Stepped indirectly heated cathode with improved shielding
An ion source for forming a plasma has a cathode with a cavity and a cathode surface defining a cathode step. A filament is disposed within the cavity, and a cathode shield has a cathode shield surface at least partially encircling the cathode surface. A cathode gap is defined between the cathode surface and the cathode shield surface, where the cathode gap defines a tortured path for limiting travel of the plasma through the gap. The cathode surface can have a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, where the first cathode diameter and second cathode diameter differ from one another to define the cathode step. The stepped cylindrical surface can be an exterior surface or an interior surface. The first and second cathode diameters can be concentric or axially offset.
1. An ion source for forming a plasma, the ion source comprising:
a cathode comprising:
a cathode surface defining a cathode step; and
a cavity;
a filament disposed within the cavity; and
a cathode shield having a cathode shield surface at least partially encircling the cathode surface, wherein a cathode gap is defined between the cathode surface and the cathode shield surface.
2. The ion source of claim 1 , wherein the cathode surface comprises a stepped cylindrical surface defined by a first cathode diameter and a second cathode diameter, wherein the first cathode diameter and second cathode diameter differ from one another, therein defining the cathode step.
3. The ion source of claim 2 , wherein the stepped cylindrical surface comprises an exterior surface defining the first cathode diameter and the second cathode diameter, and wherein the cathode shield surface defines a cathode shield step, wherein a profile of the cathode shield step generally conforms to the cathode step, whereby the cathode gap between the cathode surface and the cathode shield surface is maintained.
4. The ion source of claim 3 , wherein the second cathode diameter is greater than the first cathode diameter.
5. The ion source of claim 4 , wherein the first cathode diameter and the second cathode diameter are concentric.
6. The ion source of claim 4 , wherein the first cathode diameter and the second cathode diameter have respective centerlines that are offset by a predetermined distance.
7. The ion source of claim 3 , wherein the cathode gap defines a tortured path.
8. The ion source of claim 2 , wherein the stepped cylindrical surface comprises an interior surface defining the first cathode diameter and the second cathode diameter.
9. The ion source of claim 8 , wherein the second cathode diameter is greater than the first cathode diameter, thereby defining a thickened wall of the cathode.
10. The ion source of claim 9 , wherein a filament gap is defined between the filament and the thickened wall of the cathode.
11. The ion source of claim 1 , wherein the cathode comprises a hollow cylindrical portion extending from a solid cylindrical portion at a transition region, wherein the cavity is defined within the hollow cylindrical portion and wherein the cathode step is defined in the transition region.
12. The ion source of claim 11 , wherein the cathode shield radially surrounds the cathode while axially exposing a front cathode surface of the cathode to the plasma.
13. An ion source, comprising:
a cathode having a cathode step defined therein; and
a cathode shield having a cathode shield step defined therein, wherein the cathode shield radially surrounds the cathode while maintaining a cathode gap between the cathode and cathode shield.
14. The ion source of claim 13 , wherein the cathode shield step generally conforms to the cathode step.
15. The ion source of claim 13 , wherein the cathode comprises a hollow cylindrical portion extending from a solid cylindrical portion proximate to a transition region, wherein the cathode step is defined in the transition region.
16. The ion source of claim 13 , further comprising a filament disposed within a hollow cylindrical portion of the cathode.
17. The ion source of claim 13 , wherein the cathode comprises a first cathode diameter and a second cathode diameter, thereby defining the cathode step.
18. The ion source of claim 17 , wherein the first cathode diameter and the second cathode diameter are concentric.
19. The ion source of claim 17 , wherein the first cathode diameter and the second cathode diameter have centerlines offset by a predetermined distance.
20. A cathode assembly for an ion source, the cathode assembly comprising:
a stepped cathode; and
a stepped cathode shield radially surrounding the stepped cathode while maintaining a gap between the stepped cathode and stepped cathode shield, wherein an interior surface of the stepped cathode shield generally conforms to an exterior surface of the stepped cathode, therein defining a tortured path between the stepped cathode and the stepped cathode shield.
21. The cathode assembly of claim 20 , wherein the stepped cathode comprises a plurality of cathode steps defined in the exterior surface of the stepped cathode, and wherein the stepped cathode shield comprises a plurality of shield steps defined in the interior surface of the stepped cathode shield.