Compact alignment sensor arrangements
An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.
1. An apparatus for sensing an alignment pattern comprising a grating on a substrate, the apparatus comprising:
at least one light source configured to generate a first beam of coherent radiation illuminating a portion of the grating from a first angle and a second beam of coherent radiation illuminating the portion of the grating from a second angle, the first and second beams being diffracted by the portion of the grating; and
a multimode interference device comprising:
a first input port arranged to receive a positive diffraction order of the first beam and a positive diffraction order of the second beam as diffracted by the grating portion;
a second input port arranged to receive a negative diffraction order of the first beam and a negative diffraction order of the second beam as diffracted by the grating portion;
a first output port arranged to output a first spatially overlapped image comprising an image of the grating portion as illuminated by the first beam and a mirror image of the grating portion as illuminated by the second beam; and
a second output port arranged to output a second spatially overlapped image comprising an image of the grating portion as illuminated by the second beam and a mirror image of the grating portion as illuminated by the first beam.
2. The apparatus of claim 1 , further comprising:
a first detector arranged to receive the first spatially overlapped image and to generate a first signal indicative of an intensity of the first spatially overlapped image; and
a second detector arranged to receive the second spatially overlapped image and to generate a second signal indicative of an intensity of the second spatially overlapped image.
3. The apparatus of claim 2 , further comprising a processor configured to receive the first signal and the second signal and to determine a characteristic of the portion of the grating based at least in part on the first signal and the second signal.
4. An apparatus for sensing an alignment pattern comprising a grating on a substrate, the apparatus comprising:
at least one light source configured to generate a first beam of coherent radiation illuminating a portion of the grating from a first angle and a second beam of coherent radiation illuminating the portion of the grating from a second angle, the first and second beams being diffracted by the portion of the grating; and
a plurality of multimode interference devices, each of the multimode interference devices being arranged adjacent to a respective segment of the grating portion and comprising:
a first input port arranged to receive a positive diffraction order of the first beam and a positive diffraction order of the second beam as diffracted by the respective segment of the grating portion;
a second input port arranged to receive a negative diffraction order of the first beam and a negative diffraction order of the second beam as diffracted by the respective segment of the grating portion;
a first output port arranged to output a first spatially overlapped image comprising an image of the segment of the grating portion as illuminated by the first beam and a mirror image of the segment of the grating portion as illuminated by the second beam; and
a second output port arranged to output a second spatially overlapped image comprising an image of the segment of the grating portion as illuminated by the second beam and a mirror image of the segment of the grating portion as illuminated by the first beam.
5. The apparatus of claim 4 , wherein the plurality of multimode interference devices is arranged in a linear array parallel to the portion of the grating.
6. The apparatus of claim 4 , further comprising:
a plurality of first detectors respectively arranged to receive the first spatially overlapped images and to generate first signals indicative of intensities of the first spatially overlapped images; and
a plurality of second detectors respectively arranged to receive the second spatially overlapped images and to generate second signals indicative of intensities of the second spatially overlapped images.
7. The apparatus of claim 6 , further comprising a processor configured to receive the first signals and the second signals and to determine a characteristic of the portion of the grating based at least in part on the first signals and the second signals.
8. An apparatus for sensing an alignment pattern comprising a grating on a substrate, the apparatus comprising:
at least one light source configured to generate a first beam of coherent radiation illuminating a portion of the grating from a first angle and a second beam of coherent radiation illuminating the portion of the grating from a second angle, the first and second beams being diffracted by the portion of the grating; and
an optical fiber based device comprising:
a first input port arranged to receive a positive diffraction order of the first beam and a positive diffraction order of the second beam as diffracted by the grating portion;
a second input port arranged to receive a negative diffraction order of the first beam and a negative diffraction order of the second beam as diffracted by the grating portion;
a first output port arranged to output a first spatially overlapped image comprising a p-polarized image from the negative diffraction orders and an s-polarized image from the positive diffraction orders; and
a second output port arranged to output a second spatially overlapped image comprising an s-polarized image from the negative diffraction orders and order sand a p-polarized image from the positive diffraction orders.
9. The apparatus of claim 8 , further comprising:
a first detector arranged to receive the first spatially overlapped image and to generate a first signal indicative of an intensity of the first spatially overlapped image; and
a second detector arranged to receive the second spatially overlapped image and to generate a second signal indicative of an intensity of the second spatially overlapped image.
10. The apparatus of claim 9 , further comprising a processor configured to receive the first signal and the second signal and to determine a characteristic of the portion of the grating based at least in part on the first signal and the second signal.
11. An apparatus for sensing an alignment pattern comprising a grating on a substrate, the apparatus comprising:
at least one light source configured to generate a first beam of coherent radiation illuminating a portion of the grating from a first angle and a second beam of coherent radiation illuminating the portion of the grating from a second angle, the first and second beams being diffracted by the portion of the grating; and
a plurality of optical fiber based devices each arranged adjacent to a respective segment of the grating portion and comprising:
a first input port arranged to receive a positive diffraction order of the first beam and a positive diffraction order of the second beam as diffracted by the grating portion;
a second input port arranged to receive a negative diffraction order of the first beam and a negative diffraction order of the second beam as diffracted by the grating portion;
a first output port arranged to output a first spatially overlapped image comprising a p-polarized image from the negative diffraction orders and an s-polarized image from the positive diffraction orders; and
a second output port arranged to output a second spatially overlapped image comprising an s-polarized image from the negative diffraction orders and order sand a p-polarized image from the positive diffraction orders.
12. The apparatus of claim 11 , wherein the plurality of optical fiber based devices is arranged in a linear array parallel to the portion of the grating.
13. The apparatus of claim 12 , further comprising
a plurality of first detectors respectively arranged to receive the first spatially overlapped images and to generate first signals indicative of intensities of the first spatially overlapped images; and
a plurality of second detectors respectively arranged to receive the second spatially overlapped images and to generate second signals indicative of intensities of the second spatially overlapped images.
14. The apparatus of claim 13 , further comprising a processor configured to receive the first signals and the second signals and to determine a characteristic of the portion of the grating based at least in part on the first signals and the second signals.
15. An apparatus for sensing an alignment pattern comprising a grating on a substrate, the apparatus comprising:
at least one light source configured to generate at least one beam of coherent radiation illuminating a portion of the grating, the at least one beam being diffracted by the portion of the grating to produce a diffracted beam; and
a multimode interference device comprising:
a first input port arranged to receive a positive diffraction order of the diffracted beam;
a second input port arranged to receive a negative diffraction order of the diffracted beam;
a first output port arranged to output a first spatially overlapped image; and
a second output port arranged to output a second spatially overlapped image
wherein the first input port comprises a first single mode waveguide and the second input port comprises a second single mode waveguide.
16. The apparatus of claim 15 , wherein the at least one light source illuminates the portion of the grating on axis.
17. The apparatus of claim 15 , wherein the at least one light source illuminates the portion of the grating off axis.
18. The apparatus of claim 15 , wherein the first input port comprises a first subwavelength structure and the second input port comprises a second subwavelength structure.