Method of manufacturing a silicon carbide ingot comprising moving a heater surrounding a reactor to induce silicon carbide raw materials to sublimate and growing the silicon carbide ingot on a seed crystal

1. A method of manufacturing a silicon carbide ingot, the method comprising:

a preparing operation of adjusting an internal space of a reactor in which silicon carbide raw materials and a seed crystal are disposed in a lower part and an upper part of the internal space, respectively, to have a vacuum atmosphere;

a proceeding operation of injecting an inert gas into the internal space, heating the internal space by moving a heater surrounding the reactor to induce the silicon carbide raw materials to sublimate, and growing the silicon carbide ingot on the seed crystal; and

a cooling operation of cooling a temperature of the internal space to a room temperature,

wherein the moving of the heater has a relative position which becomes more distant at a rate of 0.1 mm/hr to 0.48 mm/hr based on the seed crystal,

wherein the proceeding operation sequentially comprises a pre-growth process and a growth process,

wherein the pre-growth process sequentially comprises a first process, a second process, and a third process,

wherein:

the first process in the pre-growth process is to change the vacuum atmosphere to an inert atmosphere and maintain a temperature difference of 40° C. to 60° C. between the upper part near the seed crystal and the lower part near the silicon carbide raw materials,

the second process in the pre-growth process is to raise the temperature of the internal space using the heater, and

the third process in the pre-growth process is to depressurize the internal space to reach a growth pressure and heat the internal space to a growth temperature of 2100° C. to 2500° C.,

wherein the growth process maintains the internal space at the growth temperature and the growth pressure and induces the silicon carbide ingot to grow,

wherein the heater is moved during the growth process,

wherein a maximum heating region of the internal space corresponds to a position at a center of the heater, and the maximum heating region has a temperature of 2100° C. to 2500° C.

2. The method of claim 1 , wherein the internal space has a sub-heating region with a temperature 110° C. to 160° C. lower than the temperature of the maximum heating region, and the heater is movable to maintain the temperature of the sub-heating region.

3. The method of claim 1 , wherein a total moving distance of the heater is 10 mm or more.

4. The method of claim 1 , wherein a temperature difference between the upper part of the internal space and the lower part of the internal space in the growth process is greater than the temperature difference in the first process by 70 to 120° C.