantially perpendicular to a layer plane of the magnetic reference layer; and

an insulating tunnel junction layer interposed between the magnetic free and reference layers; and

a two-terminal bidirectional selector electrically connected to the MTJ and including:

a bottom electrode;

a top electrode;

a load-resistance layer interposed between the bottom and top electrodes, the load-resistance layer comprising a first tantalum oxide;

a first volatile switching layer interposed between the bottom and top electrodes, the first volatile switching layer comprising a metal dopant and a second tantalum oxide that has a higher oxygen content than the first tantalum oxide; and

a second volatile switching layer in contact with the first volatile switching layer, the second volatile switching layer comprising a stoichiometric or near-stoichiometric hafnium oxide.

13. The magnetic memory cell of claim 12 , wherein a current-voltage response of the two-terminal bidirectional selector is characterized by a hysteresis loop.

14. The magnetic memory cell of claim 12 , wherein the load-resistance layer further comprises the metal dopant.

15. The magnetic memory cell of claim 12 , wherein the second tantalum oxide has a stoichiometric composition.

16. The magnetic memory cell of claim 12 , wherein the metal dopant is silver or copper.

17. The magnetic memory cell of claim 12 , wherein the two-terminal bidirectional selector further includes a third volatile switching layer in contact with the second volatile switching layer opposite the first volatile switching layer, the third volatile switching layer comprising the second tantalum oxide and the metal dopant.

18. A magnetic memory cell comprising:

a magnetic tunnel junction (MTJ) including:

a magnetic free layer having a variable magnetization direction substantially perpendicular to a layer plane of the magnetic free layer;

a magnetic reference layer having an invariable magnetization direction substantially perpendicular to a layer plane of the magnetic reference layer; and

an insulating tunnel junction layer interposed between the magnetic free and reference layers; and

a two-terminal bidirectional selector electrically connected to the MTJ and including:

bottom and top electrodes each independently comprising one of titanium nitride or iridium;

a load-resistance layer interposed between the bottom and top electrodes, the load-resistance layer comprising a first tantalum oxide and a metal dopant;

a first volatile switching layer interposed between the bottom and top electrodes, the first switching layer comprising the metal dopant and a second tantalum oxide that has a higher oxygen content than the first tantalum oxide;

a second volatile switching layer in contact with the first volatile switching layer, the second volatile switching layer comprising a stoichiometric tantalum oxide that has a higher oxygen content than the first tantalum oxide; and

a third volatile switching layer in contact with the second volatile switching layer opposite the first volatile switching layer, the third volatile switching layer comprising the second tantalum oxide and the metal dopant,

wherein the metal dopant is silver or copper.

19. The magnetic memory cell of claim 18 , wherein a current-voltage response of the two-terminal bidirectional selector is characterized by a hysteresis loop.

20. The magnetic memory cell of claim 18 , wherein the second tantalum oxide has a stoichiometric composition.

Assignments (2)
SECURITY INTEREST Recorded Mar 18, 2022
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 059436/0203 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 10, 2021
From: WEI, ZHIQIANG; SATOH, KIMIHIRO; KIM, WOOJIN; WANG, ZIHUI
To: AVALANCHE TECHNOLOGY, INC.
Reel/Frame 055973/0403 →