Semiconductor memory device having memory layer extending between insulation layer and semiconductor layer
A semiconductor memory device, includes: a stack including a wiring layer and an insulation layer alternately stacked in a first direction; a semiconductor layer including a first region overlapping with the insulation layer in a second direction, and a second region overlapping with the wiring layer in the second direction; an insulation region between the wiring layer and the second region; and a memory region on the opposite side of the second region from the wiring layer. The wiring layer is farther from the first region in the second direction than the insulation layer is. The second region has a part between the insulation layers in the first direction and protruding further toward the wiring layer than the first region in the second direction. The memory region has a face opposite to the second region and closer to the wiring layer in the second direction than the first region is.
1. A semiconductor memory device, comprising:
a stack including a wiring layer and an insulation layer, the wiring layer and the insulation layer being alternately stacked in a first direction;
a semiconductor layer including a first region and a second region, the first region overlapping with the insulation layer in a second direction intersecting the first direction, and the second region overlapping with the wiring layer in the second direction;
an insulation region provided between the wiring layer and the second region; and
a memory region overlapping with the wiring layer in the second direction, wherein:
the wiring layer is farther from the first region in the second direction than the insulation layer is;
the second region has a part provided between a plurality of the insulation layers in the first direction and protruding further toward the wiring layer than the first region in the second direction;
the part of the second region includes a first portion between the memory region and the wiring layer in the second direction; and
the memory region has a face opposite to the first portion, the face being closer to the wiring layer in the second direction than the first region is.
2. The device according to claim 1 , further comprising
a second insulation layer on the face, wherein
the memory region is provided between the first portion of the part of the second region and the second insulation layer in the second direction.
3. The device according to claim 2 , wherein
the part of the second region includes a second portion and a third portion, each of the second portion and the third portion extending along the insulation layers; and
at least a part of the second insulation layer is provided between the second portion and the third portion in the first direction.
4. The device according to claim 1 , wherein
the first region contains silicide or impurity-doped silicon.
5. The device according to claim 1 , wherein
the memory region includes a variable resistance layer or a variable capacitance layer.
6. The device according to claim 1 , wherein:
the second region has a first surface and a second surface;
the insulation region is provided on the first surface; and
the memory region is provided on the second surface.
7. The device according to claim 1 , wherein
the memory region does not extend between the insulation layer and the first region in the second direction.
8. The device according to claim 1 , wherein
the insulation region further extends between the insulation layer and the second region in the first direction, and
the memory region overlaps with the insulation region in the first direction.
9. The device according to claim 1 , wherein
the part of the second region includes a second portion and a third portion, each of the second portion and the third portion extending along the insulation layers, and
the memory region is provided between the second portion and the third portion in the first direction.