Offset pads over TSV
Representative techniques and devices including process steps may be employed to mitigate the potential for delamination of bonded microelectronic substrates due to metal expansion at a bonding interface. For example, a metal pad may be disposed at a bonding surface of at least one of the microelectronic substrates, where the contact pad is positioned offset relative to a TSV in the substrate and electrically coupled to the TSV.
1. A microelectronic assembly, comprising:
a first substrate including a first bonding surface;
a first through silicon via (TSV) embedded in the first substrate and extending at least partially through the first substrate, the first TSV extending normal to the first bonding surface without being exposed at the first bonding surface;
a first metal contact pad disposed at the first bonding surface and electrically coupled to the first TSV, the first metal contact pad disposed offset relative to the first TSV and not overlapping the first TSV;
one or more embedded conductive traces electrically coupling the first TSV to the first metal contact pad;
a second substrate direct bonded to the first substrate using a direct dielectric-to-dielectric, non-adhesive bonding technique along a bonding interface; and
a recess extending from the first bonding surface partially into the first substrate, the recess disposed at the bonding interface between the first and second substrates over the first TSV.
2. The microelectronic assembly of claim 1 , further comprising a dielectric layer, wherein at least a portion of the dielectric layer is disposed between the first TSV and the recess.
3. The microelectronic assembly of claim 2 , wherein the dielectric layer includes the one or more embedded conductive traces.
4. The microelectronic assembly of claim 1 , further comprising one or more dielectric stress-relief layers on a second surface of the first substrate, the one or more stress-relief layers planarized to form a second bonding surface having a second predetermined maximum surface variance.
5. The microelectronic assembly of claim 4 , the one or more stress-relief layers comprising a first low temperature insulating layer at the second surface of the first substrate, a second low temperature insulating layer over the first low temperature insulating layer, and a third insulating layer over the second low temperature insulating layer to form the second bonding surface.
6. The microelectronic assembly of claim 1 , wherein the first bonding surface has a planarized topography with a first predetermined maximum surface variance.
7. The microelectronic assembly of claim 1 , wherein the second substrate is direct bonded to the first substrate at the first bonding surface of the first substrate or at a second bonding surface of the first substrate.
8. The microelectronic assembly of claim 1 , wherein the recess is aligned with and overlaps the first TSV in a direction normal to the first bonding surface.
9. The microelectronic assembly of claim 1 , wherein the recess comprises an expansion region for expansion of the first TSV when heated.
10. The microelectronic assembly of claim 1 , wherein the recess has a diameter that is greater than a diameter of the first TSV.
11. The microelectronic assembly of claim 1 , wherein the first substrate includes a second surface opposite the first bonding surface, and wherein the TSV is exposed at the second surface.
12. The microelectronic assembly of claim 1 , further comprising one or more inorganic dielectric layers disposed on a second surface of the first substrate opposite the insulating layer, the one or more inorganic dielectric layers comprising a second bonding surface having a second predetermined maximum surface variance.
13. The microelectronic assembly of claim 12 , wherein the one or more inorganic dielectric layers comprises a first low temperature insulating layer at the second surface of the first substrate, a second low temperature insulating layer over the first low temperature insulating layer, and a third insulating layer over the second low temperature insulating layer to form the second bonding surface.
14. The microelectronic assembly of claim 12 , further comprising a conductive pad embedded in the second bonding surface and electrically coupled to the first TSV.
15. The microelectronic assembly of claim 14 , wherein the recess comprises an expansion region configured to compensate for thermal expansion of the first TSV.
16. The microelectronic assembly of claim 14 , wherein the conductive pad is disposed over and contacts the first TSV.
17. The microelectronic assembly of claim 12 , wherein the second substrate is direct bonded to the second bonding surface of the first substrate.
18. A microelectronic assembly, comprising:
a first substrate including a base layer and an insulating layer over the base layer, the insulating layer having a first bonding surface;
a first through silicon via (TSV) embedded in the base layer and extending at least partially through the base layer, the first TSV extending normal to the first bonding surface without being exposed at the first bonding surface;
a first metal contact pad disposed at the first bonding surface and electrically coupled to the first TSV, the first metal contact pad disposed offset relative to the first TSV and not overlapping the first TSV;
one or more embedded conductive traces electrically coupling the first TSV to the first metal contact pad;
a second substrate direct bonded to the first substrate using a direct dielectric-to-dielectric, non-adhesive bonding technique along a bonding interface; and
a recess extending from the first bonding surface partially into the first substrate, the recess disposed at the bonding interface between the first and second substrates over the first TSV.
19. The microelectronic assembly of claim 14 , wherein the conductive pad is not exposed at the second bonding surface, and further comprising one or more conductive interconnects coupled to the conductive pad and exposed at the second bonding surface.
20. The microelectronic assembly of claim 18 , wherein the first bonding surface has a predetermined maximum surface variance and wherein the first metal contact pad has a preset recess relative to the first bonding surface.
21. The microelectronic assembly of claim 18 , wherein the second substrate is direct bonded to the first bonding surface of the first substrate.
22. A microelectronic assembly, comprising:
a first substrate including a first bonding surface;
a first through silicon via (TSV) embedded in the first substrate and extending in a direction normal to the first bonding surface through at least a portion of the first substrate without being exposed at the first bonding surface;
a first metal contact pad embedded into the first substrate and having an exposed surface that is recessed relative to the first bonding surface, the first metal contact pad disposed offset relative to the first TSV and not overlapping the first TSV in a direction normal to the first bonding surface, and electrically coupled to the first TSV with one or more embedded conductive structures; and
a second substrate direct bonded to the first substrate using a direct dielectric-to-dielectric, non-adhesive bonding technique along a bonding interface; and
a recess extending from the first bonding surface partially into the first substrate, the recess disposed at the bonding interface between the first and second substrates over the first TSV.