Optoelectronic semiconductor body and light-emitting diode
A light-emitting diode includes a semiconductor body and electrical connection points for contacting the semiconductor body, the semiconductor body including an active region including a quantum well that generates electromagnetic radiation, a first region and a second region that impede passage of charge carriers from the active region, wherein the semiconductor body is based on a nitride compound semiconductor material, the first region is directly adjacent to the active region on a p-side, the second region is arranged on a side of the first region facing away from the active region, the first region has an electronic band gap larger than the electronic band gap of the quantum well and less than or equal to an electronic band gap of the second region, the first region and the second region contain aluminum, and the active region emits electromagnetic radiation having a peak wavelength of less than 480 nm.
1. A light-emitting diode comprising:
a semiconductor body and electrical connection points for contacting the semiconductor body, the semiconductor body comprising
an active region comprising a quantum well that generates electromagnetic radiation,
a first region that impedes passage of charge carriers from the active region, and
a second region that impedes passage of charge carriers from the active region, wherein
the semiconductor body is based on a nitride compound semiconductor material,
the first region is directly adjacent to the active region on a p-side,
the second region is arranged on a side of the first region facing away from the active region,
the first region has an electronic band gap larger than the electronic band gap of the quantum well and less than or equal to an electronic band gap of the second region,
the first region and the second region contain aluminum,
the active region emits electromagnetic radiation having a peak wavelength of less than 480 nm,
the first region is n-doped and the second region is p-doped.
2. The light-emitting diode according to claim 1 , further comprising an intermediate region arranged between the first region and the second region, wherein the intermediate region has an electronic band gap larger than the electronic band gap of the quantum well and smaller than the electronic band gaps of the first region and of the second region, and the intermediate region is at least partially free of aluminum.
3. The light-emitting diode according to claim 2 , wherein the intermediate region has at least two subregions that differ from one another in their material composition and electronic band gap.
4. The light-emitting diode according to claim 3 , wherein at least one of the subregions is free of aluminum.
5. The light-emitting diode according to claim 2 , wherein the intermediate region directly adjoins the first region and directly adjoins the second region.
6. The light-emitting diode according to claim 3 , wherein directly adjoining subregions of the intermediate region have different band gaps from each other.
7. The light-emitting diode according to claim 1 , wherein the second region has an aluminum concentration greater than an aluminum concentration in the first region.
8. The light-emitting diode according to claim 2 , wherein the intermediate region is nominally undoped.
9. The light-emitting diode according to claim 2 , wherein the intermediate region is n-doped.
10. The light-emitting diode according to claim 1 , wherein the active region emits electromagnetic radiation having a peak wavelength between 360 nm and 395 nm.
11. The light-emitting diode according to claim 1 , wherein the second region is formed with Al y2 Ga 1-y2 N or with Al y2 In x Ga 1-y2 N, and x is smaller than 0.01, Y2 is 0.06 or greater.
12. The light-emitting diode according to claim 1 , wherein a thickness of the second region is 1 nm to 20 nm.
13. The light-emitting diode according to claim 1 , wherein the first region is formed with Al y1 Ga 1-y1 N or Al y1 In x Ga 1-y1 N, and y1 is greater than 0.05 and x is smaller than 0.01.
14. The light-emitting diode according to claim 1 , wherein a thickness of the first region is 1 nm to 5 nm.
15. The light-emitting diode according to claim 1 , wherein
the first region is formed with Al y1 In x Ga 1-y1 N,
the second region is formed with Al y2 In x Ga 1-y2 N,
x is greater than 0 and smaller than 0.01, and
Y2 is greater than y1.
16. A light-emitting diode comprising:
a semiconductor body and electrical connection points for contacting the semiconductor body, the semiconductor body comprising
an active region comprising a quantum well that generates electromagnetic radiation,
a first region that impedes passage of charge carriers from the active region, and
a second region that impedes passage of charge carriers from the active region, wherein
the semiconductor body is based on a nitride compound semiconductor material,
the first region is directly adjacent to the active region on a p-side,
the second region is arranged on a side of the first region facing away from the active region,
the first region has an electronic band gap larger than the electronic band gap of the quantum well and less than or equal to an electronic band gap of the second region,
the first region and the second region contain aluminum,
the active region emits electromagnetic radiation having a peak wavelength of less than 480 nm,
and the first region is nominally undoped.