IP Library Granted Patent US 11,444,112
Granted Patent B2
US 11,444,112 · App. 17/307,556 · Granted Sep 13, 2022

Solid-state image pickup device and electronic apparatus having a wall between the first pixel and the second pixel

Inventors: Atsushi Masagaki (Kanagawa, JP); Yusuke Tanaka (Kanagawa, JP)
Assignee: SONY GROUP CORPORATION
H01L27/14621G02B7/34H01L21/76H01L27/1463H01L27/14605H01L27/14607H01L27/14627H01L27/14641H01L27/1464H01L27/14612H04N5/359H04N5/374H04N5/37457
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Quick Facts
Patent No.
US 11,444,112
App. No.
17/307,556
Granted
Sep 13, 2022
Kind
B2
Abstract

The present disclosure relates to a solid-state image pickup device and an electronic apparatus that are capable of preventing leakage of charges between adjacent pixels. A plurality of pixels perform photoelectric conversion on light incident from a back surface via different on-chip lenses for each pixel. A pixel separation wall is formed between pixels adjacent to each other, and includes a front-side trench formed from a front surface and a backside trench formed from the back surface. A wiring layer is provided on the front surface. The present disclosure is applicable to, for example, a backside illuminated CMOS image sensor.

Claims (44)

1. A light detecting device, comprising:

a first photoelectric conversion region disposed in a substrate wherein the substrate comprises a first surface and a second surface opposite the first surface, the first surface being a light incident surface of the substrate;

a second photoelectric conversion region disposed in the substrate and adjacent to the first photoelectric conversion region;

a first on-chip lens disposed above the first surface of the substrate, the first on-chip lens corresponding to the first photoelectric conversion region; and

a second on-chip lens disposed above the first surface of the substrate and disposed adjacent to the first on-chip lens, the second on-chip lens corresponding to the second photoelectric conversion region,

wherein the first photoelectric conversion region and the first on-chip lens are a part of a first pixel and the second photoelectric conversion region and the second on-chip lens are a part of a second pixel,

the light detection device further comprising:

a first wall disposed between the first pixel and the second pixel, wherein a part of the first wall is disposed at the first surface of the substrate;

a second wall disposed between the first pixel and the second pixel, wherein a part of the second wall is disposed at the second surface of the substrate; and

a first semiconductor region disposed in the substrate, wherein, in a cross-sectional view, the first semiconductor region is disposed between a first portion of the second wall and a second portion of the second wall.

2. The light detecting device according to claim 1 , wherein the first wall overlaps the first semiconductor region in a plan view.

3. The light detecting device according to claim 1 , wherein the first semiconductor region is one of a source and a drain of an amplification transistor.

4. The light detecting device according to claim 1 , wherein the first semiconductor region is one of a source and a drain of a selection transistor.

5. The light detecting device according to claim 1 , wherein the first semiconductor region is one of a source and a drain of a reset transistor.

6. The light detecting device according to claim 1 , wherein the first semiconductor region is coupled to VSS.

7. The light detecting device according to claim 6 , wherein the VSS is a ground level.

8. The light detecting device according to claim 1 , wherein the first wall is not contact with the second wall.

9. The light detecting device according to claim 1 , wherein a first length of the first wall in a depth direction of the substrate is different than a second length of the second wall in the depth direction of the substrate.

10. The light detecting device according to claim 9 , wherein the first length is greater than the second length.

11. The light detecting device according to claim 1 , further comprising a wiring layer, wherein the wiring layer is provided on the second surface of the substrate.

12. The light detecting device according to claim 1 ,

wherein the first pixel further comprises a third photoelectric conversion region disposed in the substrate and disposed adjacent to the first photoelectric conversion region, the first on-chip lens further corresponding to the third photoelectric conversion region, and

wherein the second pixel further comprises a fourth photoelectric conversion region disposed in the substrate and disposed adjacent to the second photoelectric conversion region, the second on-chip lens further corresponding to the fourth photoelectric conversion region.

13. The light detecting device according to claim 12 ,

wherein the first pixel further comprises a first color filter disposed between the first on-chip lens and the substrate,

wherein the second pixel further comprises a second color filter disposed between the second on-chip lens and the substrate, and

wherein the first color filter and the second color filter are configured to pass light of a color different than each other.

14. The light detecting device according to claim 12 ,

wherein the first and third photoelectric conversion regions are configured to receive light of a first color, and

wherein the second and fourth photoelectric conversion regions are configured to receive light of a second color different than the first color.

15. The light detecting device according to claim 12 , wherein each of the first pixel and the second pixel is configured to detect a phase difference.

16. An electronic apparatus, comprising:

a lens;

a digital signal processing circuitry; and

a light detecting device, comprising:

a first photoelectric conversion region disposed in a substrate wherein the substrate comprises a first surface and a second surface opposite the first surface, the first surface being a light incident surface of the substrate;

a second photoelectric conversion region disposed in the substrate and adjacent to the first photoelectric conversion region;

a first on-chip lens disposed above the first surface of the substrate, the first on-chip lens corresponding to the first photoelectric conversion region; and

a second on-chip lens disposed above the first surface of the substrate and disposed adjacent to the first on-chip lens, the second on-chip lens corresponding to the second photoelectric conversion region,

wherein the first photoelectric conversion region and the first on-chip lens are a part of a first pixel and the second photoelectric conversion region and the second on-chip lens are a part of a second pixel,

the light detection device further comprising:

a first wall disposed between the first pixel and the second pixel, wherein a part of the first wall is disposed at the first surface of the substrate;

a second wall disposed between the first pixel and the second pixel, wherein a part of the second wall is disposed at the second surface of the substrate; and

a first semiconductor region disposed in the substrate, wherein, in a cross-sectional view, the first semiconductor region is disposed between a first portion of the second wall and a second portion of the second wall.

Assignments (2)
CHANGE OF NAME Recorded Oct 1, 2021
From: SONY CORPORATION
To: SONY GROUP CORPORATION
Reel/Frame 057684/0441 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 23, 2021
From: MASAGAKI, ATSUSHI; TANAKA, YUSUKE
To: SONY CORPORATION
Reel/Frame 057632/0173 →
Priority Claims (1)
JP 2016-013613 · Jan 27, 2016 · national
Continuity (4)
Continuation 16849866 · Apr 15, 2020
Continuation 16539691 · Aug 13, 2019
Continuation 15559541
Related Publication 20210265406A1 · Aug 26, 2021