Projectors of structured light
Optical apparatus includes a beam source, which is configured to generate an optical beam having a pattern imposed thereon. A projection lens is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent. A field multiplier is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.
1. Optical apparatus, comprising:
a beam source, which is configured to generate an optical beam having a pattern imposed thereon;
a projection lens, which is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent; and
a field multiplier, which is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.
2. The apparatus according to claim 1 , wherein the second angular extent is at least twice the first angular extent.
3. The apparatus according to claim 1 , and comprising a reflective surface interposed so as to fold the projected optical beam between the projection lens and the field multiplier.
4. The apparatus according to claim 1 , wherein the field multiplier comprises a diffractive optical element (DOE).
5. The apparatus according to claim 4 , wherein the DOE is configured to expand the projected optical beam by producing multiple, mutually-adjacent tiles on the second area, each tile containing a respective replica of the pattern.
6. The apparatus according to claim 5 , wherein the DOE is configured to generate a two-dimensional array of the tiles.
7. The apparatus according to claim 6 , wherein the tiles have a pitch, and wherein at least some of the tiles are offset transversely relative to neighboring tiles by an offset that is a fraction of the pitch.
8. The apparatus according to claim 1 , wherein the field multiplier comprises a prism.
9. The apparatus according to claim 8 , wherein the prism has an edge and is positioned so that the optical beam projected by the projection lens is incident on the edge.
10. The apparatus according to claim 9 , wherein the prism has a triangular profile with a vertex angle that is greater than 90° at the edge upon which the projected optical beam is incident.
11. The apparatus according to claim 8 , wherein the field multiplier comprises first and second prisms, having respective first and second edges and having respective first and second bases opposite the first and second edges, wherein the first and second bases are joined together while the first and prisms are rotated so that the first and second edges opposite the bases are mutually perpendicular.
12. The apparatus according to claim 8 , wherein the prism has a pyramidal shape with an apex and is positioned so that the optical beam projected by the projection lens is incident on the apex.
13. The apparatus according to claim 8 , wherein the prism comprises an internal reflective surface configured to fold the projected optical beam.
14. The apparatus according to claim 1 , wherein the beam source comprises a light source, which emits the optical beam, and a patterning element, which is interposed in the optical beam emitted by the light source.
15. The apparatus according to claim 1 , wherein the beam source comprises a monolithic array of light-emitting elements, arranged on a semiconductor substrate in a two-dimensional pattern corresponding to the pattern imposed on the optical beam.
16. A method for pattern projection, comprising:
generating an optical beam having a pattern imposed thereon;
projecting the optical beam using a projection lens so as to cast the pattern onto a first area in space having a first angular extent; and
applying a field multiplier to expand the optical beam projected by the projection lens so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.
17. The method according to claim 16 , wherein the second angular extent is at least twice the first angular extent.
18. The method according to claim 16 , wherein the field multiplier comprises a diffractive optical element (DOE).
19. The method according to claim 16 , wherein generating the optical beam comprises transmitting the optical beam through a patterning element.
20. The method according to claim 16 , wherein generating the optical beam comprises driving a monolithic array of light-emitting elements, arranged on a semiconductor substrate in a two-dimensional pattern corresponding to the pattern imposed on the optical beam, to emit the optical beam.