IP Library › Granted Patent US 12,028,721
Granted Patent B2
US 12,028,721 · App. 17/309,621 · Granted Jul 2, 2024

Measurement method and apparatus using multiple frequency partial band in wireless communication system

Inventors: Byounghoon Jung (Suwon-si, KR); Anil Agiwal (Suwon-si, KR); Jaehyuk Jang (Suwon-si, KR)
Assignee: Samsung Electronics Co., Ltd.
H04W16/28H04W24/10H04W72/046H04W72/542
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Quick Facts
Patent No.
US 12,028,721
App. No.
17/309,621
Granted
Jul 2, 2024
Kind
B2
Abstract

Provided are a measurement method and apparatus using a multiple frequency partial band in a wireless communication system, and an operation method of a terminal for measuring quality of a cell in a wireless communication system, may include: receiving a plurality of beams including a reference signal, the plurality of beams transmitted by using one of a first bandwidth part (BWP) and a second BWP from a base station of the cell; determining a first beam quality measurement value representing quality of plurality of beams transmitted by using the first BWP; determining a second beam quality measurement value representing quality of plurality of beams transmitted by using the second BWP; and determining a cell quality measurement value indicating the quality of the cell, based on the first beam quality measurement value and the second beam quality measurement value.

Claims (36)

1. An operation method of a terminal for measuring quality of a cell in a wireless communication system, the operation method comprising:

receiving a first plurality of beams on a first bandwidth part (BWP) in the cell and a second plurality of beams on a second BWP in the cell;

determining a first beam quality measurement value for the first BWP based on quality measurement values of the first plurality of beams received on the first BWP

and a second beam quality measurement value for the second BWP, based on quality measurement values of the second plurality of beams received on the second BWP; and

determining a cell quality measurement value representing the quality of the cell, based on the first beam quality measurement value for the first BWP and the second beam quality measurement value for the second BWP.

2. The operation method of claim 1 , wherein the determining of the cell quality measurement value comprises determining, as the cell quality measurement value, a higher value among the first beam quality measurement value and the second beam quality measurement value.

3. The operation method of claim 1 , wherein the determining of the cell quality measurement value comprises determining, as the cell quality measurement value, an average of the first beam quality measurement value and the second beam quality measurement value.

4. The operation method of claim 1 , wherein the determining of the cell quality measurement value comprises determining, as the cell quality measurement value, an average of all or some of values equal to or greater than a certain threshold value among the first beam quality measurement value and the second beam quality measurement value.

5. The operation method of claim 1 , further comprising:

weight-filtering the cell quality measurement value; and

reporting, to a base station, the weight-filtered cell quality measurement value.

6. The operation method of claim 1 , further comprising:

weight-filtering the first beam quality measurement value for the first BWP and the second beam quality measurement value for the second BWP;

determining at least one representative beam quality measurement value, based on the weight-filtered first beam quality measurement value and the weight-filtered second beam quality measurement value; and

reporting, to a base station, the at least one representative beam quality measurement value.

7. The operation method of claim 6 , wherein the determining of the at least one representative beam quality measurement value comprises determining, as the at least one representative beam quality measurement value, a higher value among the weight-filtered first beam quality measurement value and the weight-filtered second beam quality measurement value.

8. The operation method of claim 6 , wherein the determining of the at least one representative beam quality measurement value comprises determining, as the at least one representative beam quality measurement value, some or all of values equal to or greater than a certain threshold value among the weight-filtered first beam quality measurement value and the weight-filtered second beam quality measurement value.

9. A terminal for measuring quality of a cell in a wireless communication system, the terminal comprising:

a transceiver; and

at least one processor coupled to the transceiver and configured to:

receive a first plurality of beams on a first bandwidth part (BWP) in the cell and a second plurality of beams on a second BWP in the cell,

determine a first beam quality measurement value for the first BWP based on quality measurement values of the first plurality of beams received on the first BWP

and a second beam quality measurement value for the second BWP based on quality measurement values of the second plurality of beams received on the second BWP, and

determine a cell quality measurement value representing the quality of the cell, based on the first beam quality measurement value for the first BWP and the second beam quality measurement value for the second BWP.

10. The terminal of claim 9 , wherein the at least one processor is further configured to determine, as the cell quality measurement value, a higher value among the first beam quality measurement value and the second beam quality measurement value.

11. The terminal of claim 9 , wherein the at least one processor is further configured to determine, as the cell quality measurement value, an average of the first beam quality measurement value and the second beam quality measurement value.

12. The terminal of claim 9 , wherein the at least one processor is further configured to determine, as the cell quality measurement value, an average of all or some of values equal to or greater than a certain threshold value among the first beam quality measurement value and the second beam quality measurement value.

13. The terminal of claim 9 , wherein the at least one processor is further configured to:

weight-filter the cell quality measurement value, and

report, to a base station, the weight-filtered cell quality measurement value.

14. The terminal of claim 9 , wherein the at least one processor is further configured to:

weight-filter the first beam quality measurement value for the first BWP and the second beam quality measurement value for the second BWP,

determine at least one representative beam quality measurement value, based on the weight-filtered first beam quality measurement value and the weight-filtered second beam quality measurement value; and

report, to a base station, the at least one representative beam quality measurement value.

15. The terminal of claim 14 , wherein the at least one processor is further configured to determine, as the at least one representative beam quality measurement value, a higher value among the weight-filtered first beam quality measurement value and the weight-filtered second beam quality measurement value.

16. The terminal of claim 14 , wherein the at least one processor is further configured to determine, as the at least one representative beam quality measurement value, some or all of values equal to or greater than a certain threshold value among the weight-filtered first beam quality measurement value and the weight-filtered second beam quality measurement value.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 10, 2021
From: JUNG, BYOUNGHOON; AGIWAL, ANIL; JANG, JAEHYUK
To: SAMSUNG ELECTRONICS CO., LTD
Reel/Frame 056505/0710 →
Priority Claims (1)
KR 10-2018-0160345 · Dec 12, 2018 · national
Continuity (1)
Related Publication 20210385669A1 · Dec 9, 2021