Metalens with artificial focus pattern
View Patent ↗A metalens configured to shape the focus light into a flexibly designed pattern. The present teachings demonstrate the engineering of metalens with artificial focus pattern by creating line and ring-shaped focus as ‘drawing tools’. These metalens are fabricated through a single layer of silicon-based material through CMOS compatible nano fabrication process. The mechanism to generate artificial focus pattern can be applied to a plethora of future on-chip optical devices with applications ranging from beam engineering to next generation nano lithography.
1. An on-chip optical metalens transmitting light, the metalens comprising:
a metasurface configured to focus light as a multi-point focused design pattern, wherein the multi-point design pattern is created using line- and ring-shaped focus patterns, the metasurface having a plurality of phase shifters configured according to the following phase profile equation:
Φ
(
x
,
y
)
-
Φ
(
0
,
0
)
=
2
π
λ
(
(
x
+
a
(
y
)
)
2
+
f
2
-
f
)
where x and y are space coordinate, λ is incident wavelength, f is focal length, and a(y) is a function of the coordinate y thereby defining the multi-point focused design pattern as a non-point pattern, the metasurface being made of a single layer of silicon-based material.
2. The metalens according to claim 1 wherein the metasurface comprises a continuous phase profile.
3. The metalens according to claim 1 wherein the plurality of phase shifters comprises a plurality of nano cylinders.
4. The metalens according to claim 1 wherein the plurality of phase shifters comprises a grating-based surface.
5. The metalens according to claim 1 wherein the multi-point focused design pattern comprises a homogeneous focused intensity.
6. The metalens according to claim 5 wherein the homogeneous focused intensity is based on a space-variant focal length modifier.
7. The metalens according to claim 1 wherein the plurality of phase shifters comprises a varying periodicity.
8. A metalens transmitting light to a multi-point design pattern, the metalens comprising:
an integrated planar structure configured to focus light into a multi-point focused design pattern, wherein the multi-point design pattern is created using a plurality of phase shifters configured according to the following phase profile equation:
Φ
(
x
,
y
)
-
Φ
(
0
,
0
)
=
2
π
λ
(
(
x
+
a
(
y
)
)
2
+
f
2
-
f
)
where x and y are space coordinate, λ is incident wavelength, f is focal length, and a(y) is a function of the coordinate y thereby defining the multi-point focused design pattern as a non-point pattern.
9. The metalens according to claim 8 wherein the integrated planar structure comprises a single layer of silicon-based material.
10. The metalens according to claim 8 wherein the metasurface comprises a continuous phase profile.
11. The metalens according to claim 8 wherein the plurality of phase shifters comprises a plurality of nano cylinders.
12. The metalens according to claim 8 wherein the plurality of phase shifters comprises a grating-based surface.
13. The metalens according to claim 8 wherein the multi-point focused design pattern comprises a homogeneous focused intensity.
14. The metalens according to claim 13 wherein the homogeneous focused intensity is based on a space-variant focal length modifier.
15. The metalens according to claim 8 wherein the plurality of phase shifters comprises a varying periodicity.