Method and apparatus for measuring displacement of an end effector
A method for measuring displacements of an end effector passing through a load lock gate of semiconductor equipment according to an embodiment of the present disclosure includes measuring a first displacement in a vertical direction and a second displacement in a horizontal direction of the end effector while the end effector passes through the load lock gate, calculating changes in pitch and roll of the end effector based on the measured first displacement, and calculating a change in yaw of the end effector based on the measured second displacement.
1. A method for measuring displacements of an end effector passing through a load lock gate of semiconductor equipment, the method comprising:
measuring a first displacement in a vertical direction of the end effector by a first displacement sensor and a second displacement in a horizontal direction of the end effector by a second displacement sensor, while the end effector passes through the load lock gate;
calculating changes in pitch and roll of the end effector based on a maximum value of the first displacement, a detection distance from a point in time when the detection of the end effector by the first displacement sensor starts to a point in time when the detection ends, and a horizontal distance between the first displacement sensor and the second displacement sensor; and
calculating a change in yaw of the end effector based on a maximum value of the second displacement, and a detection distance from a point in time when the detection of the end effector by the second displacement sensor starts to a point in time when the detection ends.
2. The method according to claim 1 , wherein the first displacement sensor is installed on an upper surface or a lower surface of the load lock gate and is configured to be aligned with one side in a width direction of the end effector passing through the load lock gate; and
the second displacement sensor is installed on a lateral surface far from the first displacement sensor among both lateral surfaces of the load lock gate to correspond to a of the end effector passing through the load lock gate.
3. The method according to claim 1 , wherein in the step of calculating the change in the pitch and the roll of the end effector, the change in the pitch (Pitch(θ)) is calculated by Equation 1 below:
Pitch(θ)=sin −1 ( b/a ) [Equation 1]
wherein, ‘a’ denotes the detection distance from a point in time when the detection of the end effector by the first displacement sensor starts to a point in time when the detection ends, and ‘b’ denotes the maximum value of the first displacement.
4. The method according to claim 1 , wherein in the step of calculating the change in the pitch and the roll of the end effector, the change in the roll (Roll(θ)) is calculated by Equation 2 below:
Roll(θ)=tan −1 ( c/b ) [Equation 2]
wherein, ‘c’ denotes the horizontal distance between the first displacement sensor and the second displacement sensor, and ‘b’ denotes the maximum value of the first displacement.
5. The method according to claim 1 , wherein in the calculating of the change in the yaw of the end effector, the change in the yaw (Yaw(0)) is calculated by Equation 3 below:
Yaw(θ)=sin −1 ( e/d ) [Equation 3]
wherein, ‘d’ denotes the detection distance from a point in time when the detection of the end effector by the second displacement sensor starts to a point in time when the detection ends, and ‘e’ denotes the maximum value of the second displacement.
6. The method according to claim 1 , further comprising, when a change value in at least one of the pitch, roll and yaw of the end effector is a predetermined range or more, outputting an abnormality detection notification.
7. A apparatus for measuring displacements of an end effector passing through a load lock gate of an equipment front end module (EFEM), the apparatus comprising:
a first displacement sensor installed on an upper surface or a lower surface of the load lock gate so to be perpendicular to a movement path of the end effector passing through the load lock gate, and a second displacement sensor installed on a lateral surface of the load lock gate, wherein the first displacement sensor and the second displacement sensor are configured to measure a first displacement in a vertical direction and a second displacement in a horizontal direction of the end effector while the end effector passes through the load lock gate; and
a process configured to, on the basis of a detection distance from a point in time when the detection of the end effector by the first displacement sensor starts to a point in time when the detection ends, a horizontal distance between the first displacement sensor and the second displacement sensor, and a maximum value of the first displacement, calculate changes in pitch and roll of the end effector, and, on the basis of a detection distance from a point in time when the detection of the end effector by the second displacement sensor starts to a point in time when the detection ends, and a maximum value of the second displacement, calculate a change in yaw of the end effector.
8. The apparatus according to claim 7 , wherein the first displacement sensor is installed on the upper surface or the lower surface of the load lock gate and is configured to be aligned with one side in a width direction of the end effector passing through the load lock gate, and
the second displacement sensor is installed on a lateral surface far from the first displacement sensor among both lateral surfaces of the load lock gate, to correspond to a height of the end effector passing through the load lock gate.
9. The apparatus according to claim 7 , wherein the processor calculates the change in the pitch (Pitch(θ)) by Equation 1 below:
Pitch(θ)=sin −1 ( b/a ) [Equation 1]
wherein, ‘a’ denotes a detection distance from a point in time when the detection of the end effector by the first displacement sensor starts to a point in time when the detection ends, and ‘b’ denotes a maximum value of the first displacement.
10. The apparatus according to claim 7 , wherein the processor calculates the change in roll Roll(θ) by Equation 2 below:
Roll(θ)=tan −1 ( c/b ) [Equation 2]
wherein, ‘c’ denotes a horizontal distance between the first displacement sensor and the second displacement sensor, and ‘b’ denotes a maximum value of the first displacement.
11. The apparatus according to claim 7 , wherein the processor calculates the change in the yaw (Yaw(0)) by Equation 3 below:
Yaw(θ)=sin −1 ( e/d ) [Equation 3]
wherein, ‘d’ denotes a detection distance from a point in time when the detection of the end effector by the second displacement sensor starts to a point in time when the detection ends, and ‘e’ denotes a maximum value of the second displacement.
12. The apparatus according to claim 7 , wherein, when a change value in at least one of the pitch, roll and yaw of the end effector is a predetermined range or more, the processor outputs an abnormality detection notification.