THREE CHAMBER REGENERATIVE THERMAL OXIDIZER

1 . A regenerative thermal oxidizer apparatus, comprising:

a first chamber opening into an inlet manifold, an outlet manifold, and a purge manifold, a first chamber first valve controlling access from the first chamber to the inlet manifold, a first chamber second valve controlling access from the first chamber to the outlet manifold, and a first chamber purge valve controlling access from the first chamber to the purge manifold;

a second chamber opening into the inlet manifold, the outlet manifold, and the purge manifold, a second chamber first valve controlling access from the second chamber to the inlet manifold, a second chamber second valve controlling access from the first chamber to the outlet manifold, and a second chamber purge valve controlling access from the second chamber to the purge manifold;

a third chamber opening into the inlet manifold, the outlet manifold, and the purge manifold, a third chamber first valve controlling access from the third chamber to the inlet manifold, a third chamber second valve controlling access from the third chamber to the outlet manifold, and a third chamber purge valve controlling access from the third chamber to the purge manifold;

a processing unit configured to selectively control the first chamber first valve, the first chamber second valve, the second chamber first valve, the second chamber second valve, the third chamber first valve, the third chamber second valve, such that the processing unit is configured to put the regenerative thermal oxidizer into a first sequence whereby the processing unit is configured to operate the first chamber first valve to seal the first chamber from the outlet manifold, and to operate the first chamber second valve to expose the first chamber to the inlet manifold, and to operate the second chamber first valve to seal the second chamber from the outlet manifold and to operate the second chamber second valve to seal the second chamber from the inlet manifold, and to operate the third chamber first valve to expose the third chamber to the outlet manifold and to operate the third chamber second valve to seal the third chamber from the inlet manifold,

wherein the regenerative thermal oxidizer is configured to enable contaminated gas to enter the inlet manifold and to enable processed gas to exit the regenerative thermal oxidizer via the outlet manifold,

wherein the first chamber first valve, the first chamber second valve, the second chamber first valve, the second chamber second valve, the third chamber first valve, the third chamber second valve are all poppet valves.

2 . The apparatus as recited in claim 1 , wherein the processing unit is further configured to put the regenerative thermal oxidizer into a second sequence whereby the processing unit is configured to operate the first chamber first valve to seal the first chamber from the outlet manifold, and to operate the first chamber second valve to seal the first chamber from the inlet manifold, and to operate the second chamber first valve to expose the second chamber to the outlet manifold and to operate the second chamber second valve to seal the second chamber from the inlet manifold, and to operate the third chamber first valve to seal the third chamber from the outlet manifold and to operate the third chamber second valve to expose the third chamber to the inlet manifold,

3 . The apparatus as recited in claim 2 , wherein the processor is further configured such that in the second sequence a first chamber purge valve is opened while the second chamber purge valve is closed and the third chamber purge valve is closed.

4 . The apparatus as recited in claim 1 , wherein the processor is further configured such that in the first sequence a second chamber purge valve is opened while the first chamber purge valve is closed and the third chamber purge valve is closed.

5 . The apparatus as recited in claim 3 , wherein the apparatus is further configured to clean out the second chamber in in the second sequence.

6 . The apparatus as recited in claim 4 , wherein the apparatus is further configured to clean out the first chamber in the first sequence.

7 . The apparatus as recited in claim 1 , further comprising a purge manifold which connects the first chamber the second chamber and the third chamber, a first purge valve configured to control flow between the first chamber and the purge manifold, a second purge valve configured to control flow between the second chamber and the purge manifold, and a third purge valve configured to control flow between the third chamber and the purge manifold, wherein the purge manifold leads to the combustion chamber.

8 . The apparatus as recited in claim 7 , wherein the processor is further configured to, in the first sequence, open the first purge valve while the second purge valve is in closed position and the third purge valve is in closed position.

9 . The apparatus as recited in claim 1 , further comprising a purge manifold which connects the first chamber the second chamber and the third chamber, a fan configured to induce outside air to flow through the purge manifold and towards the first chamber and the second chamber and the third chamber, a first purge valve configured to control flow between the first chamber and the purge manifold, a second purge valve configured to control flow between the second chamber and the purge manifold, and a third purge valve configured to control flow between the third chamber and the purge manifold.

10 . The apparatus as recited in claim 9 , wherein the processor is further configured to, in the first sequence, open the first purge valve while the second purge valve is in closed position and the third purge valve is in closed position.

11 . The apparatus as recited in claim 1 , further comprising a purge manifold which connects the first chamber the second chamber and the third chamber, a first purge valve configured to control flow between the first chamber and the purge manifold, a second purge valve configured to control flow between the second chamber and the purge manifold, and a third purge valve configured to control flow between the third chamber and the purge manifold, wherein the purge manifold connects to the inlet manifold.

12 . The apparatus as recited in claim 11 , wherein the processor is further configured to, in the first sequence, open the first purge valve while the second purge valve is in closed position and the third purge valve is in closed position.

13 . A method to implement a regenerative thermal oxidizer apparatus, comprising:

providing:

a first chamber opening into an inlet manifold, an outlet manifold, and a purge manifold, a first chamber first valve controlling access from the first chamber to the inlet manifold, a first chamber second valve controlling access from the first chamber to the outlet manifold, and a first chamber purge valve controlling access from the first chamber to the purge manifold;

a second chamber opening into the inlet manifold, the outlet manifold, and the purge manifold, a second chamber first valve controlling access from the second chamber to the inlet manifold, a second chamber second valve controlling access from the first chamber to the outlet manifold, and a second chamber purge valve controlling access from the second chamber to the purge manifold;

a third chamber opening into the inlet manifold, the outlet manifold, and the purge manifold, a third chamber first valve controlling access from the third chamber to the inlet manifold, a third chamber second valve controlling access from the third chamber to the outlet manifold, and a third chamber purge valve controlling access from the third chamber to the purge manifold;

putting the regenerative thermal oxidizer into a first sequence by operating the first chamber first valve to seal the first chamber from the outlet manifold, and operating the first chamber second valve to expose the first chamber to the inlet manifold, and operating the second chamber first valve to seal the second chamber from the outlet manifold and to operate the second chamber second valve to seal the second chamber from the inlet manifold, and operating the third chamber first valve to expose the third chamber to the outlet manifold and operating the third chamber second valve to seal the third chamber from the inlet manifold,

enabling contaminated gas to enter the inlet manifold and enabling processed gas to exit the regenerative thermal oxidizer via the outlet manifold,

wherein the first chamber first valve, the first chamber second valve, the second chamber first valve, the second chamber second valve, the third chamber first valve, the third chamber second valve are all poppet valves.

14 . The method as recited in claim 13 , further comprising putting the regenerative thermal oxidizer into a second sequence whereby operating the first chamber first valve to seal the first chamber from the outlet manifold, and operating the first chamber second valve to seal the first chamber from the inlet manifold, and operating the second chamber first valve to expose the second chamber to the outlet manifold and operating the second chamber second valve to seal the second chamber from the inlet manifold, and operating the third chamber first valve to seal the third chamber from the outlet manifold and operating the third chamber second valve to expose the third chamber to the inlet manifold,

15 . The method as recited in claim 14 , wherein in the second sequence a first chamber purge valve is opened while the second chamber purge valve is closed and the third chamber purge valve is closed.

16 . The method as recited in claim 13 , wherein in the first sequence a second chamber purge valve is opened while the first chamber purge valve is closed and the third chamber purge valve is closed.

17 . The method as recited in claim 14 , wherein the method further comprises cleaning out the second chamber in in the second sequence.

18 . The method as recited in claim 13 , wherein the method further comprises cleaning out the first chamber in the first sequence.