IP Library Granted Patent US 12,460,098
Granted Patent B2
US 12,460,098 · App. 17/296,497 · Granted Nov 4, 2025

Jettable composition

Inventors: Christopher Wall (Tonbridge, GB); Clive Landells (Tonbridge, GB)
Assignee: Electra Polymers Ltd
C09D11/38C08F2/48C08F16/12C08F20/10C08F283/10C09D11/101C09D11/102C09D11/30C09D163/00H05K3/287H05K3/3452
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Quick Facts
Patent No.
US 12,460,098
App. No.
17/296,497
Granted
Nov 4, 2025
Kind
B2
Abstract

A jettable composition is described, comprising a reactive monomer, oligomer or prepolymer containing at least one epoxy or oxetane functional group; a free radical polymerizable compound; a thermal cross-linking agent; and a radical initiator, along with an electronic device having the composition jetted thereon and a method of manufacturing an electronic device.

Claims (30)

1 . A jettable composition, comprising:

a reactive monomer, oligomer or prepolymer containing at least one epoxy or oxetane functional group, wherein the reactive monomer, oligomer or prepolymer containing at least one epoxy or oxetane functional group comprises one or more of a phenol novolac type epoxy resin, and a cresol novolac type epoxy resin;

a free radical polymerizable compound, wherein the free radical polymerizable compound comprises one or more vinyl ether containing compound and/or one or more (meth) acrylate group containing compound;

a thermal cross-linking agent comprising an isocyanate compound and a triazine compound, wherein the isocyanate compound is a blocked isocyanate compound; and

a photoinitiator, wherein the ratio of reactive monomer, oligomer or prepolymer containing at least one epoxy or oxetane functional group to thermal cross-linking agent is in the range of from 3:1 to 1:1.

2 . The jettable composition of claim 1 , wherein the reactive monomer, oligomer or prepolymer containing at least one epoxy or oxetane functional group further comprises one or more of a bisphenol-A type epoxy resin, bisphenol-F type epoxy resin, a dicyclopentadiene type epoxy, a cycloaliphatic epoxy compound, epoxy ether, epoxy silane, glycidyl ether, glycidyl ester, glycidyl amine and oxetane monomer.

3 . The jettable composition of claim 1 , wherein the free radical polymerizable compound comprises a compound having a vinyl ether group and a (meth) acrylate group.

4 . The jettable composition of claim 1 , wherein the free radical polymerizable compound does not contain a hydroxyl substituent.

5 . The jettable composition of claim 1 , wherein the triazine compound comprises a tris (alkoxycarbonylamino) triazine.

6 . The jettable composition of claim 1 , wherein the free radical polymerizable compound comprises a hydroxy-containing monomer radical polymerizable compound in a molar ratio of triazine compound to hydroxyl group of no more than 1:2.

7 . The jettable composition of claim 1 , wherein the jettable composition comprises one or more thermal initiator.

8 . The jettable composition of claim 1 , further comprising one or more reactive diluents, antifoams, anti-tarnishing agents, levelling agents, colorants, pigment dispersants, polymerization inhibitors, surfactants, adhesion promoters, cure accelerators, thixotroping agents or flame retardants.

9 . The jettable composition of claim 1 , comprising:

10 wt % or less of one or more reactive monomer, oligomer or prepolymer of an epoxy or oxetane resin;

70 wt % or more of one or more free radical polymerisable compound;

5 wt % or less of one or more thermal cross-linking agent; and

10 wt % or less of one or more photoinitiator.

10 . The jettable composition of claim 1 , wherein the reactive monomer, oligomer or prepolymer of an epoxy or oxetane resin comprises an epoxy cresol novolac resin having an epoxy equivalent weight of from 190 g/Eq to 230 g/Eq.

11 . A method of manufacturing an electronic device, comprising:

jetting a jettable composition according to claim 1 onto a dielectric substrate having an electrically conductive pattern on a first surface thereof; and

curing the jetted composition.

12 . The method of claim 11 , wherein curing the jetted composition comprises exposing the composition to actinic radiation or electron beam radiation concurrent with printing and/or after printing.

13 . The method of claim 11 , wherein the jetted composition is thermally treated before, after or concurrent with curing using actinic radiation, wherein thermally treating comprises treatment at a temperature from 80° C. to 250° C.

14 . The method of claim 11 , wherein the composition is jetted onto the first surface of the dielectric substrate and the electrically conductive pattern.

15 . An electronic device, comprising a dielectric substrate having on a first surface thereof an electrically conductive pattern and the composition of claim 1 .

16 . The electronic device of claim 15 , wherein the composition is in a cured state.

17 . The electronic device of claim 15 , wherein the dielectric substrate comprises a non-conductive material selected from a paper/resin composite or a resin/fibre glass composite, a ceramic substrate, a polyester or a polyimide.

18 . The electronic device of claim 15 , wherein the electrically conductive pattern is formed from any electrically conductive metal or alloy, wherein the electrically conductive metal or alloy comprises one or more of gold, silver, palladium, nickel, tin, lead, aluminium, and copper.

19 . The electronic device of claim 15 , wherein the dielectric substrate further comprises on a second surface thereof an electrically conductive pattern and a jettable composition, comprising: a reactive monomer, oligomer or prepolymer containing at least one epoxy or oxetane functional group; a free radical polymerizable compound; a thermal cross-linking agent comprising one or more agent selected from an isocyanate compound and a triazine compound; and a radical initiator.

20 . The electronic device of claim 15 , wherein the electronic device is a printed circuit board.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 8, 2021
From: WALL, CHRISTOPHER; LANDELLS, CLIVE
To: ELECTRA POLYMERS LTD
Reel/Frame 057417/0806 →
Priority Claims (1)
GB 1819195 · Nov 26, 2018 · national
Continuity (1)
Related Publication 20210403737A1 · Dec 30, 2021
References Cited (37)
US 3969300A · Nagata · 1976 [cited by examiner]
US 4888407A · Yasuhisa · 1989 [cited by examiner]
US 4920164A · Sasaki · 1990 [cited by examiner]
US 6121446A · Flood · 2000 [cited by examiner]
US 8664288B2 · Nesvadba et al. · 2014 [cited by applicant]
US 9453137B2 · Choi et al. · 2016 [cited by applicant]
US 10005911B2 · Shimura et al. · 2018 [cited by applicant]
US 20090278904A1 · Oh et al. · 2009 [cited by applicant]
US 20160046813A1 · Tanikawa et al. · 2016 [cited by applicant]
US 20160049297A1 · Tanikawa et al. · 2016 [cited by applicant]
US 20170158922A1 · Tanikawa et al. · 2017 [cited by applicant]
US 20170233599A1 · Tanikawa et al. · 2017 [cited by applicant]
US 20170298005A1 · Tanikawa et al. · 2017 [cited by applicant]
EP 2902455A1 · 2015 [cited by applicant]
JP 2007194174A · 2007 [cited by applicant]
JP 2011231248A · 2011 [cited by examiner]
JP 2012184411A · 2012 [cited by applicant]
JP 2017186481A · 2017 [cited by applicant]
WO WO2016111122A1 · 2016 [cited by examiner]
WO 2017009097A1 · 2017 [cited by applicant]
WO 2015163276A1 · 2017 [cited by applicant]
Partial machine translation of JP-2011231248-A (generated Dec. 11, 2023). [cited by examiner]
Partial machine translation of WO 2016111122 A1 (Year: 2016). [cited by examiner]
Office Action dated Jun. 2, 2023 issued in equivalent Taiwanese Application No. 108142965 and English Translation. [cited by applicant]
Office Action dated Jun. 13, 2023 issued in equivalent Japanese Application No. 2021-529735 and English Translation. [cited by applicant]
Jung, K.,I, et al., “Characteristics of dual-curable blocked isocyanate with thermal radical initiator for low-temperature curing of automotive coatings”, Progress in Organic Coatings, 125 (2018) pp. 160-166. [cited by applicant]
Office action dated Jan. 12, 2022 issued in equivalent Chinese application No. 201980077757.1 and English translation thereof. [cited by applicant]
Kim, B., et al., “Thermal Radical Initiator Derivatives Based on O-Imino-Isourea: Synthesis, polymerization, and Characterization”, J. Polym. Sci. Part A: Polym. Chem. 54 (2016) pp. 3593-3600. [cited by applicant]
International Search Report and Written Opinion mailed Feb. 25, 2020 in corresponding PCT/GB2019/053329. [cited by applicant]
GPS Safety Summary, “Photocure resins SR531 cyclic trimethylol-propane formal acrylate data sheet”, Arkema 2014 pp. 1-5. [cited by applicant]
Kadurina, T. I., “Curing of epoxy oligomers by isocyanates”, Polymer, vol. 33, No. 18 (1992) pp. 3858-3864. [cited by applicant]
Isocyanate CAS # 3779-63-3 HDI isocyanurate trimer, http://www.wernerblank.com/polyur/chemistry/isocyanate/cas3779633 Jul. 2006. [cited by applicant]
Isocyanate CAS # 4035-89-6 HDI biuret triisocyanate, http://www.wernerblank.com/polyur/chemistry/isocyanate/cas4035896 Jul. 2006. [cited by applicant]
CYMEL NF 2000 crosslinking agent AllnexTechnical Data Sheet (MITM10050), www.allnex.com (2013). [cited by applicant]
Safety Data Sheet: ELJ11-5895 W—provisional SDS, EC No. 1907/2006, Annex II, HS&E Manager Nov. 2017. [cited by applicant]
GB Search Report mailed May 24, 2019 in corresponding GB 1819195.7. [cited by applicant]
Office Action issued in corresponding Korean Patent Application No. 10-2021-7019327, mailed Sep. 9, 2024. [cited by applicant]