Wide angle application high reflective mirror
Provided is a wide angle application high reflective mirror having a reflection band partially overlapping in a wavelength range of 800-4000 nm. The mirror comprises a film system in which a plurality of high refractive index film layers and a plurality of low refractive index film layers that are alternately stacked, and the material of the high refractive index film layer is one of SiH, SiO x H y , or SiO x N y , or a mixture thereof. The highly reflective mirror can achieve a reflectance greater than 99% with an incident angle ranging from 0 to 60 degrees over a large angle range.
1. A wide angle application high reflective mirror having a reflection band partially overlapping in a wavelength range of 800 to 4000 nm, wherein the high reflective mirror comprises:
a plurality of high refractive index film layers and a plurality of low refractive index film layers alternately stacked, a material of the high refractive index film layers includes one of (i) SiOxHy or SiOxNy, or (ii) a mixture at least two of SiH, SiOxHy, or SiOxNy
wherein each of the plurality of high refractive index film layers has a refractive index of greater than 3 in the wavelength range of 800 to 4000 nm and the reflection band has a reflectance of greater than 99% within the wavelength range of 850 to 950 nm with an incident angle ranging from 0 to 60 degrees over a large angle range.
2. The wide angle application high reflective mirror according to claim 1 , wherein the refractive index of each of the plurality of high refractive index film layers is greater than 3.5 in a wavelength range of 800 to 1100 nm.
3. The wide angle application high reflective mirror according to claim 1 , wherein a material of the plurality of low refractive index film layers is one of (i) TiO 2 , Nb 2 O 5 , Ta 2 O 5 , SiO 2 , and SixNy and (ii) a mixture of two or more of TiO 2 , Nb 2 O 5 , Ta 2 O 5 , SiO 2 , and SixNy.
4. The wide angle application high reflective mirror according to claim 1 , further comprising a metal film layer comprising one of (i) Cr, Ta, Ti, Nb, Ni, Au, Ag, Cu, and Al and (ii) a mixture of two or more of Cr, Ta, Ti, Nb, Ni, Au, Ag, Cu, and Al.
5. The wide angle application high reflective mirror according to claim 1 , further comprising a substrate upon which the plurality of high refractive index film layers and the plurality of low refractive index film layers are formed.
6. The wide angle application high reflective mirror according to claim 5 , wherein wherein the substrate includes a material comprising one of (i) a silicon material, silica-based glass, plastic, sapphire, silicon carbide, and tempered glass and (ii) a mixture of two or more of silicon material, silica-based glass, plastic, sapphire, silicon carbide, and tempered glass.
7. The wide angle application high reflective mirror according to claim 1 , wherein each of the plurality of low refractive index film layers has a refractive index of 1.48 at 900 nm.
8. The wide angle application high reflective mirror according to claim 1 , further comprising a metal film layer comprising one of (i) Cr, Ta, Ti, Nb, Ni, and Cu, and (ii) a mixture of two or more of Cr, Ta, Ti, Nb, Ni, Au, Ag, Cu, and Al.
9. The wide angle application high reflective mirror according to claim 1 , wherein the reflection band has a reflectance of greater than 99% in an incident angle range of 0 to 80 degrees.