IP Library › Granted Patent US 11,923,178
Granted Patent B2
US 11,923,178 · App. 17/272,861 · Granted Mar 5, 2024

Vacuum processing apparatus

Inventors: Koji Suzuki (Kanagawa, JP); Hideto Nagashima (Kanagawa, JP); Yoshinori Fujii (Kanagawa, JP)
Assignee: ULVAC, INC.
H01J37/32522C23C14/3407H01J37/32504
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Quick Facts
Patent No.
US 11,923,178
App. No.
17/272,861
Granted
Mar 5, 2024
Kind
B2
Abstract

A vacuum processing apparatus SM of this invention has: a vacuum chamber which performs a predetermined processing on a to-be-processed substrate that is set in position in the vacuum chamber. Inside the vacuum chamber there is disposed a deposition preventive plate) which is made up of a fixed deposition preventive plate and a moveable deposition preventive plate which is moveable in one direction. Further provided are: a metal block body disposed in a vertical posture on an inner wall surface of the vacuum chamber; and a cooling means for cooling the block body. In a processing position in which a predetermined vacuum processing is performed on the to-be-processed substrate, a top surface of the block body is arranged to be in proximity to or in contact with the moveable deposition preventive plate.

Claims (7)

1. A vacuum processing apparatus which comprises a vacuum chamber and which performs a predetermined vacuum processing on a to-be-processed substrate set in position in the vacuum chamber, the vacuum chamber having therein a deposition preventive plate which is made up of a fixed deposition preventive plate and a moveable deposition preventive plate, the vacuum processing apparatus further comprising:

a block body which is made of metal, and which is located outside a circumference of the to-be-processed substrate, and disposed in a vertical posture on an inner wall surface of the vacuum chamber configured to cool the deposition preventive plate; and

a cooling means configured to cool the block body,

wherein the moveable deposition preventive plate is configured to move relative to the to-be-processed substrate between a processing position of the moveable deposition preventive plate at which processing position a predetermined vacuum processing is performed on the to-be-processed substrate, and a transporting position of the moveable deposition preventive plate at which the to-be-processed substrate can be transported, and

wherein, at a processing position, a clearance in a vertical direction between a top surface of the block body and the moveable deposition preventive plate is set to 1 mm or below or in contact with each other and, at the transporting position, the top surface of the block body is out of contact with the moveable deposition preventive plate.

2. The vacuum processing apparatus according to claim 1 , wherein the cooling means is made up of a jacket disposed on a wall surface of the vacuum chamber such that the block body is cooled by heat transfer from the wall surface of the vacuum chamber when a coolant is circulated through the jacket.

3. The vacuum processing apparatus according to claim 2 , further comprising a heat transfer sheet interposed between the inner wall surface of the vacuum chamber and the block body.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 2, 2021
From: SUZUKI, KOJI; NAGASHIMA, HIDETO; FUJII, YOSHINORI
To: ULVAC, INC.
Reel/Frame 055462/0223 →
Priority Claims (1)
JP 2018-215816 · Nov 16, 2018 · national
Continuity (1)
Related Publication 20210319985A1 · Oct 14, 2021