Injection remediation systems and methods

1. An injection remediation system comprising:

at least one reservoir configured to contain material;

at least one load sensor supporting the at least one reservoir;

at least one level sensor incorporated with the at least one reservoir;

at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material; and

at least one processor configured to (i) determine density of the material based at least partly on weight obtained from the at least one load sensor and volume obtained using the at least one level sensor and (ii) control the at least one dosing pump based at least partly on the density of the material.

2. The system of claim 1 , further comprising:

one or more plumbing lines connecting the at least one reservoir to at least one injection head.

3. The system of claim 1 , further comprising:

at least one injection pump associated with one or more plumbing lines and configured to pressurize the material.

4. The system of claim 1 , further comprising:

at least one injection head configured to output the material.

5. The system of claim 1 , wherein the at least one load sensor comprises:

a plurality of load sensors supporting the at least one reservoir.

6. The system of claim 1 , further comprising:

at least one additional reservoir configured to contain different material;

at least one additional load sensor supporting the at least on additional reservoir; and

at least one additional dosing pump operably coupled to the at least one additional reservoir and configured to controllably source the different material wherein the at least one processor is configured to determine an amount of the material.

7. The system of claim 1 , wherein the system is incorporated with a vehicle.

8. The system of claim 1 , wherein the at least one processor is configured to determine volume of the material sourced from the at least one reservoir based at least partly on weight obtained from the at least one load sensor.

9. The system of claim 1 , wherein the at least one processor is configured to determine a volume ratio involving the material sourced from the at least one reservoir based at least partly on weight obtained from the at least one load sensor.

10. The system of claim 1 , wherein the at least one processor is configured to determine a mass ratio involving the material sourced from the at least one reservoir based at least partly on weight obtained from the at least one load sensor.

11. The system of claim 1 , wherein the processor is further configured to perform an operation comprising:

control the at least one dosing pump based at least partly on an amount of the material sourced from the at least one reservoir.

12. The system of claim 1 , wherein the processor is further configured to perform an operation comprising:

control the at least one dosing pump based at least partly on a specified mass ratio.

13. The system of claim 1 , wherein the processor is further configured to perform an operation comprising:

control the at least one dosing pump based at least partly on a specified volume ratio.

14. The system of claim 1 , wherein the processor is configured to: control a speed of the at least one dosing pump.

15. The system of claim 1 , wherein the processor is configured to control a volume output from the at least one dosing pump.

16. The system of claim 1 , wherein the processor is further configured to perform operations comprising:

determine a variance from a specified mass ratio involving the material, and

adjust an output of the at least one dosing pump to reconcile the variance from the specified mass ratio.

17. The system of claim 1 , wherein the processor is further configured to perform operations comprising:

determine a variance from a specified volumetric ratio involving the material, and

adjust an output of the at least one dosing pump to reconcile the variance from the specified volumetric ratio.

18. An injection remediation system comprising:

a first reservoir configured to contain first material, the first reservoir including a first load sensor and a level sensor;

a first dosing pump for sourcing the first material;

a second reservoir configured to contain second material, the second reservoir including a second load sensor;

a second dosing pump for sourcing the second material;

at least one processor configured to control the first dosing pump and the second dosing pump to maintain a specified ratio between the first material and the second material.

19. An injection system comprising:

at least one reservoir configured to contain material;

at least one load sensor supporting the at least one reservoir;

at least one level sensor included with the at least one reservoir;

at least one dosing pump operably coupled to the at least one reservoir and configured to controllably source the material; and

at least one processor configured to control the at least one dosing pump at least partly using density information that is dynamically determined using the at least one level sensor and the at least one load sensor.