Window and method of manufacturing the same
A window including glass configured to protect an electronic panel from an external impact and a manufacturing method therefor include a base substrate having a front surface and a rear surface; and a bezel layer disposed on the rear surface of the base substrate, wherein the front surface of the base substrate has a roughness ranging from 0.2 nm to 3 nm, and at least a portion of the base substrate may be bent.
1. A method of manufacturing a window comprising the operations of:
providing an initial window which comprises glass and comprises a lithium oxide and phosphorus oxide (P 2 O 5 ); and
washing the initial window to manufacture the window,
wherein the operation of washing comprises:
an acid washing operation of providing the initial window into an acidic environment; and
a base washing operation of providing the initial window, which has been subjected to the acid washing operation, into a basic environment, and
wherein a roughness of the window ranges from 0.2 nm to 3 nm, and
wherein the surface roughness of the window is lower than a roughness of the provided initial window.
2. The method of claim 1 , wherein the acidic environment has a pH of 2 or lower.
3. The method of claim 2 , wherein the acidic environment comprises an acidic solution including at least one of nitric acid (HNO 3 ), sulfuric acid (H 2 SO 4 ), or hydrochloric acid (HCl).
4. The method of claim 3 , wherein the acid washing operation is performed for about 5 minutes to 10 minutes at a temperature of 60° C. to 65° C.
5. The method of claim 1 , wherein the basic environment has a pH of 13 or higher.
6. The method of claim 5 , wherein the basic environment comprises a basic solution including at least one of sodium hydroxide (NaOH) or potassium hydroxide (KOH).
7. The method of claim 1 , wherein the window, which has been subjected to the acid washing operation, comprises:
a first layer which includes an alkali metal and silicon that has a predetermined silicon content ratio with respect to the alkali metal; and
a second layer which is formed on a surface of the first layer and has a higher silicon content ratio than the first layer.
8. The method of claim 7 , wherein the second layer is formed at a portion of the initial window, from which the alkali metal is eluted out during the acid washing operation.
9. The method of claim 8 , wherein a thickness of the second layer is 200 nm to 500 nm.
10. The method of claim 9 , wherein during the base washing operation the window is formed by removing the second layer from the first layer.
11. The method of claim 1 , wherein a surface roughness of the window, which has been subjected to the acid washing operation, is greater than or equal to a surface roughness of the provided initial window.
12. The method of claim 1 , wherein the operation of providing the initial window comprises operations of:
providing a glass substrate; and
strengthening the glass substrate,
wherein an operation of strengthening includes an ion exchange treatment, and
the operation of providing the initial window is to provide strengthened glass substrate.
13. The method of claim 12 , wherein the operation of providing the initial window further comprises the operations of:
providing a mother substrate;
forming a plurality of unit substrates by cutting the mother substrate; and
chamfering side surfaces of the unit substrates,
wherein the provided initial window is one of the unit substrates which have been subjected to the operation of chamfering.
14. A method of manufacturing a window, the method comprising the operations of:
chemically strengthening a glass substrate so that a first initial substrate is formed;
wherein the glass substrate comprises a lithium oxide and phosphorus oxide (P 2 O 5 );
washing the first initial substrate with an acidic solution by immersing the first initial substrate into the acidic solution so that a second initial substrate is formed; and
washing the second initial substrate with a basic solution by immersing the second initial substrate into the basic solution so that a window is formed,
wherein a roughness of the window ranges from 0.2 nm to 3 nm, and
wherein the surface roughness of the window is lower than a roughness of the first initial substrate.
15. The method of claim 14 , wherein the operation of chemically strengthening does not comprise potassium carbonate (K 2 CO 3 ), sodium carbonate (Na 2 CO 3 ), potassium bicarbonate (KHCO 3 ), sodium bicarbonate (NaHCO 3 ), potassium phosphate (K 3 PO 4 ), sodium phosphate (Na 3 PO 4 ), potassium sulfate (K 2 SO 4 ), sodium sulfate (Na 2 SO 4 ), and potassium hydroxide (KOH).
16. The method of claim 15 , wherein the second initial substrate is formed by eluting out an alkali metal from the first initial substrate.
17. The method of claim 16 , wherein the second initial substrate comprises:
a first layer, which has substantially the same content ratio of silicon to the alkali metal as the first initial substrate; and
a second layer, which is formed on a surface of the first layer and has a higher content ratio of the silicon to the alkali metal than the first layer.
18. The method of claim 17 , wherein the second layer has more voids than the first layer.
19. The method of claim 17 , wherein the window is formed by removing the second layer from the second initial substrate.