Protective shutter for charged particle microscope
Disclosed herein are techniques directed toward a protective shutter for a charged particle microscope. An example apparatus at least includes a charged particle column and a focused ion beam (FIB) column, a gas injection nozzle coupled to a translation device, the translation device configured to insert the gas injection nozzle in close proximity to a stage, and a shutter coupled to the gas injection nozzle and arranged to be disposed between the sample and the SEM column when the gas injection nozzle is inserted in close proximity to the stage.
1. An apparatus comprising:
an SEM column and a focused ion beam (FIB) column;
a gas injection nozzle coupled to a translation device, the translation device configured to insert the gas injection nozzle into a processing position; and
a shutter coupled to the gas injection nozzle and arranged to be disposed between a sample and the SEM column when the gas injection nozzle is inserted into the processing position, wherein the shutter is arranged to protect components of the SEM column during sample processing with the FIB column.
2. The apparatus of claim 1 , wherein the shutter includes one or more alignment marks disposed on a side facing the SEM column.
3. The apparatus of claim 2 , wherein the SEM column acquires one or more images to align the shutter with an optical axis of the SEM column so that the shutter shrouds the SEM column.
4. The apparatus of claim 1 , wherein the shutter is arranged so that a focused ion beam provided by the FIB column is unobstructed by the shutter when directed toward the stage.
5. The apparatus of claim 1 , further including:
a voltage source coupled to the stage;
a current amplifier coupled to the shutter; and
an imaging system coupled to the amplifier.
6. The apparatus of claim 5 , wherein the shutter is crescent shaped with a concave side facing the stage.
7. The apparatus of claim 1 , wherein the shutter includes a sputter target.
8. An apparatus comprising:
a charged particle column;
a stage arranged proximate the charged particle column, the stage configured to support a sample;
a gas injection system including a nozzle at a distal end, the gas injection system coupled to a movement device, the gas injection system further coupled to a gas source for delivery of a gas to the sample;
a shutter coupled to the distal end of the gas injection system; and
a controller coupled to at least control the movement device, the controller coupled to or including computer instructions that, when executed by the controller, cause the controller to:
insert the gas injection system to a process location so that gas is delivered to a surface of the sample, wherein the shutter is inserted to a location between the stage and a component of the charged particle column, wherein the shutter is arranged to protect components of the SEM column during sample processing with the FIB column.
9. The apparatus of claim 8 , wherein the shutter includes alignment marks disposed on a side facing a pole piece of the charged particle column.
10. The apparatus of claim 8 , wherein the shutter includes a sputter target.
11. The apparatus of claim 8 , further including a focused ion beam column arranged to direct a focused ion beam toward the sample when the shutter is inserted.
12. The apparatus of claim 8 , wherein the shutter is crescent shaped with a concave side facing the stage.