Aluminum alloy member for forming fluoride film and aluminum alloy member having fluoride film
Provided is an aluminum alloy member for forming a fluoride film thereon, the fluoride film being excellent in smoothness without occurrence of a black dot-shaped bulged portion and excellent in corrosion resistance against corrosive gas and plasma, etc. The aluminum alloy member for forming a fluoride film thereon 1 for use in a semiconductor producing apparatus consists of Si: 0.3 mass % to 0.8 mass %; Mg: 0.5 mass % to 5.0 mass %; Fe: 0.05 mass % to 0.5 mass %; Cu: 0 mass % or more and 0.5 mass % or less; Mn: 0 mass % or more and 0.30 mass % or less; Cr: 0 mass % or more and 0.30 mass % or less 0.5 mass % or less; and the balance being Al and inevitable impurities. When an average major diameter of a Fe-based crystallized product in the aluminum alloy member is D (μm), and an average crystalline particle diameter in the aluminum alloy member is Y (μm), a relation expression of log 10 Y←0.320D+4.60 is satisfied. A fluoride film 2 is formed on at least a part of a surface of the aluminum alloy member 1 for forming a fluoride film thereon.
1. An Aluminum alloy member for forming a fluoride film thereon, the aluminum alloy member consisting of:
Si: 0.3 mass % to 0.8 mass %;
Mg: 0.5 mass % to 5.0 mass %;
Fe: 0.05 mass % to 0.5 mass %;
Cu: 0 mass % or more and 0.5 mass % or less;
Mn: 0 mass % or more and 0.30 mass % or less;
Cr: 0 mass % or more and 0.30 mass % or less; and
the balance being Al and inevitable impurities,
wherein when an average major diameter of a Fe-based crystallized product in the aluminum alloy member is D (μm) and an average crystalline particle diameter in the aluminum alloy member is Y (μm), a following relational expression (1) is satisfied,
Log 10 Y←−0.320D+4.60 . . . Expression (1), and
wherein the aluminum alloy member is for use as a member for a semiconductor producing apparatus, and wherein the aluminum alloy member further comprises a fluoride film formed on at least a part of a surface of the aluminum alloy member,
wherein the fluoride film includes a first film layer formed on a surface of the aluminum alloy member for forming a fluoride film thereon and a second film layer formed on a surface of the first film layer,
wherein the first film layer is a film containing magnesium fluoride, and
wherein the second film layer is a film containing aluminum fluoride and aluminum oxide.
2. The Aluminum alloy member having a fluoride film as recited in claim 1 ,
wherein the fluoride film has a thickness of 0.1 μm to 10 μm.