Small-angle x-ray scatterometry
An x-ray apparatus, that may include a mount that is configured to hold a sample; an x-ray source, that is configured to direct an x-ray beam toward a first side of the sample; a detector, positioned downstream to a second side of the sample, the detector is configured to detect, during a sample measurement period, at least a part of x-rays that have been transmitted through the sample; and an x-ray intensity detector that is positioned, during a beam intensity monitoring period at a measurement position that is located between the x-ray source and the first side of the sample, so as to detect at least a part of the x-ray beam before the x-ray beam reaches the sample.
1. An x-ray apparatus, comprising:
a mount that is configured to hold a sample;
an x-ray source, that is configured to direct an x-ray beam toward a first side of the sample;
a detector, positioned downstream to a second side of the sample, the detector is configured to detect, during a sample measurement period, at least a part of x-rays that have been transmitted through the sample;
an x-ray intensity detector that is positioned, during a beam intensity monitoring period at a measurement position that is located between the x-ray source and the first side of the sample, so as to detect at least a part of the x-ray beam before the x-ray beam reaches the sampler; and
a mechanical mechanism that is configured to move the x-ray intensity detector between (a) the measurement position, and (b) an outside position in which the x-ray intensity detector is positioned outside a path of the x-ray beam.
2. The x-ray apparatus according to claim 1 , wherein the sample measurement period and the beam intensity monitoring period do not overlap.
3. The x-ray apparatus according to claim 1 , wherein when positioned at the measurement position, the x-ray intensity detector is configured to receive an entirety of the x-ray beam.
4. The x-ray apparatus according to claim 1 , wherein the mechanical mechanism is configured to move the x-ray intensity detector between the measurement position and the outside position by a rotational movement within a plane that is parallel to a plane of the first side of the sample.
5. The x-ray apparatus according to claim 1 , wherein the mechanical mechanism is configured to move the x-ray intensity detector between the measurement position and the outside position by a rotational movement within a plane that is not parallel to a plane of the first side of the sample.
6. The x-ray apparatus according to claim 1 , wherein the mechanical mechanism is configured to move the x-ray intensity detector between the measurement position and the outside position by a liner movements within a plane that is parallel to a plane of the first side of the sample.
7. The x-ray apparatus according to claim 1 , wherein the mechanical mechanism is configured to move the x-ray intensity detector between the measurement position and the outside position by a liner movements within a plane that is not parallel to a plane of the first side of the sample.
8. The x-ray apparatus according to claim 1 , comprising a beam limiter positioned upstream to the measurement position, wherein the beam limiter comprises at least one mechanical element configured to determine at least one of a shape of the x-ray beam and a size of a cross section of the x-ray beam.
9. The x-ray apparatus according to claim 8 , wherein the mechanical mechanism is configured to move the x-ray intensity detector between the measurement position and the outside position by a movement that is parallel to the at least one mechanical element.
10. The x-ray apparatus according to claim 8 , wherein the mechanical mechanism is configured to move the x-ray intensity detector between the measurement position and the outside position by a movement that is non-parallel to the at least one mechanical element.
11. The x-ray apparatus according to claim 8 , wherein the beam limiter comprises first and second blades, having respective first and second edges positioned in mutual proximity so as to define a slit, through which the beam of the X-rays will pass, at a distance smaller than 25 mm from the first side of the sample; and first and second actuators, which are configured to shift the first and second blades along respective, first and second translation axes so as to adjust a width of the slit.
12. The x-ray apparatus according to claim 1 , wherein the sample measurement period and the beam intensity monitoring period partially overlap.
13. The x-ray apparatus according to claim 1 wherein the x-ray apparatus is a semiconductor metrology tool.
14. A method comprising
holding a sample by a mount;
directing an x-ray beam toward a first side of the sample;
detecting, during a sample measurement period and by a detector positioned downstream to a second side of the sample, at least a part of x-rays that have been transmitted through the sample and exited through the second side; and
detecting at least a part of the x-ray beam before the x-ray beam reaches the sample, during a beam intensity monitoring period and by an x-ray intensity detector positioned at a measurement position that is located between the x-ray source and the first side of the sample; and
applying a mechanical mechanism to move the x-ray intensity detector between (a) the measurement position, and (b) an outside position in which the x-ray intensity detector is positioned outside a path of the x-ray beam.
15. The method according to claim 14 , wherein the sample measurement period and the beam intensity monitoring period do not overlap.
16. The method according to claim 14 , wherein when positioned at the measurement position, the x-ray intensity detector is configured to receive an entirety of the x-ray beam.
17. The method according to claim 14 , comprising moving the x-ray intensity detector between the measurement position and the outside position by a rotational movement within a plane that is parallel to a plane of the first side of the sample.
18. The method according to claim 14 , comprising moving the x-ray intensity detector between the measurement position and the outside position by a rotational movement within a plane that is not parallel to a plane of the first side of the sample.
19. The method according to claim 14 , comprising moving the x-ray intensity detector between the measurement position and the outside position by a liner movements within a plane that is parallel to a plane of the first side of the sample.
20. The method according to claim 14 , comprising moving the x-ray intensity detector between the measurement position and the outside position by a liner movements within a plane that is not parallel to a plane of the first side of the sample.
21. The method according to claim 14 , comprising determining, by a beam limiter positioned upstream to the measurement position and comprises at least one mechanical element, at least one of a shape of the x-ray beam and a size of a cross section of the x-ray beam.
22. The method according to claim 21 , comprising moving the x-ray intensity detector between the measurement position and the outside position by a movement that is parallel to the at least one mechanical element.
23. The method according to claim 22 , comprising moving the x-ray intensity detector between the measurement position and the outside position by a movement that is non-parallel to the at least one mechanical element.
24. The method according to claim 22 , wherein the beam limiter comprises first and second blades, having respective first and second edges positioned in mutual proximity so as to define a slit, through which the beam of the X-rays will pass, at a distance smaller than 25 mm from the first side of the sample; and first and second actuators, wherein the method comprises shifting, by the first and second actuators, the first and second blades along respective, first and second translation axes so as to adjust a width of the slit.
25. The method according to claim 14 , wherein the sample measurement period and the beam intensity monitoring period partially overlap.